Manabu EDAMURA

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Scanning probe microscope
- Patent number 8,844,061
- Issue date Sep 23, 2014
- Hitachi, Ltd.
- Shuichi Baba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Scanning probe microscope
- Patent number 8,342,008
- Issue date Jan 1, 2013
- Hitachi, Ltd.
- Shuichi Baba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma processing apparatus
- Patent number 8,231,759
- Issue date Jul 31, 2012
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 8,083,889
- Issue date Dec 27, 2011
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning probe microscope
- Patent number 8,011,230
- Issue date Sep 6, 2011
- Hitachi, Ltd.
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma processing apparatus
- Patent number 7,744,721
- Issue date Jun 29, 2010
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 7,713,756
- Issue date May 11, 2010
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning probe microscope
- Patent number 7,631,548
- Issue date Dec 15, 2009
- Hitachi, Ltd.
- Shuichi Baba
- G01 - MEASURING TESTING
Information Patent Grant
Vacuum processing apparatus and vacuum processing method
- Patent number 7,194,821
- Issue date Mar 27, 2007
- Hitachi High-Technologies Corporation
- Manabu Edamura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing method and apparatus using dynamic sensing of a p...
- Patent number 6,911,157
- Issue date Jun 28, 2005
- Hitachi, Ltd.
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,850,012
- Issue date Feb 1, 2005
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,846,363
- Issue date Jan 25, 2005
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,833,051
- Issue date Dec 21, 2004
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and wafer sensor module
- Patent number 6,812,725
- Issue date Nov 2, 2004
- Hitachi, Ltd.
- Ryujiro Udo
- G01 - MEASURING TESTING
Information Patent Grant
Plasma-assisted processing apparatus
- Patent number 6,793,768
- Issue date Sep 21, 2004
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,756,737
- Issue date Jun 29, 2004
- Hitachi, Ltd.
- Akira Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,499,424
- Issue date Dec 31, 2002
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processsing apparatus
- Patent number 6,481,370
- Issue date Nov 19, 2002
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,388,382
- Issue date May 14, 2002
- Hitachi, Ltd.
- Akira Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device
- Patent number 6,245,202
- Issue date Jun 12, 2001
- Hitachi, Ltd.
- Manabu Edamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,180,019
- Issue date Jan 30, 2001
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing apparatus
- Patent number 6,172,321
- Issue date Jan 9, 2001
- Hitachi, Ltd.
- Ken Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing apparatus
- Patent number 6,034,346
- Issue date Mar 7, 2000
- Hitachi, Ltd.
- Ken Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting the temperature of a sample
- Patent number 5,556,204
- Issue date Sep 17, 1996
- Hitachi, Ltd.
- Naoyuki Tamura
- C30 - CRYSTAL GROWTH
Information Patent Grant
Semiconductor device manufacturing apparatus and method with optica...
- Patent number 5,536,359
- Issue date Jul 16, 1996
- Hitachi, Ltd.
- Hiroki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evacuation system and method therefor
- Patent number 5,259,735
- Issue date Nov 9, 1993
- Hitachi, Ltd.
- Kazue Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SCANNING PROBE MICROSCOPE
- Publication number 20140298548
- Publication date Oct 2, 2014
- Shuichi BABA
- B82 - NANO-TECHNOLOGY
Information Patent Application
SCANNING PROBE MICROSCOPE
- Publication number 20130205454
- Publication date Aug 8, 2013
- Hitachi, Ltd
- Shuichi BABA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Plasma Processing Apparatus
- Publication number 20120273136
- Publication date Nov 1, 2012
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100294432
- Publication date Nov 25, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100263796
- Publication date Oct 21, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100078130
- Publication date Apr 1, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Method For Plasma Etching
- Publication number 20090223633
- Publication date Sep 10, 2009
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Probe Microscope
- Publication number 20090158828
- Publication date Jun 25, 2009
- Shuichi BABA
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20090095423
- Publication date Apr 16, 2009
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING PROBE MICROSCOPE AND MEASUREMENT METHOD OF SAME
- Publication number 20080245139
- Publication date Oct 9, 2008
- Takafumi Morimoto
- G01 - MEASURING TESTING
Information Patent Application
SCANNING PROBE MICROSCOPE
- Publication number 20080223122
- Publication date Sep 18, 2008
- Masahiro Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Scanning Probe Microscope
- Publication number 20070266780
- Publication date Nov 22, 2007
- SHUICHI BABA
- G01 - MEASURING TESTING
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20070240825
- Publication date Oct 18, 2007
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20070184563
- Publication date Aug 9, 2007
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20060175016
- Publication date Aug 10, 2006
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and vacuum processing method
- Publication number 20060168844
- Publication date Aug 3, 2006
- Manabu Edamura
- G05 - CONTROLLING REGULATING
Information Patent Application
Wafer processing apparatus capable of controlling wafer temperature
- Publication number 20060042757
- Publication date Mar 2, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050224182
- Publication date Oct 13, 2005
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for plasma etching
- Publication number 20050028934
- Publication date Feb 10, 2005
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040163595
- Publication date Aug 26, 2004
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing apparatus, wafer stage, and wafer processing method
- Publication number 20040045813
- Publication date Mar 11, 2004
- Seiichiro Kanno
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Plasma processing method and apparatus for etching nonvolatile mate...
- Publication number 20040040662
- Publication date Mar 4, 2004
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing apparatus and wafer sensor module
- Publication number 20030160628
- Publication date Aug 28, 2003
- Ryujiro Udo
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing method and apparatus using dynamic sensing of a p...
- Publication number 20030132195
- Publication date Jul 17, 2003
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20030057845
- Publication date Mar 27, 2003
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20020134510
- Publication date Sep 26, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20020125828
- Publication date Sep 12, 2002
- Akira Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20020124963
- Publication date Sep 12, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-assisted processing apparatus
- Publication number 20020104482
- Publication date Aug 8, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20020084035
- Publication date Jul 4, 2002
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS

