Madhusudan Mukhopadhyay

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Linear polishing for improving substrate uniformity
- Patent number 6,726,545
- Issue date Apr 27, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming dual gate oxide
- Patent number 6,399,448
- Issue date Jun 4, 2002
- Chartered Semiconductor Manufacturing Ltd.
- Madhusudan Mukhopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an antifuse element
- Patent number 6,368,900
- Issue date Apr 9, 2002
- Chartered Semiconductor Manufacturing Ltd.
- John Prasao Kenkaraseril
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming top metal contact to antifuse
- Patent number 6,362,102
- Issue date Mar 26, 2002
- Chartered Semiconductor Manufacturing Ltd.
- Say Gut Piew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming salicided poly to metal capacitor
- Patent number 6,306,721
- Issue date Oct 23, 2001
- Chartered Semiconductor Maufacturing Ltd.
- Yeow Meng Teo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP uniformity
- Patent number 6,248,006
- Issue date Jun 19, 2001
- Chartered Semiconductor Manufacturing Ltd.
- Madhusudan Mukhopadhyay
- B24 - GRINDING POLISHING
Information Patent Grant
Method to form self-sealing air gaps between metal interconnects
- Patent number 6,228,770
- Issue date May 8, 2001
- Chartered Semiconductor Manufacturing Ltd.
- Yelehanka Ramachandramurthy Pradeep
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Linear polishing for improving substrate uniformity
- Publication number 20030203710
- Publication date Oct 30, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- B24 - GRINDING POLISHING

Madhusudan Mukhopadhyay

Person

Patents Grantslast 30 patents

Linear polishing for improving substrate uniformity

Method for forming dual gate oxide

Method of fabricating an antifuse element

Method of forming top metal contact to antifuse

Method of forming salicided poly to metal capacitor

CMP uniformity

Method to form self-sealing air gaps between metal interconnects

Patents Applicationslast 30 patents

Linear polishing for improving substrate uniformity