Madhavi R. Chandrachood

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching of mask materials
- Patent number 11,915,932
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Toi Yue Becky Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask with backside coating
- Patent number 11,249,386
- Issue date Feb 15, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma reactor having an array of plural individually controlled ga...
- Patent number 10,170,280
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask etch plasma reactor having an array of optical sensors viewing...
- Patent number 9,218,944
- Issue date Dec 22, 2015
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching EUV material layers utilized to form a photomask
- Patent number 8,778,574
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Keven Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 8,568,553
- Issue date Oct 29, 2013
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching a molybdenum layer suitable for photomask fabric...
- Patent number 8,293,430
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for etching a metal layer suitable for use in photomask fab...
- Patent number 8,202,441
- Issue date Jun 19, 2012
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma mask etch method of controlling a reactor tunable element in...
- Patent number 8,017,029
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for etching a transparent workpiece including backside endp...
- Patent number 8,012,366
- Issue date Sep 6, 2011
- Applied Materials, Inc.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask etch plasma reactor with cathode providing a uniform distribut...
- Patent number 8,002,946
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask etch plasma reactor with variable process gas distribution
- Patent number 7,976,671
- Issue date Jul 12, 2011
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for processing a workpiece and having a tunable cathode
- Patent number 7,967,930
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask etching
- Patent number 7,964,818
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Etching of nano-imprint templates using an etch reactor
- Patent number 7,955,516
- Issue date Jun 7, 2011
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,943,005
- Issue date May 17, 2011
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,909,961
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for plasma etching a chromium layer suitable for photomask f...
- Patent number 7,829,243
- Issue date Nov 9, 2010
- Applied Materials, Inc.
- Xiaoyi Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for photomask plasma etching using a protected mask
- Patent number 7,790,334
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of etching extreme ultraviolet light (EUV) photomasks
- Patent number 7,771,895
- Issue date Aug 10, 2010
- Applied Materials, Inc.
- Banqiu Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Process for etching a metal layer suitable for use in photomask fab...
- Patent number 7,682,518
- Issue date Mar 23, 2010
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for etching photomasks
- Patent number 7,521,000
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing a workpiece in a plasma reactor with dynamic a...
- Patent number 7,520,999
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor employing a dy...
- Patent number 7,504,041
- Issue date Mar 17, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a dynamically adjustable plasma source power ap...
- Patent number 7,431,797
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with apparatus for dynamically adjusting the plasma...
- Patent number 7,419,551
- Issue date Sep 2, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarized copper cleaning for reduced defects
- Patent number 7,104,267
- Issue date Sep 12, 2006
- Applied Materials Inc.
- Ramin Emami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside etching in a scrubber
- Patent number 6,921,494
- Issue date Jul 26, 2005
- Applied Materials, Inc.
- Brian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-fluid polishing process
- Patent number 6,572,453
- Issue date Jun 3, 2003
- Applied Materials, Inc.
- Kapila Wijekoon
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Scrubber operation
- Patent number 6,558,471
- Issue date May 6, 2003
- Applied Materials, Inc.
- Brian J. Brown
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING OF MASK MATERIALS
- Publication number 20220351972
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Toi Yue Becky Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask With Backside Coating
- Publication number 20200133114
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...
- Publication number 20160042917
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20140190632
- Publication date Jul 10, 2014
- Applied Materials, Inc.
- Ajay KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING A MOLYBDENUM LAYER SUITABLE FOR PHOTOMASK FABRIC...
- Publication number 20130040231
- Publication date Feb 14, 2013
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20110162797
- Publication date Jul 7, 2011
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100276391
- Publication date Nov 4, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...
- Publication number 20100178600
- Publication date Jul 15, 2010
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK ETCH PROCESS
- Publication number 20080179282
- Publication date Jul 31, 2008
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING OF NANO-IMPRINT TEMPLATES USING AN ETCH REACTOR
- Publication number 20080105649
- Publication date May 8, 2008
- MADHAVI R. CHANDRACHOOD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma mask etch method of controlling a reactor tunable element in...
- Publication number 20080099434
- Publication date May 1, 2008
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask etch plasma reactor with variable process gas distribution
- Publication number 20080102202
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask etch plasma reactor having an array of optical sensors viewing...
- Publication number 20080102001
- Publication date May 1, 2008
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099431
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching a transparent workpiece including backside endp...
- Publication number 20080099432
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma reactor for processing a transparent workpiece with backside...
- Publication number 20080099437
- Publication date May 1, 2008
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Workpiece rotation apparatus for a plasma reactor system
- Publication number 20080099451
- Publication date May 1, 2008
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099426
- Publication date May 1, 2008
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask etch plasma reactor with cathode providing a uniform distribut...
- Publication number 20080100222
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor for processing a workpiece and having a tunable cathode
- Publication number 20080100223
- Publication date May 1, 2008
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK ETCHING
- Publication number 20080101978
- Publication date May 1, 2008
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
METHOD OF ETCHING EXTREME ULTRAVIOLET LIGHT (EUV) PHOTOMASKS
- Publication number 20080070128
- Publication date Mar 20, 2008
- Applied Materials, Inc.
- Banqiu Wu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Plasma reactor with a dynamically adjustable plasma source power ap...
- Publication number 20070256787
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with apparatus for dynamically adjusting the plasma...
- Publication number 20070256784
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a workpiece in a plasma reactor with dynamic a...
- Publication number 20070257008
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a workpiece in a plasma reactor employing a dy...
- Publication number 20070257009
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching photomasks
- Publication number 20070184354
- Publication date Aug 9, 2007
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...
- Publication number 20070105381
- Publication date May 10, 2007
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20070017898
- Publication date Jan 25, 2007
- Ajay Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for photomask plasma etching using a protected mask
- Publication number 20060166106
- Publication date Jul 27, 2006
- APPLIED MATERIALS, INC.
- Madhavi Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Madhavi R. Chandrachood

