Makoto KATO

Person

Kurokawa-gun, Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Temperature regulator and substrate treatment apparatus
- Patent number 12,020,913
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Makoto Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching layer to be etched
- Patent number 10,347,499
- Issue date Jul 9, 2019
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250140535
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Takashi KANAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240339303
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE SUPPORT
- Publication number 20240258083
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Makoto KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240194514
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Makoto KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT
- Publication number 20240087857
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20240047182
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Makoto KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, METHOD FOR MANUFACTURING UPPER ELECTRO...
- Publication number 20230023864
- Publication date Jan 26, 2023
- TOKYO ELECTRON LIMITED
- Makoto KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220415693
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Hideto SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE REGULATOR AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20220157578
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Makoto KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING LAYER TO BE ETCHED
- Publication number 20180144948
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Koji MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS

Makoto KATO

Person

Patents Grantslast 30 patents

Temperature regulator and substrate treatment apparatus

Method for etching layer to be etched

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE SUPPORT

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

PLASMA PROCESSING APPARATUS, METHOD FOR MANUFACTURING UPPER ELECTRO...

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

TEMPERATURE REGULATOR AND SUBSTRATE TREATMENT APPARATUS

METHOD FOR ETCHING LAYER TO BE ETCHED