Maki TANAKA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle microscope device and wide-field image generation...
- Patent number 11,508,047
- Issue date Nov 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Mitsutoshi Kobayashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Image processing device, image processing method and image processi...
- Patent number 10,242,489
- Issue date Mar 26, 2019
- Hitachi, Ltd.
- Hanae Yoshida
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanning electron microscope
- Patent number 10,186,399
- Issue date Jan 22, 2019
- Hitachi High-Technologies Corporation
- Mayuka Osaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving quality of scanning charged particle microscope...
- Patent number 9,859,093
- Issue date Jan 2, 2018
- Hitachi High-Technologies Corporation
- Kenji Nakahira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope system, pattern measurement method usi...
- Patent number 9,852,881
- Issue date Dec 26, 2017
- Hitachi High-Technologies Corporation
- Chie Shishido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope device and imaging method using same
- Patent number 9,824,853
- Issue date Nov 21, 2017
- Hitachi High-Technologies Corporation
- Mitsutoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam device, specimen-image acquisition method, an...
- Patent number 9,741,530
- Issue date Aug 22, 2017
- Hitachi High-Technologies Corporation
- Yusuke Ominami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern dimension measurement method using electron microscope, pat...
- Patent number 9,671,223
- Issue date Jun 6, 2017
- Hitachi High-Technologies Corporation
- Chie Shishido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shape measurement method, and system therefor
- Patent number 9,354,049
- Issue date May 31, 2016
- HUTACHI HIGH-TECHNOLOGIES CORPORATION
- Chie Shishido
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle microscope apparatus and image acquisition method...
- Patent number 9,190,240
- Issue date Nov 17, 2015
- Hitachi High-Technologies Corporation
- Maki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measuring apparatus and computer program
- Patent number 9,000,365
- Issue date Apr 7, 2015
- Hitachi High-Technologies Corporation
- Yuzuru Mochizuki
- G01 - MEASURING TESTING
Information Patent Grant
Estimating shape based on comparison between actual waveform and li...
- Patent number 8,671,366
- Issue date Mar 11, 2014
- Hitachi High-Technologies Corporation
- Maki Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a semiconductor device and an apparatus thereof
- Patent number 8,559,000
- Issue date Oct 15, 2013
- Hitachi High-Technologies Corporation
- Akira Hamamatsu
- G01 - MEASURING TESTING
Information Patent Grant
Electron microscope system and method for evaluating film thickness...
- Patent number 8,502,145
- Issue date Aug 6, 2013
- Hitachi High-Technologies Corporation
- Mayuka Iwasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning electron microscope system and method for measuring dimens...
- Patent number 8,481,936
- Issue date Jul 9, 2013
- Hitachi High-Technologies Corporation
- Chie Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of inspecting a semiconductor device and an apparatus thereof
- Patent number 8,274,651
- Issue date Sep 25, 2012
- Hitachi, Ltd.
- Akira Hamamatsu
- G01 - MEASURING TESTING
Information Patent Grant
Electron microscope system and method for evaluating film thickness...
- Patent number 8,217,348
- Issue date Jul 10, 2012
- Hitachi High-Technologies Corporation
- Mayuka Iwasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and its system for calibrating measured data between differe...
- Patent number 8,214,166
- Issue date Jul 3, 2012
- Hitachi High-Technologies Corporation
- Maki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure or system inspection or measurement apparatu...
- Patent number 8,212,227
- Issue date Jul 3, 2012
- Hitachi, Ltd.
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Scanning electron microscope system and method for measuring dimens...
- Patent number 8,110,800
- Issue date Feb 7, 2012
- Hitachi High-Technologies Corporation
- Chie Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of inspecting a semiconductor device and an apparatus thereof
- Patent number 8,040,503
- Issue date Oct 18, 2011
- Hitachi, Ltd.
- Akira Hamamatsu
- G01 - MEASURING TESTING
Information Patent Grant
Sample and method for evaluating resolution of scanning electron mi...
- Patent number 8,022,356
- Issue date Sep 20, 2011
- Hitachi High-Technologies Corporation
- Mayuka Oosaki
- G01 - MEASURING TESTING
Information Patent Grant
Pattern inspection method and apparatus
- Patent number 7,957,579
- Issue date Jun 7, 2011
- Hitachi, Ltd.
- Takashi Hiroi
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern
- Patent number 7,952,074
- Issue date May 31, 2011
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for observing a specimen
- Patent number 7,935,927
- Issue date May 3, 2011
- Hitachi High-Technologies Corporation
- Atsushi Miyamoto
- G01 - MEASURING TESTING
Information Patent Grant
Pattern inspection method and apparatus
- Patent number 7,894,658
- Issue date Feb 22, 2011
- Hitachi, Ltd.
- Takashi Hiroi
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring shape of a specimen
- Patent number 7,889,908
- Issue date Feb 15, 2011
- Hitachi High-Technologies Corporation
- Atsushi Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring a pattern dimension using a scanning electron...
- Patent number 7,732,761
- Issue date Jun 8, 2010
- Hitachi High-Technologies Corporation
- Maki Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam exposure or system inspection or measurement apparatu...
- Patent number 7,692,144
- Issue date Apr 6, 2010
- Hitachi, Ltd.