Manabu EDAMURA

Person

Patents Grantslast 30 patents

Scanning probe microscope

Scanning probe microscope

Plasma processing apparatus

Apparatus and method for plasma etching

Scanning probe microscope

Plasma processing apparatus

Apparatus and method for plasma etching

Scanning probe microscope

Vacuum processing apparatus and vacuum processing method

Plasma processing method and apparatus using dynamic sensing of a p...

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Semiconductor processing apparatus and wafer sensor module

Plasma-assisted processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processsing apparatus

Plasma processing apparatus and method

Plasma treatment device

Plasma processing apparatus and method

Method and apparatus for plasma processing apparatus

Method and apparatus for plasma processing apparatus

Method and apparatus for detecting the temperature of a sample

Semiconductor device manufacturing apparatus and method with optica...

Evacuation system and method therefor

Patents Applicationslast 30 patents

SCANNING PROBE MICROSCOPE

SCANNING PROBE MICROSCOPE

Plasma Processing Apparatus

Plasma Processing Apparatus

Plasma Processing Apparatus

Plasma Processing Apparatus

Apparatus And Method For Plasma Etching

Scanning Probe Microscope

APPARATUS AND METHOD FOR PLASMA ETCHING

SCANNING PROBE MICROSCOPE AND MEASUREMENT METHOD OF SAME

SCANNING PROBE MICROSCOPE

Scanning Probe Microscope

Wafer processing apparatus capable of controlling wafer temperature

APPARATUS AND METHOD FOR PLASMA ETCHING

Plasma processing apparatus

Vacuum processing apparatus and vacuum processing method

Wafer processing apparatus capable of controlling wafer temperature

Plasma processing apparatus

Apparatus and method for plasma etching

Plasma processing apparatus

Wafer processing apparatus, wafer stage, and wafer processing method

Plasma processing method and apparatus for etching nonvolatile mate...

Semiconductor processing apparatus and wafer sensor module

Plasma processing method and apparatus using dynamic sensing of a p...

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma-assisted processing apparatus

Plasma processing apparatus and method