Manabu TAKAKUWA

Person

Tsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor wafer, manufacturing method for semiconductor wafer,...
- Patent number 11,984,313
- Issue date May 14, 2024
- Kioxia Corporation
- Takashi Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method of manufacturing s...
- Patent number 11,935,775
- Issue date Mar 19, 2024
- Kioxia Corporation
- Satoshi Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position measuring apparatus and measuring method
- Patent number 11,715,660
- Issue date Aug 1, 2023
- Kioxia Corporation
- Manabu Takakuwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method, exposure apparatus, and semiconductor device manuf...
- Patent number 11,460,765
- Issue date Oct 4, 2022
- Kioxia Corporation
- Hayato Terai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate bonding apparatus
- Patent number 11,267,237
- Issue date Mar 8, 2022
- Kioxia Corporation
- Hayato Terai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Template, imprint apparatus, imprint method and imprint apparatus m...
- Patent number 11,152,218
- Issue date Oct 19, 2021
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus, exposure method, and semiconductor device manuf...
- Patent number 10,921,722
- Issue date Feb 16, 2021
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning support system, patterning method, and nonvolatile recor...
- Patent number 10,627,726
- Issue date Apr 21, 2020
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate measurement system, method of measuring substrate, and co...
- Patent number 10,295,409
- Issue date May 21, 2019
- TOSHIBA MEMORY CORPORATION
- Miki Toshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method, pattern formation system, and exposure device
- Patent number 10,283,392
- Issue date May 7, 2019
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement method, measurement program, and measurement system
- Patent number 10,276,459
- Issue date Apr 30, 2019
- TOSHIBA MEMORY CORPORATION
- Kenji Konomi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imprint apparatus and imprint method
- Patent number 10,241,397
- Issue date Mar 26, 2019
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprinting apparatus and imprinting method
- Patent number 10,093,044
- Issue date Oct 9, 2018
- TOSHIBA MEMORY CORPORATION
- Yoshio Mizuta
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Deposition supporting system, depositing apparatus and manufacturin...
- Patent number 9,966,316
- Issue date May 8, 2018
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment method, pattern formation system, and exposure device
- Patent number 9,966,284
- Issue date May 8, 2018
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint device and pattern forming method
- Patent number 9,952,505
- Issue date Apr 24, 2018
- TOSHIBA MEMORY CORPORATION
- Yosuke Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern accuracy detecting apparatus and processing system
- Patent number 9,941,177
- Issue date Apr 10, 2018
- TOSHIBA MEMORY CORPORATION
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positional deviation measuring device, non-transitory computer-read...
- Patent number 9,784,573
- Issue date Oct 10, 2017
- TOSHIBA MEMORY CORPORATION
- Hidenori Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask processing apparatus and mask processing method
- Patent number 9,632,407
- Issue date Apr 25, 2017
- Kabushiki Kaisha Yoshiba
- Hidenori Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint method and imprint system
- Patent number 9,541,847
- Issue date Jan 10, 2017
- Kabushiki Kaisha Toshiba
- Masato Suzuki
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Reticle mark arrangement method and nontransitory computer readable...
- Patent number 9,396,299
- Issue date Jul 19, 2016
- Kabushiki Kaisha Toshiba
- Shinichi Nakagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imprint method and imprint apparatus
- Patent number 9,240,336
- Issue date Jan 19, 2016
- Kabushiki Kaisha Toshiba
- Manabu Takakuwa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Substrate holding apparatus, pattern transfer apparatus, and patter...
- Patent number 9,188,879
- Issue date Nov 17, 2015
- Kabushiki Kaisha Toshiba
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method for manufacturing semiconductor device usi...
- Patent number 9,087,875
- Issue date Jul 21, 2015
- Kabushiki Kaisha Toshiba
- Manabu Takakuwa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Exposure apparatus, exposure method, and method of manufacturing se...
- Patent number 8,953,163
- Issue date Feb 10, 2015
- Kabushiki Kaisha Toshiba
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method, pattern formation apparatus, and recordin...
- Patent number 8,765,034
- Issue date Jul 1, 2014
- Kabushiki Kaisha Toshiba
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposing method
- Patent number 6,842,230
- Issue date Jan 11, 2005
- Kabushiki Kaisha Toshiba
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting projection optical system and method of manufa...
- Patent number 6,741,327
- Issue date May 25, 2004
- Kabushiki Kaisha Toshiba
- Hiroshi Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEASURING DEVICE AND MEASURING METHOD
- Publication number 20240231244
- Publication date Jul 11, 2024
- KIOXIA Corporation
- Hiroyuki TANIZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR STRUCTURE BODY AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20230408936
- Publication date Dec 21, 2023
- KIOXIA Corporation