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting a semiconductor device and an apparatus thereof
- Patent number 7,643,138
- Issue date Jan 5, 2010
- Hitachi, Ltd.
- Akira Hamamatsu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE MICROSCOPE DEVICE AND WIDE-FIELD IMAGE GENERATION...
- Publication number 20200265568
- Publication date Aug 20, 2020
- Hitachi High-Technologies Corporation
- Mitsutoshi KOBAYASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20170301513
- Publication date Oct 19, 2017
- Hitachi High-Technologies Corporation
- Mayuka OSAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD AND IMAGE PROCESSI...
- Publication number 20170243391
- Publication date Aug 24, 2017
- Hitachi, Ltd
- Hanae YOSHIDA
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
ELECTRON MICROSCOPE DEVICE AND IMAGING METHOD USING SAME
- Publication number 20170169992
- Publication date Jun 15, 2017
- Hitachi High-Technologies Corporation
- Mitsutoshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope System, Pattern Measurement Method Usi...
- Publication number 20160379798
- Publication date Dec 29, 2016
- Hitachi High-Technologies Corporation
- Chie SHISHIDO
- G01 - MEASURING TESTING
Information Patent Application
Method of Improving Quality of Scanning Charged Particle Microscope...
- Publication number 20160343540
- Publication date Nov 24, 2016
- Hitachi High-Technologies Corporation
- Kenji NAKAHIRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle-Beam Device, Specimen-Image Acquisition Method, an...
- Publication number 20160336145
- Publication date Nov 17, 2016
- Hitachi High-Technologies Corporation
- Yusuke OMINAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE MICROSCOPE APPARATUS AND IMAGE ACQUISITION METHOD...
- Publication number 20140319341
- Publication date Oct 30, 2014
- Hitachi High-Technologies Corporation
- Maki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHAPE MEASUREMENT METHOD, AND SYSTEM THEREFOR
- Publication number 20130262027
- Publication date Oct 3, 2013
- Chie Shishido
- G01 - MEASURING TESTING
Information Patent Application
Pattern Dimension Measurement Method Using Electron Microscope, Pat...
- Publication number 20130166240
- Publication date Jun 27, 2013
- Hitachi High-Technologies Corporation
- Chie Shishido
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF
- Publication number 20120312104
- Publication date Dec 13, 2012
- Akira Hamamatsu
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON MICROSCOPE SYSTEM AND METHOD FOR EVALUATING FILM THICKNESS...
- Publication number 20120267529
- Publication date Oct 25, 2012
- Mayuka Iwasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Shape Estimation Method and Pattern Measuring Device
- Publication number 20120151428
- Publication date Jun 14, 2012
- Hitachi High-Technologies Corporation
- Maki Tanaka
- G01 - MEASURING TESTING
Information Patent Application
PATTERN SHAPE SELECTION METHOD AND PATTERN MEASURING DEVICE
- Publication number 20120126116
- Publication date May 24, 2012
- Hitachi High-Technologies Corporation
- Maki Tanaka
- G01 - MEASURING TESTING
Information Patent Application
SCANNING ELECTRON MICROSCOPE SYSTEM AND METHOD FOR MEASURING DIMENS...
- Publication number 20120112067
- Publication date May 10, 2012
- Chie Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM
- Publication number 20120037801
- Publication date Feb 16, 2012
- Yuzuru Mochizuki
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF
- Publication number 20120006131
- Publication date Jan 12, 2012
- Akira Hamamatsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Inspection Method And Apparatus
- Publication number 20100246933
- Publication date Sep 30, 2010
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron Beam Exposure Or System Inspection Or Measurement Apparatu...
- Publication number 20100193686
- Publication date Aug 5, 2010
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF
- Publication number 20100140474
- Publication date Jun 10, 2010
- Akira HAMAMATSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Sample and method for evaluating resolution of scanning electron mi...
- Publication number 20100133426
- Publication date Jun 3, 2010
- Mayuka Oosaki
- G01 - MEASURING TESTING
Information Patent Application
Electron Microscope System and Method for Evaluating Film Thickness...
- Publication number 20090212211
- Publication date Aug 27, 2009
- Hitachi High-Technologies Corporation
- Mayuka IWASAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scanning Electron Microscope system and Method for Measuring Dimens...
- Publication number 20090212212
- Publication date Aug 27, 2009
- Chie Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND METHOD OF MEASURING PATTERN DIMENS...
- Publication number 20090212215
- Publication date Aug 27, 2009
- Hitachi High-Technologies Corporation
- Wataru Nagatomo
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING A PATTERN DIMENSION
- Publication number 20090214103
- Publication date Aug 27, 2009
- Hitachi High-Technologies Corporation
- Maki Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and Its System for Calibrating Measured Data Between Differe...
- Publication number 20080319696
- Publication date Dec 25, 2008
- Maki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTING INTEGRATED CIRCUIT PATTERN
- Publication number 20080302964
- Publication date Dec 11, 2008
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF
- Publication number 20080291437
- Publication date Nov 27, 2008
- Akira Hamamatsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method And Apparatus For Observing A Specimen
- Publication number 20080237456
- Publication date Oct 2, 2008
- Atsushi MIYAMOTO
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR MEASURING PATTERN DIMENSIONS
- Publication number 20080197280
- Publication date Aug 21, 2008
- Maki Tanaka
- G01 - MEASURING TESTING

