Makoto Sano

Person

Ehime, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ion implantation method and ion implantation apparatus
- Patent number 10,453,689
- Issue date Oct 22, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoji Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and ion implantation apparatus
- Patent number 10,121,666
- Issue date Nov 6, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoji Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter, ion implantation method, and beam measurement apparatus
- Patent number 9,502,210
- Issue date Nov 22, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-energy ion implanter
- Patent number 9,355,847
- Issue date May 31, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer charge compensation device and ion implantation system having...
- Patent number 7,304,319
- Issue date Dec 4, 2007
- SEN Corporation, an SHI and Axcelis Company
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and method for controlling the same
- Patent number 6,984,833
- Issue date Jan 10, 2006
- Sumitomo Eaton Nova Corporation
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam charge neutralizer and method therefor
- Patent number 6,815,697
- Issue date Nov 9, 2004
- Sumitomo Eaton Nova Corporation
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
- Publication number 20170271161
- Publication date Sep 21, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoji Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
- Publication number 20170170020
- Publication date Jun 15, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoji Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS
- Publication number 20160042915
- Publication date Feb 11, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-ENERGY ION IMPLANTER
- Publication number 20140345522
- Publication date Nov 27, 2014
- SEN Corporation
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer charge compensation device and ion implantation system having...
- Publication number 20060113492
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Hiroshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter and method for controlling the same
- Publication number 20040251432
- Publication date Dec 16, 2004
- SUMITOMO EATON NOVA CORPORATION
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam charge neutralizer and method therefor
- Publication number 20030183780
- Publication date Oct 2, 2003
- SUMITOMO EATON NOVA CORPORATION
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS

Makoto Sano

Person

Patents Grantslast 30 patents

Ion implantation method and ion implantation apparatus

Ion implantation method and ion implantation apparatus

Ion implanter, ion implantation method, and beam measurement apparatus

High-energy ion implanter

Wafer charge compensation device and ion implantation system having...

Ion implanter and method for controlling the same

Ion beam charge neutralizer and method therefor

Patents Applicationslast 30 patents

ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS

HIGH-ENERGY ION IMPLANTER

Wafer charge compensation device and ion implantation system having...

Ion implanter and method for controlling the same

Ion beam charge neutralizer and method therefor