Maikel Robert GOOSEN

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods of determining aberrations in images obtained b...
- Patent number 12,183,540
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Yifeng Shao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of profiling charged-particle beams
- Patent number 12,165,836
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for image enhancement for a multi-beam charged-...
- Patent number 11,961,700
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pulsed charged-particle beam system
- Patent number 11,942,302
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Arno Jan Bleeker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of controlling an energy spread of a charg...
- Patent number 11,881,374
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Shakeeb Bin Hasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mark position determination method
- Patent number 10,942,460
- Issue date Mar 9, 2021
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 10,474,039
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Paul Christiaan Hinnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measuring method of an alignment target
- Patent number 10,416,577
- Issue date Sep 17, 2019
- ASML Holding N.V.
- Ralph Brinkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEM IMAGE ENHANCEMENT
- Publication number 20240005463
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Shakeeb Bin HASAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PULSED CHARGED-PARTICLE BEAM SYSTEM
- Publication number 20230154722
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROL OF A CHARGED PARTICLE BEAM
- Publication number 20230048580
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS
- Publication number 20220392741
- Publication date Dec 8, 2022
- ASML NETHERLANDS B.V.
- Maikel Robert GOOSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and methods of determining aberrations in images obtained b...
- Publication number 20220328282
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Yifeng SHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR IMAGE ENHANCEMENT FOR A MULTI-BEAM CHARGED-...
- Publication number 20220199358
- Publication date Jun 23, 2022
- ASML NETHERLANDS B.V.
- Maikel Robert GOOSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS FOR AND METHOD OF LOCAL CONTROL OF A CHARGED PARTICLE BEAM
- Publication number 20220199355
- Publication date Jun 23, 2022
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARG...
- Publication number 20220148842
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Shakeeb Bin HASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD
- Publication number 20210249224
- Publication date Aug 12, 2021
- ASML NETHERLANDS B.V.
- Erwin Paul SMAKMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT
- Publication number 20200312619
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200272061
- Publication date Aug 27, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARK POSITION DETERMINATION METHOD
- Publication number 20190086824
- Publication date Mar 21, 2019
- ASML Netherlands B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASURING METHOD OF AN ALIGNMENT TARGET
- Publication number 20180329307
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Ralph BRINKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20170176870
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Paul Christiaan HINNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Maikel Robert GOOSEN

Person

Patents Grantslast 30 patents

Systems and methods of determining aberrations in images obtained b...

Systems and methods of profiling charged-particle beams

Systems and methods for image enhancement for a multi-beam charged-...

Pulsed charged-particle beam system

Apparatus for and method of controlling an energy spread of a charg...

Aperture array with integrated current measurement

Lithographic method

Lithographic method

Mark position determination method

Lithographic method

Methods and patterning devices and apparatuses for measuring focus...

Position measuring method of an alignment target

Patents Applicationslast 30 patents

SEM IMAGE ENHANCEMENT

PULSED CHARGED-PARTICLE BEAM SYSTEM

APPARATUS FOR AND METHOD OF CONTROL OF A CHARGED PARTICLE BEAM

SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS

Systems and methods of determining aberrations in images obtained b...

SYSTEMS AND METHODS FOR IMAGE ENHANCEMENT FOR A MULTI-BEAM CHARGED-...

APPARATUS FOR AND METHOD OF LOCAL CONTROL OF A CHARGED PARTICLE BEAM

APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARG...

ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD

APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT

LITHOGRAPHIC METHOD

LITHOGRAPHIC METHOD

LITHOGRAPHIC METHOD

MARK POSITION DETERMINATION METHOD

POSITION MEASURING METHOD OF AN ALIGNMENT TARGET

Methods and Patterning Devices and Apparatuses for Measuring Focus...