- Manabu TAKAKUWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR WAFER, MANUFACTURING METHOD FOR SEMICONDUCTOR WAFER,...
- Publication number 20220216051
- Publication date Jul 7, 2022
- KIOXIA Corporation
- Takashi KOIKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITION MEASURING APPARATUS AND MEASURING METHOD
- Publication number 20220084864
- Publication date Mar 17, 2022
- KIOXIA Corporation
- Manabu TAKAKUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE METHOD, EXPOSURE APPARATUS, AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20210294205
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Hayato TERAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20210296152
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Satoshi NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE BONDING APPARATUS
- Publication number 20210078317
- Publication date Mar 18, 2021
- KIOXIA Corporation
- Hayato TERAI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR WAFER, MANUFACTURING METHOD FOR SEMICONDUCTOR WAFER,...
- Publication number 20210066068
- Publication date Mar 4, 2021
- Kioxia Corporation
- Takashi KOIKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING SUPPORT SYSTEM, PATTERNING METHOD, AND NONVOLATILE RECOR...
- Publication number 20200019073
- Publication date Jan 16, 2020
- Toshiba Memory Corporation
- Manabu TAKAKUWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20190271922
- Publication date Sep 5, 2019
- Toshiba Memory Corporation
- Manabu TAKAKUWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT METHOD, MEASUREMENT PROGRAM, AND MEASUREMENT SYSTEM
- Publication number 20180269116
- Publication date Sep 20, 2018
- Toshiba Memory Corporation
- Kenji KONOMI
- G02 - OPTICS
Information Patent Application
ALIGNMENT METHOD, PATTERN FORMATION SYSTEM, AND EXPOSURE DEVICE
- Publication number 20180233389
- Publication date Aug 16, 2018
- Toshiba Memory Corporation
- Manabu TAKAKUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION SUPPORTING SYSTEM, DEPOSITING APPARATUS AND MANUFACTURIN...
- Publication number 20170345727
- Publication date Nov 30, 2017
- Toshiba Memory Corporation
- Manabu TAKAKUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN ACCURACY DETECTING APPARATUS AND PROCESSING SYSTEM
- Publication number 20170271214
- Publication date Sep 21, 2017
- Kabushiki Kaisha Toshiba
- Kentaro KASA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE MEASUREMENT SYSTEM, METHOD OF MEASURING SUBSTRATE, AND CO...
- Publication number 20170235232
- Publication date Aug 17, 2017
- KABUSHIKI KAISHA TOSHIBA
- Miki TOSHIMA
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT METHOD, PATTERN FORMATION SYSTEM, AND EXPOSURE DEVICE
- Publication number 20170148656
- Publication date May 25, 2017
- KABUSHIKI KAISHA TOSHIBA
- Manabu TAKAKUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINTING APPARATUS AND IMPRINTING METHOD
- Publication number 20170050351
- Publication date Feb 23, 2017
- KABUSHIKI KAISHA TOSHIBA
- Yoshio MIZUTA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TEMPLATE, IMPRINT APPARATUS, IMPRINT METHOD AND IMPRINT APPARATUS M...
- Publication number 20170040196
- Publication date Feb 9, 2017
- KABUSHIKI KAISHA TOSHIBA
- Manabu TAKAKUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIONAL DEVIATION MEASURING DEVICE, NON-TRANSITORY COMPUTER-READ...
- Publication number 20160245645
- Publication date Aug 25, 2016
- KABUSHIKI KAISHA TOSHIBA
- Hidenori SATO
- G01 - MEASURING TESTING
Information Patent Application
MASK PROCESSING APPARATUS, MASK PROCESSING METHOD AND RECORDING MEDIUM
- Publication number 20160018730
- Publication date Jan 21, 2016
- KABUSHIKI KAISHA TOSHIBA
- Hidenori Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS AND IMPRINT METHOD
- Publication number 20160009020
- Publication date Jan 14, 2016
- KABUSHIKI KAISHA TOSHIBA
- Manabu Takakuwa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RETICLE MARK ARRANGEMENT METHOD AND NONTRANSITORY COMPUTER READABLE...
- Publication number 20150339423
- Publication date Nov 26, 2015
- KABUSHIKI KAISHA TOSHIBA
- Shinichi Nakagawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPRINT DEVICE AND PATTERN FORMING METHOD
- Publication number 20150251350
- Publication date Sep 10, 2015
- KABUSHIKI KAISHA TOSHIBA
- Yosuke OKAMOTO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT METHOD AND IMPRINT APPARATUS
- Publication number 20150170922
- Publication date Jun 18, 2015
- KABUSHIKI KAISHA TOSHIBA
- MANABU TAKAKUWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERN FORMATION METHOD AND PATTERN FORMATION APPARATUS
- Publication number 20140340660
- Publication date Nov 20, 2014
- Masato SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20140242799
- Publication date Aug 28, 2014
- Manabu TAKAKUWA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ALIGNMENT MEASUREMENT SYSTEM, OVERLAY MEASUREMENT SYSTEM, AND METHO...
- Publication number 20140094015
- Publication date Apr 3, 2014
- Kabushiki Kaisha Toshiba
- Kentaro KASA
- G01 - MEASURING TESTING
Information Patent Application
PATTERN FORMATION METHOD, PATTERN FORMATION APPARATUS, AND RECORDIN...
- Publication number 20140071413
- Publication date Mar 13, 2014
- Kabushiki Kaisha Toshiba
- Manabu TAKAKUWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING SE...
- Publication number 20140065528
- Publication date Mar 6, 2014
- Kabushiki Kaisha Toshiba
- Kentaro KASA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTER...
- Publication number 20130222782
- Publication date Aug 29, 2013
- Kentaro KASA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Manabu TAKAKUWA

