Maarten Van Kampen

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for cleaning an inspection system
- Patent number 12,055,478
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Andrey Nikipelov
- G01 - MEASURING TESTING
Information Patent Grant
Graphene spectral purity filter
- Patent number 10,481,510
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation system and optical device
- Patent number 10,359,710
- Issue date Jul 23, 2019
- ASML Netherlands B.V.
- Hendrikus Gijsbertus Schimmel
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,989,844
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation source-collector and method for manufacture
- Patent number 9,773,578
- Issue date Sep 26, 2017
- ASML Netherlands B.V.
- Alexey Sergeevich Kuznetsov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and method of manufacturing a device
- Patent number 9,606,445
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,482,960
- Issue date Nov 1, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,395,630
- Issue date Jul 19, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Arrangement for use in a projection exposure tool for microlithogra...
- Patent number 9,354,529
- Issue date May 31, 2016
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR CLEANING AN INSPECTION SYSTEM
- Publication number 20240353315
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR CLEANING AN INSPECTION SYSTEM
- Publication number 20220205900
- Publication date Jun 30, 2022
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL
- Publication number 20210079519
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A Radiation System and Optical Device
- Publication number 20180307146
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Hendrikus Gijsbertus SCHIMMEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20180259846
- Publication date Sep 13, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20170017150
- Publication date Jan 19, 2017
- ASML Netherlands B.V.
- Andrei Mikhailovich YAKUNIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Source-Collector and Method for Manufacture
- Publication number 20160012929
- Publication date Jan 14, 2016
- ASML NETHERLANDS B.V.
- Alexey Sergeevich KUZNETSOV
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lithographic Apparatus and Method of Manufacturing a Device
- Publication number 20150192861
- Publication date Jul 9, 2015
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20140160455
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich YAKUNIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
Components for EUV Lithographic Apparatus, EUV Lithographic Apparat...
- Publication number 20130114059
- Publication date May 9, 2013
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan Jak
- B32 - LAYERED PRODUCTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20130088699
- Publication date Apr 11, 2013
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD OF PRODUCING IT
- Publication number 20120200913
- Publication date Aug 9, 2012
- ASML NETHERLANDS B.V.
- MAARTEN VAN KAMPEN
- G02 - OPTICS
Information Patent Application
SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACT...
- Publication number 20120170015
- Publication date Jul 5, 2012
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING SYSTE...
- Publication number 20110037960
- Publication date Feb 17, 2011
- ASML NETHERLANDS B.V.
- Luigi Scaccabarozzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System for Contactless Cleaning, Lithographic Apparatus and Device...
- Publication number 20100151394
- Publication date Jun 17, 2010
- Luigi Scaccabarozzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Maarten Van Kampen

Person

Patents Grantslast 30 patents

Apparatus and method for cleaning an inspection system

Graphene spectral purity filter

Radiation system and optical device

Pellicle for reticle and multilayer mirror

Radiation source-collector and method for manufacture

Lithographic apparatus and method of manufacturing a device

Pellicle for reticle and multilayer mirror

Lithographic apparatus and method

Arrangement for use in a projection exposure tool for microlithogra...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR CLEANING AN INSPECTION SYSTEM

APPARATUS AND METHOD FOR CLEANING AN INSPECTION SYSTEM

METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL

A Radiation System and Optical Device

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

Radiation Source-Collector and Method for Manufacture

Lithographic Apparatus and Method of Manufacturing a Device

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

Components for EUV Lithographic Apparatus, EUV Lithographic Apparat...

LITHOGRAPHIC APPARATUS AND METHOD

REFLECTIVE OPTICAL ELEMENT AND METHOD OF PRODUCING IT

SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACT...

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING SYSTE...

System for Contactless Cleaning, Lithographic Apparatus and Device...