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Makoto Sugiura
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Tsuchiura-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Resin composition for making resist pattern insoluble, and method f...
Patent number
9,029,067
Issue date
May 12, 2015
JSR Corporation
Gouji Wakamatsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist underlayer film-forming composition and method for forming p...
Patent number
9,029,069
Issue date
May 12, 2015
JSR Corporation
Shin-ya Minegishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resin composition for making resist pattern insoluble, and method f...
Patent number
8,877,429
Issue date
Nov 4, 2014
JSR Corporation
Gouji Wakamatsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist underlayer film-forming composition
Patent number
8,859,185
Issue date
Oct 14, 2014
JSR Corporation
Shin-ya Minegishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method for forming pattern
Patent number
8,808,974
Issue date
Aug 19, 2014
JSR Corporation
Yukio Nishimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition
Patent number
8,802,348
Issue date
Aug 12, 2014
JSR Corporation
Noboru Otsuka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition for forming upper layer film for immersion exposure, up...
Patent number
8,697,344
Issue date
Apr 15, 2014
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming resist underlayer film and method for formi...
Patent number
8,513,133
Issue date
Aug 20, 2013
JSR Corporation
Shin-ya Minegishi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive-type radiation-sensitive composition, and resist pattern f...
Patent number
8,501,385
Issue date
Aug 6, 2013
JSR Corporation
Yusuke Anno
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition for forming upper layer film for immersion exposure, up...
Patent number
8,431,332
Issue date
Apr 30, 2013
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition and compound
Patent number
8,273,521
Issue date
Sep 25, 2012
JSR Corporation
Mitsuo Sato
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Sulfonium compound
Patent number
7,897,821
Issue date
Mar 1, 2011
JSR Corporation
Tomoki Nagai
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Compound, polymer, and radiation-sensitive composition
Patent number
7,812,105
Issue date
Oct 12, 2010
JSR Corporation
Tomoki Nagai
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation sensitive resin composition
Patent number
7,297,461
Issue date
Nov 20, 2007
JSR Corporation
Isao Nishimura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method of forming coating film, method of manufacturing semiconduct...
Patent number
6,645,881
Issue date
Nov 11, 2003
Kabushiki Kaisha Toshiba
Nobuhide Yamada
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Film-forming composition
Patent number
6,406,794
Issue date
Jun 18, 2002
JSR Corporation
Atsushi Shiota
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Coated molded article
Patent number
5,248,553
Issue date
Sep 28, 1993
Toyo Ink Manufacturing Co., Ltd.
Susumu Miyashita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
Publication number
20150004547
Publication date
Jan 1, 2015
JSR Corporation
Gouji WAKAMATSU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
Publication number
20130310514
Publication date
Nov 21, 2013
JSR Corporation
Shin-ya MINEGISHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
Publication number
20130216961
Publication date
Aug 22, 2013
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR FORMING PATTERN
Publication number
20130164695
Publication date
Jun 27, 2013
JSR Corporation
Yukio NISHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING P...
Publication number
20120270157
Publication date
Oct 25, 2012
JSR Corporation
Shin-ya Minegishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMI...
Publication number
20120252217
Publication date
Oct 4, 2012
JSR Corporation
Shin-ya MINEGISHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
Publication number
20110262865
Publication date
Oct 27, 2011
JSR Corporation
Yukio NISHIMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
Publication number
20110111349
Publication date
May 12, 2011
JSR Corporation
Gouji WAKAMATSU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN F...
Publication number
20110104612
Publication date
May 5, 2011
JSR Corporation
Yusuke ANNO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
Publication number
20110027718
Publication date
Feb 3, 2011
JSR Corporation
Mitsuo SATO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
COMPOUND
Publication number
20100324329
Publication date
Dec 23, 2010
JSR Corporation
Tomoki Nagai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
Publication number
20100255416
Publication date
Oct 7, 2010
JSR Corporation
Daita Kouno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
Publication number
20100203447
Publication date
Aug 12, 2010
JSR Corporation
Noboru Otsuka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RES...
Publication number
20100068650
Publication date
Mar 18, 2010
Yukio Nishimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPAT...
Publication number
20100009292
Publication date
Jan 14, 2010
JSR Corporation
Tomoki Nagai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Novel Compound, Polymer, and Radiation-Sensitive Composition
Publication number
20090069521
Publication date
Mar 12, 2009
JSR Corporation
Tomoki Nagai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Radiation-Sensitive Resin Composition
Publication number
20070269735
Publication date
Nov 22, 2007
Isao Nishimura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Radiation sensitive resin composition
Publication number
20050171226
Publication date
Aug 4, 2005
Isao Nishimura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Method of forming coating film, method of manufacturing semiconduct...
Publication number
20030139063
Publication date
Jul 24, 2003
Nobuhide Yamada
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...