Makoto NAKAJIMA

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Coating composition for pattern inversion
- Patent number 12,084,592
- Issue date Sep 10, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroaki Yaguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist underlayer film-forming composition including cyclic carbony...
- Patent number 12,072,630
- Issue date Aug 27, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,044,969
- Issue date Jul 23, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acetal-protected silanol group-containing polysiloxane composition
- Patent number 11,884,839
- Issue date Jan 30, 2024
- NISSAN CHEMICAL CORPORATION
- Yuki Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film r...
- Patent number 11,815,815
- Issue date Nov 14, 2023
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stepped substrate coating composition containing compound having cu...
- Patent number 11,674,051
- Issue date Jun 13, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing coating agent for pattern reversal
- Patent number 11,609,499
- Issue date Mar 21, 2023
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Radiation sensitive composition
- Patent number 11,561,472
- Issue date Jan 24, 2023
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing resist pattern coating composition with use of...
- Patent number 11,531,269
- Issue date Dec 20, 2022
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device using silicon-contain...
- Patent number 11,488,824
- Issue date Nov 1, 2022
- Nissan Chemical Industries, Ltd.
- Satoshi Takeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing silicone havi...
- Patent number 11,392,037
- Issue date Jul 19, 2022
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkaline developer soluable silicon-containing resist underlayer fi...
- Patent number 11,281,104
- Issue date Mar 22, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Substrate treating composition and method for fabricating a semicon...
- Patent number 11,215,927
- Issue date Jan 4, 2022
- Samsung Electronics Co., Ltd.
- Ju-Young Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,175,583
- Issue date Nov 16, 2021
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,022,884
- Issue date Jun 1, 2021
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Planarization method for a semiconductor substrate using a silicon-...
- Patent number 10,910,220
- Issue date Feb 2, 2021
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Film-forming composition containing silicone having crosslinking re...
- Patent number 10,845,703
- Issue date Nov 24, 2020
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film forming composition for lithography containi...
- Patent number 10,838,303
- Issue date Nov 17, 2020
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for coating resist pattern
- Patent number 10,558,119
- Issue date Feb 11, 2020
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing coating agent for reversing planarization pattern
- Patent number 10,508,174
- Issue date Dec 17, 2019
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 10,372,039
- Issue date Aug 6, 2019
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film-forming composition including thermosetting resin
- Patent number 10,253,210
- Issue date Apr 9, 2019
- Nissan Chemical Industries, Ltd.
- Mamoru Tamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing resists underlayer film-forming composition havi...
- Patent number 10,197,917
- Issue date Feb 5, 2019
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coating composition for pattern reversal on soc pattern
- Patent number 10,139,729
- Issue date Nov 27, 2018
- Nissan Chemical Industries, Ltd.
- Hiroaki Yaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 10,082,735
- Issue date Sep 25, 2018
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing silicon conta...
- Patent number 10,079,146
- Issue date Sep 18, 2018
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer film-forming composition for self-assembled films
- Patent number 10,000,664
- Issue date Jun 19, 2018
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film forming composition havin...
- Patent number 9,760,006
- Issue date Sep 12, 2017
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-containing resist underlayer film-forming composition contain...
- Patent number 9,725,618
- Issue date Aug 8, 2017
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20240385521
- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...
- Publication number 20240377745
- Publication date Nov 14, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE
- Publication number 20240162086
- Publication date May 16, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLYING FILM FORMATION
- Publication number 20240069441
- Publication date Feb 29, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240004296
- Publication date Jan 4, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230359123
- Publication date Nov 9, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER
- Publication number 20230287165
- Publication date Sep 14, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230259031
- Publication date Aug 17, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DER...
- Publication number 20230203299
- Publication date Jun 29, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230176481
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER
- Publication number 20230174702
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230161246
- Publication date May 25, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152700
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152699
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20230137360
- Publication date May 4, 2023
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION SENSITIVE COMPOSITION
- Publication number 20230125270
- Publication date Apr 27, 2023
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20230112897
- Publication date Apr 13, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING
- Publication number 20230060585
- Publication date Mar 2, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...
- Publication number 20220373888
- Publication date Nov 24, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220342306
- Publication date Oct 27, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220334483
- Publication date Oct 20, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220283501
- Publication date Sep 8, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR COATING SUBSTRATE WITH LEVEL DIFFERENCE, SAID COMPO...
- Publication number 20220269176
- Publication date Aug 25, 2022
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220229368
- Publication date Jul 21, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS
- Publication number 20220206395
- Publication date Jun 30, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220187709
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220177653
- Publication date Jun 9, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FI...
- Publication number 20220155688
- Publication date May 19, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220155686
- Publication date May 19, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220146939
- Publication date May 12, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Makoto NAKAJIMA

Person

Patents Grantslast 30 patents

Coating composition for pattern inversion

Resist underlayer film-forming composition including cyclic carbony...

Resist underlayer film-forming composition

Semiconductor device production method employing silicon-containing...

Acetal-protected silanol group-containing polysiloxane composition

Composition for forming silicon-containing resist underlayer film r...

Stepped substrate coating composition containing compound having cu...

Silicon-containing coating agent for pattern reversal

Radiation sensitive composition

Method for producing resist pattern coating composition with use of...

Method for manufacturing semiconductor device using silicon-contain...

Resist underlayer film forming composition containing silicone havi...

Alkaline developer soluable silicon-containing resist underlayer fi...

Substrate treating composition and method for fabricating a semicon...

Silicon-containing resist underlayer film-forming composition havin...

Silicon-containing resist underlayer film-forming composition havin...

Planarization method for a semiconductor substrate using a silicon-...

Film-forming composition containing silicone having crosslinking re...

Resist underlayer film forming composition for lithography containi...

Composition for coating resist pattern

Silicon-containing coating agent for reversing planarization pattern

Resist underlayer film forming composition containing silicon havin...

Film-forming composition including thermosetting resin

Silicon-containing resists underlayer film-forming composition havi...

Coating composition for pattern reversal on soc pattern

Silicon-containing resist underlayer film-forming composition havin...

Resist underlayer film forming composition containing silicon conta...

Underlayer film-forming composition for self-assembled films

Silicon-containing resist underlayer film forming composition havin...

Metal-containing resist underlayer film-forming composition contain...

Patents Applicationslast 30 patents

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND S...

SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE

COMPOSITION FOR RESIST UNDERLYING FILM FORMATION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DER...

FILM-FORMING COMPOSITION

VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER

RESIST UNDERLAYER FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

RADIATION SENSITIVE COMPOSITION

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR COATING SUBSTRATE WITH LEVEL DIFFERENCE, SAID COMPO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FI...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION