Maarten Marinus Johannes Wilhelmus Van Herpen

Person

Heesch, NL

People

Patents Applicationslast 30 patents

Information Patent Application
Spectral Purity Filters for Use in a Lithographic Apparatus
- Publication number 20130010363
- Publication date Jan 10, 2013
- ASML NETHERLANDS B.V.
- Wouter Anthon Soer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SELF-SHADING ELECTRODES FOR DEBRIS SUPPRESSION IN AN EUV SOURCE
- Publication number 20100181502
- Publication date Jul 22, 2010
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Optical Element, Lithographic Apparatus Including Such an Optical E...
- Publication number 20100002216
- Publication date Jan 7, 2010
- ASML NETHERLANDS B.V.
- Wouter Anthon Soer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the protection of an optical element of a lithographic a...
- Publication number 20090074962
- Publication date Mar 19, 2009
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical cleaning arrangement for a lithographic apparatus
- Publication number 20090072168
- Publication date Mar 19, 2009
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Debris prevention system, radiation system, and lithographic apparatus
- Publication number 20090021705
- Publication date Jan 22, 2009
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, radiation system, device manufacturing meth...
- Publication number 20090001288
- Publication date Jan 1, 2009
- ASML NETHERLANDS B.V.
- Edwin Johan Buis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Assembly comprising a radiation source, a reflector and a contamina...
- Publication number 20080291406
- Publication date Nov 27, 2008
- ASML NETHERLANDS B.V.
- Wouter Anthon Soer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation source for generating electromagnetic radiation and metho...
- Publication number 20080239262
- Publication date Oct 2, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Debris mitigation system and lithographic apparatus
- Publication number 20080157006
- Publication date Jul 3, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Debris mitigation system and lithographic apparatus
- Publication number 20080159471
- Publication date Jul 3, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Patterning device, method of providing a patterning device, photoli...
- Publication number 20080151215
- Publication date Jun 26, 2008
- ASML NETHERLANDS B.V.
- Wouter Anthon Soer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation system and lithographic apparatus
- Publication number 20080142736
- Publication date Jun 19, 2008
- ASML NETHERLANDS B.V.
- Arnoud Cornelis Wassink
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic apparatus, and device manufacturing method
- Publication number 20080083885
- Publication date Apr 10, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation system and lithographic apparatus comprising the same
- Publication number 20080074655
- Publication date Mar 27, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus comprising a cleaning arrangement, cleaning...
- Publication number 20080001101
- Publication date Jan 3, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B08 - CLEANING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070146659
- Publication date Jun 28, 2007
- ASML NETHERLANDS B.V.
- Derk Jan Wilfred Klunder
- B82 - NANO-TECHNOLOGY
Information Patent Application
Controlling the flow through the collector during cleaning
- Publication number 20070131878
- Publication date Jun 14, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation system and lithographic apparatus
- Publication number 20070125968
- Publication date Jun 7, 2007
- ASML NETHERLANDS B.V.
- Derk Jan Wilfred Klunder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the removal of deposition on an optical element, method...
- Publication number 20070040999
- Publication date Feb 22, 2007
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for filtering particles out of a beam of radiation and filte...
- Publication number 20070023693
- Publication date Feb 1, 2007
- ASML NETHERLANDS B.V.
- Levinus Pieter Bakker
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic apparatus and cleaning method therefor
- Publication number 20060289811
- Publication date Dec 28, 2006
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus and cleaning method therefor
- Publication number 20060278833
- Publication date Dec 14, 2006
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical element, lithographic apparatus including such an optical e...
- Publication number 20060145094
- Publication date Jul 6, 2006
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G02 - OPTICS
Information Patent Application
Method for the removal of deposition on an optical element, method...
- Publication number 20060115771
- Publication date Jun 1, 2006
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B08 - CLEANING

Maarten Marinus Johannes Wilhelmus Van Herpen

Person

Patents Applicationslast 30 patents

Spectral Purity Filters for Use in a Lithographic Apparatus

SELF-SHADING ELECTRODES FOR DEBRIS SUPPRESSION IN AN EUV SOURCE

Optical Element, Lithographic Apparatus Including Such an Optical E...

Method for the protection of an optical element of a lithographic a...

Radical cleaning arrangement for a lithographic apparatus

Debris prevention system, radiation system, and lithographic apparatus

Lithographic apparatus, radiation system, device manufacturing meth...

Assembly comprising a radiation source, a reflector and a contamina...

Radiation source for generating electromagnetic radiation and metho...

Debris mitigation system and lithographic apparatus

Debris mitigation system and lithographic apparatus

Patterning device, method of providing a patterning device, photoli...

Radiation system and lithographic apparatus

Lithographic apparatus, and device manufacturing method

Radiation system and lithographic apparatus comprising the same

Lithographic apparatus comprising a cleaning arrangement, cleaning...

Lithographic apparatus and device manufacturing method

Controlling the flow through the collector during cleaning

Radiation system and lithographic apparatus

Method for the removal of deposition on an optical element, method...

Method for filtering particles out of a beam of radiation and filte...

Lithographic apparatus and cleaning method therefor

Lithographic apparatus and cleaning method therefor

Optical element, lithographic apparatus including such an optical e...

Method for the removal of deposition on an optical element, method...