Manabu IWATA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and measurement method
- Patent number 11,908,665
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,529,539
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,264,662
- Issue date Apr 16, 2019
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,141,164
- Issue date Nov 27, 2018
- Tokyo Electron Limited
- Yasuharu Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 9,490,105
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,484,180
- Issue date Nov 1, 2016
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,099,503
- Issue date Aug 4, 2015
- Tokyo Electron Limited
- Manabu Iwata
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Chamber cleaning method
- Patent number 8,999,068
- Issue date Apr 7, 2015
- Tokyo Electron Limited
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,790,490
- Issue date Jul 29, 2014
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,603,293
- Issue date Dec 10, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,513,563
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method, and storage medium
- Patent number 8,440,050
- Issue date May 14, 2013
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,431,035
- Issue date Apr 30, 2013
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-chamber member temperature control method, in-chamber member, su...
- Patent number 8,425,791
- Issue date Apr 23, 2013
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of controlling distribution...
- Patent number 8,377,255
- Issue date Feb 19, 2013
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of plasma distribution corre...
- Patent number 8,343,306
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Satoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,317,969
- Issue date Nov 27, 2012
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma etching method
- Patent number 8,303,834
- Issue date Nov 6, 2012
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,251,011
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,138,445
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,137,471
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,034,213
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,988,816
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,951,262
- Issue date May 31, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,829,463
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,740,737
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,527,016
- Issue date May 5, 2009
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH-THROUGHPUT DRY ETCHING OF SILICON OXIDE AND SILICON NITRIDE MA...
- Publication number 20210233775
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEASUREMENT METHOD
- Publication number 20210166920
- Publication date Jun 3, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200111645
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20170032936
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160379805
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160358753
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND FOCUS RING
- Publication number 20150162170
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Hiroki KISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150090692
- Publication date Apr 2, 2015
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150069910
- Publication date Mar 12, 2015
- TOKYO ELECTRON LIMITED
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140326409
- Publication date Nov 6, 2014
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140124139
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130199727
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Manabu IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120145679
- Publication date Jun 14, 2012
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20120145324
- Publication date Jun 14, 2012
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110272097
- Publication date Nov 10, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110214815
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER CLEANING METHOD
- Publication number 20110048453
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF CONTROLLING DISTRIBUTION...
- Publication number 20100176086
- Publication date Jul 15, 2010
- TOKYO ELECTRON LIMITED
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20100126668
- Publication date May 27, 2010
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-CHAMBER MEMBER TEMPERATURE CONTROL METHOD, IN-CHAMBER MEMBER, SU...
- Publication number 20100000970
- Publication date Jan 7, 2010
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090242134
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20090242515
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD, AND COMPUTER-READABLE STORAGE...
- Publication number 20090242127
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090242133
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Hiroyuki Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20090223933
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD, AND STORAGE MEDIUM
- Publication number 20090206058
- Publication date Aug 20, 2009
- TOKYO ELECTRON LIMITED
- Manabu IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090101283
- Publication date Apr 23, 2009
- TOKYO ELECTRON LIMITED
- Manabu IWATA
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF PLASMA DISTRIBUTION CORRE...
- Publication number 20090026170
- Publication date Jan 29, 2009
- TOKYO ELECTRON LIMITED
- Satoshi TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20070236148
- Publication date Oct 11, 2007
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS

Manabu IWATA

Person

Patents Grantslast 30 patents

Plasma processing apparatus and measurement method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Chamber cleaning method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method, and storage medium

Plasma processing apparatus and method

In-chamber member temperature control method, in-chamber member, su...

Plasma processing apparatus and method of controlling distribution...

Plasma processing apparatus and method of plasma distribution corre...

Plasma processing apparatus

Plasma processing apparatus and plasma etching method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus

Patents Applicationslast 30 patents

HIGH-THROUGHPUT DRY ETCHING OF SILICON OXIDE AND SILICON NITRIDE MA...

PLASMA PROCESSING APPARATUS AND MEASUREMENT METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND FOCUS RING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

CHAMBER CLEANING METHOD

PLASMA PROCESSING APPARATUS AND METHOD OF CONTROLLING DISTRIBUTION...

PLASMA PROCESSING APPARATUS AND METHOD

IN-CHAMBER MEMBER TEMPERATURE CONTROL METHOD, IN-CHAMBER MEMBER, SU...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD

PLASMA ETCHING APPARATUS AND METHOD, AND COMPUTER-READABLE STORAGE...

ELECTRODE STRUCTURE AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD, AND STORAGE MEDIUM

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD OF PLASMA DISTRIBUTION CORRE...

PLASMA PROCESSING APPARATUS