Manfred Gawein Tenner

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Deformation pattern recognition method, pattern transferring method...
- Patent number 9,753,377
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Hakki Ergun Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment target contrast in a lithographic double patterning process
- Patent number 8,980,724
- Issue date Mar 17, 2015
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Improving alignment target contrast in a lithographic double patter...
- Patent number 8,709,908
- Issue date Apr 29, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for increasing alignment target contrast
- Patent number 8,625,096
- Issue date Jan 7, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark and a method of aligning a substrate comprising such...
- Patent number 8,208,121
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment device and lithographic apparatus provided with such a de...
- Patent number 5,917,604
- Issue date Jun 29, 1999
- U.S. Philips Corporation
- Peter Dirksen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining the radiation dose in a lithographic apparatus
- Patent number 5,910,847
- Issue date Jun 8, 1999
- U.S. Philips Corporation
- Jan E. van der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of repetitively imaging a mask pattern on a substrate, and a...
- Patent number 5,673,101
- Issue date Sep 30, 1997
- U.S. Philips Corporation
- Manfred G. Tenner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-source unit for generating a beam having two directions o...
- Patent number 5,485,272
- Issue date Jan 16, 1996
- U.S. Philips Corporation
- Peter Dirksen
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
DEFORMATION PATTERN RECOGNITION METHOD, PATTERN TRANSFERRING METHOD...
- Publication number 20150205213
- Publication date Jul 23, 2015
- ASML NETHERLANDS B.V.
- Hakki Ergun Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20140192333
- Publication date Jul 10, 2014
- ASML NETHERLANDS B.V.
- Harry SEWELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CALCULATING MODEL PARAMETERS OF A SUBSTRATE, A LITHOGRAPH...
- Publication number 20120218533
- Publication date Aug 30, 2012
- ASML NETHERLANDS B.V.
- Irina LYULINA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Increasing Alignment Target Contrast
- Publication number 20110075238
- Publication date Mar 31, 2011
- ASML NETHERLANDS B.V.
- Harry SEWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20100301458
- Publication date Dec 2, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Mark and a Method of Aligning a Substrate Comprising Such...
- Publication number 20090195768
- Publication date Aug 6, 2009
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring the overlay error, an inspection apparatus and...
- Publication number 20090073448
- Publication date Mar 19, 2009
- ASML NETHERLANDS B.V.
- Manfred Gawein Tenner
- G01 - MEASURING TESTING

Manfred Gawein Tenner

Person

Patents Grantslast 30 patents

Deformation pattern recognition method, pattern transferring method...

Alignment target contrast in a lithographic double patterning process

Improving alignment target contrast in a lithographic double patter...

Method and system for increasing alignment target contrast

Alignment mark and a method of aligning a substrate comprising such...

Alignment device and lithographic apparatus provided with such a de...

Method of determining the radiation dose in a lithographic apparatus

Method of repetitively imaging a mask pattern on a substrate, and a...

Radiation-source unit for generating a beam having two directions o...

Patents Applicationslast 30 patents

DEFORMATION PATTERN RECOGNITION METHOD, PATTERN TRANSFERRING METHOD...

Alignment Target Contrast in a Lithographic Double Patterning Process

METHOD OF CALCULATING MODEL PARAMETERS OF A SUBSTRATE, A LITHOGRAPH...

Method and System for Increasing Alignment Target Contrast

Alignment Target Contrast in a Lithographic Double Patterning Process

Alignment Mark and a Method of Aligning a Substrate Comprising Such...

Method of measuring the overlay error, an inspection apparatus and...