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Mamoru Yakushiji

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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing apparatus and sample stage
    • Patent number 9,150,967
    • Issue date Oct 6, 2015
    • Hitachi High-Technologies Corporation
    • Tomoyuki Watanabe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma etching method
    • Patent number 8,889,024
    • Issue date Nov 18, 2014
    • Hitachi High-Technologies Corporation
    • Tomoyuki Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 8,801,951
    • Issue date Aug 12, 2014
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 8,741,166
    • Issue date Jun 3, 2014
    • Hitachi High-Technologies Corporation
    • Tomoyuki Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 8,580,131
    • Issue date Nov 12, 2013
    • Hitachi High-Technologies Corporation
    • Tomoyuki Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method and plasma processing apparatus
    • Patent number 8,282,848
    • Issue date Oct 9, 2012
    • Hitachi High-Technologies Corporation
    • Yutaka Ohmoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Manufacturing method in plasma processing apparatus
    • Patent number 8,092,637
    • Issue date Jan 10, 2012
    • Hitachi High-Technologies Corporation
    • Yutaka Kouzuma
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching processing method
    • Patent number 7,122,479
    • Issue date Oct 17, 2006
    • Hitachi High-Technologies Corporation
    • Yutaka Ohmoto
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching aftertreatment method
    • Patent number 7,026,252
    • Issue date Apr 11, 2006
    • Hitachi High-Technologies Corporation
    • Michinobu Mizumura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method of dry etching a sample and dry etching system
    • Patent number 7,009,714
    • Issue date Mar 7, 2006
    • Hitachi High-Technologies Corporation
    • Yutaka Ohmoto
    • G01 - MEASURING TESTING
  • Information Patent Grant

    Plasma etching system
    • Patent number 6,444,087
    • Issue date Sep 3, 2002
    • Hitachi, Ltd.
    • Makoto Nawata
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents