Makoto MOMOTA

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method, and, method for producing electronic device...
- Patent number 10,126,651
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Shinichi Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,338,740
- Issue date Mar 4, 2008
- FUJIFILM Corporation
- Hajime Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern formation method using the...
- Patent number 7,279,265
- Issue date Oct 9, 2007
- FUJIFILM Corporation
- Makoto Momota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition
- Patent number 7,022,456
- Issue date Apr 4, 2006
- Fuji Photo Film Co., Ltd.
- Makoto Momota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Bottom anti-reflective coating material composition and method for...
- Patent number 6,808,869
- Issue date Oct 26, 2004
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bottom anti-reflective coating material composition for photoresist...
- Patent number 6,399,269
- Issue date Jun 4, 2002
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bottom anti-reflective coating material composition and method for...
- Patent number 6,165,684
- Issue date Dec 26, 2000
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of synthesizing polyphenol compound and positive working pho...
- Patent number 5,853,949
- Issue date Dec 29, 1998
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition
- Patent number 5,750,310
- Issue date May 12, 1998
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,747,218
- Issue date May 5, 1998
- Fuji Photo Film Co., Ltd.
- Makoto Momota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,667,932
- Issue date Sep 16, 1997
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparation of printing plate by electrophotographic pro...
- Patent number 5,601,958
- Issue date Feb 11, 1997
- Fuji Photo Film Co., Ltd.
- Eiichi Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparation of printing plate by electrophotographic pro...
- Patent number 5,589,308
- Issue date Dec 31, 1996
- Fuji Photo Film Co., Ltd.
- Eiichi Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE...
- Publication number 20150160555
- Publication date Jun 11, 2015
- FUJIFILM CORPORATION
- Shinichi SUGIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern formation method using the...
- Publication number 20040202954
- Publication date Oct 14, 2004
- Fuji Photo Film Co., Ltd.
- Makoto Momota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20040191676
- Publication date Sep 30, 2004
- Fuji Photo Film Co., Ltd.
- Hajime Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20040048190
- Publication date Mar 11, 2004
- Fuji Photo Film Co., Ltd.
- Makoto Momota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20030054287
- Publication date Mar 20, 2003
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20020172886
- Publication date Nov 21, 2002
- Fuji Photo Film Co., Ltd.
- Makoto Momota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING MATERIAL COMPOSITION FOR PHOTORESIST...
- Publication number 20020015909
- Publication date Feb 7, 2002
- KAZUYOSHI MIZUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Makoto MOMOTA

Person

Patents Grantslast 30 patents

Pattern forming method, and, method for producing electronic device...

Positive resist composition

Positive resist composition and pattern formation method using the...

Positive photoresist composition

Bottom anti-reflective coating material composition and method for...

Bottom anti-reflective coating material composition for photoresist...

Bottom anti-reflective coating material composition and method for...

Method of synthesizing polyphenol compound and positive working pho...

Positive photoresist composition

Positive photoresist composition

Positive photoresist composition

Method for preparation of printing plate by electrophotographic pro...

Method for preparation of printing plate by electrophotographic pro...

Patents Applicationslast 30 patents

PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE...

Positive resist composition and pattern formation method using the...

Positive resist composition

Positive photoresist composition

Resist composition

Positive photoresist composition

BOTTOM ANTI-REFLECTIVE COATING MATERIAL COMPOSITION FOR PHOTORESIST...