Madhur Sachan

Person

Belmont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,886,120
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self aligned multiple patterning
- Patent number 11,881,402
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned subtractive etch
- Patent number 11,869,807
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 11,621,172
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,562,904
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contact and contact over active gate structures
- Patent number 11,437,273
- Issue date Sep 6, 2022
- Micromaterials LLC
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned via
- Patent number 11,437,274
- Issue date Sep 6, 2022
- Micromaterials LLC
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for performing profile metrology on semicondu...
- Patent number 11,133,152
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Regina Freed
- G01 - MEASURING TESTING
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 11,037,825
- Issue date Jun 15, 2021
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 10,790,191
- Issue date Sep 29, 2020
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESS OPERATION ANALYSIS APPLICATION AND GENERATION OF...
- Publication number 20240427308
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Rituraj Nandan
- G05 - CONTROLLING REGULATING
Information Patent Application
EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...
- Publication number 20240319603
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- ZHENXING HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...
- Publication number 20240272552
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- GABRIELA ALVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-METAL-CONTAINING METAL-OXO PHOTORESIST FILMS BY CVD AND AL...
- Publication number 20240271276
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- LAKMAL KALUTARAGE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DESIGN, CONTROL, AND OPTIMIZATION OF PHOTOSENSITIVITY MODULATION AL...
- Publication number 20240194484
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- RUIYING HAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
- Publication number 20240160100
- Publication date May 16, 2024
- Applied Materials, Inc.
- Tzu Shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...
- Publication number 20240027916
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- RUIYING HAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230386839
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20230290646
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20230215736
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230127535
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20220367270
- Publication date Nov 17, 2022
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULLY SELF-ALIGNED VIA
- Publication number 20220359289
- Publication date Nov 10, 2022
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL TONE PHOTORESISTS
- Publication number 20220342302
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECIPE OPTIMIZATION THROUGH MACHINE LEARNING
- Publication number 20220198333
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Robert Charles Pack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF ALIGNED MULTIPLE PATTERNING
- Publication number 20220102144
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Lili FENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20220028691
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20220026807
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY DEVELOP PROCESS OF PHOTORESIST
- Publication number 20220004105
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Yuqiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20220002882
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULLY SELF-ALIGNED SUBTRACTIVE ETCH
- Publication number 20210391215
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fully Self-Aligned Via
- Publication number 20210090952
- Publication date Mar 25, 2021
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal Process To Create High Aspect Ratio Fully Self-Al...
- Publication number 20200388535
- Publication date Dec 10, 2020
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PERFORMING PROFILE METROLOGY ON SEMICONDU...
- Publication number 20200300618
- Publication date Sep 24, 2020
- Applied Materials, Inc.
- REGINA FREED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20200279773
- Publication date Sep 3, 2020
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal Process To Create High Aspect Ratio Fully Self-Al...
- Publication number 20190348322
- Publication date Nov 14, 2019
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS

Madhur Sachan

Person

Patents Grantslast 30 patents

Vapor phase thermal etch solutions for metal oxo photoresists

Vapor phase thermal etch solutions for metal oxo photoresists

Deposition of semiconductor integration films

Self aligned multiple patterning

Fully self-aligned subtractive etch

Vapor phase thermal etch solutions for metal oxo photoresists

Deposition of semiconductor integration films

Self-aligned contact and contact over active gate structures

Fully self-aligned via

Methods and apparatus for performing profile metrology on semicondu...

Selective removal process to create high aspect ratio fully self-al...

Selective removal process to create high aspect ratio fully self-al...

Patents Applicationslast 30 patents

SUBSTRATE PROCESS OPERATION ANALYSIS APPLICATION AND GENERATION OF...

EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...

PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...

MULTIPLE-METAL-CONTAINING METAL-OXO PHOTORESIST FILMS BY CVD AND AL...

DESIGN, CONTROL, AND OPTIMIZATION OF PHOTOSENSITIVITY MODULATION AL...

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

FULLY SELF-ALIGNED VIA

DUAL TONE PHOTORESISTS

RECIPE OPTIMIZATION THROUGH MACHINE LEARNING

SELF ALIGNED MULTIPLE PATTERNING

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

DRY DEVELOP PROCESS OF PHOTORESIST

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

FULLY SELF-ALIGNED SUBTRACTIVE ETCH

Fully Self-Aligned Via

Selective Removal Process To Create High Aspect Ratio Fully Self-Al...

METHODS AND APPARATUS FOR PERFORMING PROFILE METROLOGY ON SEMICONDU...

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

Selective Removal Process To Create High Aspect Ratio Fully Self-Al...