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Makoto Toda
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Mie, JP
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last 30 patents
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Patent Grant
Method of forming thin film of amorphous silicon by plasma CVD
Patent number
5,246,744
Issue date
Sep 21, 1993
Central Glass Company, Limited
Akihisa Matsuda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...