Person

Patents Grantslast 30 patents

Semiconductor wafer, manufacturing method for semiconductor wafer,...

Semiconductor manufacturing apparatus and method of manufacturing s...

Position measuring apparatus and measuring method

Exposure method, exposure apparatus, and semiconductor device manuf...

Substrate bonding apparatus

Template, imprint apparatus, imprint method and imprint apparatus m...

Exposure apparatus, exposure method, and semiconductor device manuf...

Patterning support system, patterning method, and nonvolatile recor...

Substrate measurement system, method of measuring substrate, and co...

Alignment method, pattern formation system, and exposure device

Measurement method, measurement program, and measurement system

Imprint apparatus and imprint method

Imprinting apparatus and imprinting method

Deposition supporting system, depositing apparatus and manufacturin...

Alignment method, pattern formation system, and exposure device

Imprint device and pattern forming method

Pattern accuracy detecting apparatus and processing system

Positional deviation measuring device, non-transitory computer-read...

Mask processing apparatus and mask processing method

Imprint method and imprint system

Reticle mark arrangement method and nontransitory computer readable...

Imprint method and imprint apparatus

Substrate holding apparatus, pattern transfer apparatus, and patter...

Pattern formation method for manufacturing semiconductor device usi...

Exposure apparatus, exposure method, and method of manufacturing se...

Pattern formation method, pattern formation apparatus, and recordin...

Exposing method

Method of correcting projection optical system and method of manufa...

Patents Applicationslast 30 patents

MEASURING DEVICE AND MEASURING METHOD

SEMICONDUCTOR STRUCTURE BODY AND METHOD FOR MANUFACTURING SEMICONDU...

SEMICONDUCTOR WAFER, MANUFACTURING METHOD FOR SEMICONDUCTOR WAFER,...

POSITION MEASURING APPARATUS AND MEASURING METHOD

EXPOSURE METHOD, EXPOSURE APPARATUS, AND SEMICONDUCTOR DEVICE MANUF...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

SUBSTRATE BONDING APPARATUS

SEMICONDUCTOR WAFER, MANUFACTURING METHOD FOR SEMICONDUCTOR WAFER,...

PATTERNING SUPPORT SYSTEM, PATTERNING METHOD, AND NONVOLATILE RECOR...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND SEMICONDUCTOR DEVICE MANUF...

MEASUREMENT METHOD, MEASUREMENT PROGRAM, AND MEASUREMENT SYSTEM

ALIGNMENT METHOD, PATTERN FORMATION SYSTEM, AND EXPOSURE DEVICE

DEPOSITION SUPPORTING SYSTEM, DEPOSITING APPARATUS AND MANUFACTURIN...

PATTERN ACCURACY DETECTING APPARATUS AND PROCESSING SYSTEM

SUBSTRATE MEASUREMENT SYSTEM, METHOD OF MEASURING SUBSTRATE, AND CO...

ALIGNMENT METHOD, PATTERN FORMATION SYSTEM, AND EXPOSURE DEVICE

IMPRINTING APPARATUS AND IMPRINTING METHOD

TEMPLATE, IMPRINT APPARATUS, IMPRINT METHOD AND IMPRINT APPARATUS M...

POSITIONAL DEVIATION MEASURING DEVICE, NON-TRANSITORY COMPUTER-READ...

MASK PROCESSING APPARATUS, MASK PROCESSING METHOD AND RECORDING MEDIUM

IMPRINT APPARATUS AND IMPRINT METHOD

RETICLE MARK ARRANGEMENT METHOD AND NONTRANSITORY COMPUTER READABLE...

IMPRINT DEVICE AND PATTERN FORMING METHOD

IMPRINT METHOD AND IMPRINT APPARATUS

PATTERN FORMATION METHOD AND PATTERN FORMATION APPARATUS

PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR...

ALIGNMENT MEASUREMENT SYSTEM, OVERLAY MEASUREMENT SYSTEM, AND METHO...

PATTERN FORMATION METHOD, PATTERN FORMATION APPARATUS, AND RECORDIN...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING SE...

SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTER...