Manabu Sato

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing apparatus
- Patent number 11,121,000
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,529,539
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 9,490,105
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,412,617
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Kazuki Narishige
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,384,992
- Issue date Jul 5, 2016
- Tokyo Electron Limited
- Kazuki Narishige
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, and storage...
- Patent number 9,362,090
- Issue date Jun 7, 2016
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and computer-readable sto...
- Patent number 9,355,861
- Issue date May 31, 2016
- Tokyo Electron Limited
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and computer-readable sto...
- Patent number 8,735,299
- Issue date May 27, 2014
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,603,293
- Issue date Dec 10, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing method
- Patent number 8,404,595
- Issue date Mar 26, 2013
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and computer-readable storage medium
- Patent number 8,128,831
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,988,816
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,951,262
- Issue date May 31, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,883,632
- Issue date Feb 8, 2011
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and apparatus
- Patent number 7,452,823
- Issue date Nov 18, 2008
- Tokyo Electron Limited
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220262601
- Publication date Aug 18, 2022
- TOKYO ELECTRON LIMITED
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210043461
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200111645
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20170032936
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160379805
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150303069
- Publication date Oct 22, 2015
- TOKYO ELECTRON LIMITED
- Kazuki Narishige
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STO...
- Publication number 20150056816
- Publication date Feb 26, 2015
- TOKYO ELECTRON LIMITED
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS AND S...
- Publication number 20150011094
- Publication date Jan 8, 2015
- TOKYO ELECTRON LIMITED
- Kazuki Narishige
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140124139
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130213572
- Publication date Aug 22, 2013
- TOKYO ELECTRON LIMITED
- Masanobu HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STO...
- Publication number 20120225561
- Publication date Sep 6, 2012
- TOKYO ELECTRON LIMITED
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110272097
- Publication date Nov 10, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110214815
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND STORAGE...
- Publication number 20110088850
- Publication date Apr 21, 2011
- TOKYO ELECTRON LIMITED
- Masanobu HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20080233757
- Publication date Sep 25, 2008
- TOKYO ELECTRON LIMITED
- Masanobu HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND STORAGE...
- Publication number 20070221493
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Masanobu HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM
- Publication number 20070165355
- Publication date Jul 19, 2007
- TOKYO ELECTON LIMITED
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and apparatus
- Publication number 20060205216
- Publication date Sep 14, 2006
- TOKYO ELECTRON LIMITED
- Manabu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20060066247
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20060037703
- Publication date Feb 23, 2006
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching and apparatus for doing same
- Publication number 20030192857
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Noriiki Masuda
- H01 - BASIC ELECTRIC ELEMENTS

Manabu Sato

Person

Patents Grantslast 30 patents

Etching method and plasma processing apparatus

Etching method and substrate processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing method and plasma processing apparatus

Plasma processing method

Plasma processing apparatus, plasma processing method, and storage...

Semiconductor device manufacturing method and computer-readable sto...

Semiconductor device manufacturing method and computer-readable sto...

Plasma processing apparatus and method

Plasma processing method

Plasma etching method and computer-readable storage medium

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing method

Etching method and apparatus

Patents Applicationslast 30 patents

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STO...

MANUFACTURING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS AND S...

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STO...

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND STORAGE...

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND STORAGE...

PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM

Etching method and apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Method of etching and apparatus for doing same