Person

Patents Grantslast 30 patents

Plasma etching of mask materials

Extreme ultraviolet mask with backside coating

Plasma reactor having an array of plural individually controlled ga...

Mask etch plasma reactor having an array of optical sensors viewing...

Method for etching EUV material layers utilized to form a photomask

Method and apparatus for photomask plasma etching

Method for etching a molybdenum layer suitable for photomask fabric...

Process for etching a metal layer suitable for use in photomask fab...

Plasma mask etch method of controlling a reactor tunable element in...

Process for etching a transparent workpiece including backside endp...

Mask etch plasma reactor with cathode providing a uniform distribut...

Mask etch plasma reactor with variable process gas distribution

Plasma reactor for processing a workpiece and having a tunable cathode

Method and apparatus for photomask etching

Etching of nano-imprint templates using an etch reactor

Method and apparatus for photomask plasma etching

Method and apparatus for photomask plasma etching

Method for plasma etching a chromium layer suitable for photomask f...

Method for photomask plasma etching using a protected mask

Method of etching extreme ultraviolet light (EUV) photomasks

Process for etching a metal layer suitable for use in photomask fab...

Process for etching photomasks

Method of processing a workpiece in a plasma reactor with dynamic a...

Method of processing a workpiece in a plasma reactor employing a dy...

Plasma reactor with a dynamically adjustable plasma source power ap...

Plasma reactor with apparatus for dynamically adjusting the plasma...

Planarized copper cleaning for reduced defects

Backside etching in a scrubber

Multi-fluid polishing process

Scrubber operation

Patents Applicationslast 30 patents

PLASMA ETCHING OF MASK MATERIALS

Extreme Ultraviolet Mask With Backside Coating

PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

METHOD FOR ETCHING A MOLYBDENUM LAYER SUITABLE FOR PHOTOMASK FABRIC...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...

MASK ETCH PROCESS

ETCHING OF NANO-IMPRINT TEMPLATES USING AN ETCH REACTOR

Plasma mask etch method of controlling a reactor tunable element in...

Mask etch plasma reactor with variable process gas distribution

Mask etch plasma reactor having an array of optical sensors viewing...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Process for etching a transparent workpiece including backside endp...

Plasma reactor for processing a transparent workpiece with backside...

Workpiece rotation apparatus for a plasma reactor system

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Mask etch plasma reactor with cathode providing a uniform distribut...

Plasma reactor for processing a workpiece and having a tunable cathode

METHOD AND APPARATUS FOR PHOTOMASK ETCHING

METHOD OF ETCHING EXTREME ULTRAVIOLET LIGHT (EUV) PHOTOMASKS

Plasma reactor with a dynamically adjustable plasma source power ap...

Plasma reactor with apparatus for dynamically adjusting the plasma...

Method of processing a workpiece in a plasma reactor with dynamic a...

Method of processing a workpiece in a plasma reactor employing a dy...

Process for etching photomasks

PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Method for photomask plasma etching using a protected mask