Mandar Mudholkar

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for monitoring and adjusting chamber impedance
- Patent number 7,004,107
- Issue date Feb 28, 2006
- Applied Materials Inc.
- Sébastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed frequency CVD process
- Patent number 6,358,573
- Issue date Mar 19, 2002
- Applied Materials, Inc.
- Sebastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of an asymmetric waveform to control ion bombardment during sub...
- Patent number 6,162,709
- Issue date Dec 19, 2000
- Applied Materials, Inc.
- Sebastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing chamber with tunable impedance
- Patent number 6,136,388
- Issue date Oct 24, 2000
- Applied Materials, Inc.
- Sebastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed frequency CVD apparatus
- Patent number 6,098,568
- Issue date Aug 8, 2000
- Applied Materials, Inc.
- Sebastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of an asymmetric waveform to control ion bombardment during sub...
- Patent number 6,041,734
- Issue date Mar 28, 2000
- Applied Materials, Inc.
- Sebastien Raoux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mandar Mudholkar

Person

Patents Grantslast 30 patents

Method and apparatus for monitoring and adjusting chamber impedance

Mixed frequency CVD process

Use of an asymmetric waveform to control ion bombardment during sub...

Substrate processing chamber with tunable impedance

Mixed frequency CVD apparatus

Use of an asymmetric waveform to control ion bombardment during sub...