Maki TANAKA

Person

Patents Grantslast 30 patents

Charged particle microscope device and wide-field image generation...

Image processing device, image processing method and image processi...

Scanning electron microscope

Method of improving quality of scanning charged particle microscope...

Scanning electron microscope system, pattern measurement method usi...

Electron microscope device and imaging method using same

Charged-particle-beam device, specimen-image acquisition method, an...

Pattern dimension measurement method using electron microscope, pat...

Shape measurement method, and system therefor

Charged particle microscope apparatus and image acquisition method...

Pattern measuring apparatus and computer program

Estimating shape based on comparison between actual waveform and li...

Method of inspecting a semiconductor device and an apparatus thereof

Electron microscope system and method for evaluating film thickness...

Scanning electron microscope system and method for measuring dimens...

Method of inspecting a semiconductor device and an apparatus thereof

Electron microscope system and method for evaluating film thickness...

Method and its system for calibrating measured data between differe...

Electron beam exposure or system inspection or measurement apparatu...

Scanning electron microscope system and method for measuring dimens...

Method of inspecting a semiconductor device and an apparatus thereof

Sample and method for evaluating resolution of scanning electron mi...

Pattern inspection method and apparatus

Method and apparatus for inspecting integrated circuit pattern

Method and apparatus for observing a specimen

Pattern inspection method and apparatus

Method and apparatus for measuring shape of a specimen

Method for measuring a pattern dimension using a scanning electron...

Electron beam exposure or system inspection or measurement apparatu...

Method of inspecting a semiconductor device and an apparatus thereof

Patents Applicationslast 30 patents

CHARGED PARTICLE MICROSCOPE DEVICE AND WIDE-FIELD IMAGE GENERATION...

SCANNING ELECTRON MICROSCOPE

IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD AND IMAGE PROCESSI...

ELECTRON MICROSCOPE DEVICE AND IMAGING METHOD USING SAME

Scanning Electron Microscope System, Pattern Measurement Method Usi...

Method of Improving Quality of Scanning Charged Particle Microscope...

Charged-Particle-Beam Device, Specimen-Image Acquisition Method, an...

CHARGED PARTICLE MICROSCOPE APPARATUS AND IMAGE ACQUISITION METHOD...

SHAPE MEASUREMENT METHOD, AND SYSTEM THEREFOR

Pattern Dimension Measurement Method Using Electron Microscope, Pat...

METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF

ELECTRON MICROSCOPE SYSTEM AND METHOD FOR EVALUATING FILM THICKNESS...

Pattern Shape Estimation Method and Pattern Measuring Device

PATTERN SHAPE SELECTION METHOD AND PATTERN MEASURING DEVICE

SCANNING ELECTRON MICROSCOPE SYSTEM AND METHOD FOR MEASURING DIMENS...

PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM

METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF

Pattern Inspection Method And Apparatus

Electron Beam Exposure Or System Inspection Or Measurement Apparatu...

METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF

Sample and method for evaluating resolution of scanning electron mi...

Electron Microscope System and Method for Evaluating Film Thickness...

Scanning Electron Microscope system and Method for Measuring Dimens...

SCANNING ELECTRON MICROSCOPE AND METHOD OF MEASURING PATTERN DIMENS...

METHOD FOR MEASURING A PATTERN DIMENSION

Method and Its System for Calibrating Measured Data Between Differe...

METHOD AND APPARATUS FOR INSPECTING INTEGRATED CIRCUIT PATTERN

METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF

Method And Apparatus For Observing A Specimen

METHOD AND APPARATUS FOR MEASURING PATTERN DIMENSIONS