TREA

Maki KAWAMURA

Follow

Person

  • Osaka-shi, JP
People

Patents Grantslast 30 patents

  • Information Patent Grant

    Photoresist composition
    • Patent number 10,969,685
    • Issue date Apr 6, 2021
    • Sumitomo Chemical Company, Limited
    • Masako Sugihara
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist composition and method for producing resist pattern
    • Patent number 9,946,157
    • Issue date Apr 17, 2018
    • Sumitomo Chemical Company, Limited
    • Maki Kawamura
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition
    • Patent number 9,201,303
    • Issue date Dec 1, 2015
    • Sumitomo Chemical Company, Limited
    • Maki Kawamura
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Photoresist composition
    • Patent number 9,182,663
    • Issue date Nov 10, 2015
    • Sumitomo Chemical Company, Limited
    • Masako Sugihara
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Chemical amplified photoresist composition
    • Patent number 8,927,194
    • Issue date Jan 6, 2015
    • Sumitomo Chemical Company, Limited
    • Maki Kawamura
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    • Publication number 20160291464
    • Publication date Oct 6, 2016
    • Sumitomo Chemical Company, Limited
    • Maki KAWAMURA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20150086927
    • Publication date Mar 26, 2015
    • Sumitomo Chemical Company, Limited
    • Masako SUGIHARA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20140017611
    • Publication date Jan 16, 2014
    • Sumitomo Chemical Company, Limited
    • Masako SUGIHARA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20130330669
    • Publication date Dec 12, 2013
    • Maki KAWAMURA
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    PHOTORESIST COMPOSITION
    • Publication number 20130177851
    • Publication date Jul 11, 2013
    • Sumitomo Chemical Company, Limited
    • Maki KAWAMURA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION
    • Publication number 20130101940
    • Publication date Apr 25, 2013
    • Sumitomo Chemical Company, Limited
    • Maki KAWAMURA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY