Manfred Maul

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 10,146,135
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Illumination system for microlithography
- Patent number 10,088,754
- Issue date Oct 2, 2018
- Carl Zeiss SMT GmbH
- Axel Scholz
- G02 - OPTICS
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 10,054,786
- Issue date Aug 21, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,964,856
- Issue date May 8, 2018
- Carl Zeiss SMT GmbH
- Manfred Maul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source for generating a usable output beam for a projecti...
- Patent number 9,955,563
- Issue date Apr 24, 2018
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,897,925
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,766,553
- Issue date Sep 19, 2017
- Carl Zeiss SMT GmbH
- Manfred Maul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,753,375
- Issue date Sep 5, 2017
- Carl Zeiss SMT GmbH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,746,779
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Manfred Maul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,720,327
- Issue date Aug 1, 2017
- Carl Zeiss SMT GmbH
- Manfred Maul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for microlithography
- Patent number 9,606,441
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 9,575,414
- Issue date Feb 21, 2017
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 9,366,857
- Issue date Jun 14, 2016
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Illumination system for microlithography
- Patent number 9,280,060
- Issue date Mar 8, 2016
- Carl Zeiss SMT GmbH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,239,229
- Issue date Jan 19, 2016
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 9,217,930
- Issue date Dec 22, 2015
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,170,499
- Issue date Oct 27, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,116,441
- Issue date Aug 25, 2015
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,052,606
- Issue date Jun 9, 2015
- Carl Zeiss SMT GmbH
- Andras G. Major
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,019,475
- Issue date Apr 28, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,013,684
- Issue date Apr 21, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,001,309
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,928,859
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,891,057
- Issue date Nov 18, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for microlithography
- Patent number 8,873,023
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 8,811,568
- Issue date Aug 19, 2014
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Correction of optical elements by correction light irradiated in a...
- Patent number 8,760,744
- Issue date Jun 24, 2014
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 8,730,455
- Issue date May 20, 2014
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 8,724,086
- Issue date May 13, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Filter device for the compensation of an asymmetric pupil illumination
- Patent number 8,636,386
- Issue date Jan 28, 2014
- Carl Zeiss SMT GmbH
- Manfred Maul
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20180246415
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Stefan Xalter
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
SPECTACLE LENS FOR A DISPLAY DEVICE THAT CAN BE FITTED ON THE HEAD...
- Publication number 20170192238
- Publication date Jul 6, 2017
- CARL ZEISS SMART OPTICS GMBH
- Lisa RIEDEL
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20170192361
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Axel Scholz
- G02 - OPTICS
Information Patent Application
METHOD FOR ADJUSTING A DISPLAY DEVICE
- Publication number 20170038594
- Publication date Feb 9, 2017
- CARL ZEISS SMART OPTICS GMBH
- Ersun KARTAL
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20160266502
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...
- Publication number 20160259161
- Publication date Sep 8, 2016
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20160161858
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20160077446
- Publication date Mar 17, 2016
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G02 - OPTICS
Information Patent Application
Illumination Optical Unit For Projection Lithography
- Publication number 20150355555
- Publication date Dec 10, 2015
- Carl Zeiss SMT GMBH
- Manfred Maul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination Optical Unit For Projection Lithography
- Publication number 20150346604
- Publication date Dec 3, 2015
- Carl Zeiss SMT GMBH
- Manfred Maul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20150300807
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20150253677
- Publication date Sep 10, 2015
- Carl Zeiss SMT GMBH
- Manfred Maul
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...
- Publication number 20150177623
- Publication date Jun 25, 2015
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTI...
- Publication number 20150173163
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20150153654
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...
- Publication number 20150062682
- Publication date Mar 5, 2015
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20150055110
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Manfred Maul
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20150022798
- Publication date Jan 22, 2015
- Carl Zeiss SMT GMBH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20150015862
- Publication date Jan 15, 2015
- Carl Zeiss SMT GMBH
- Axel Scholz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140233006
- Publication date Aug 21, 2014
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140226141
- Publication date Aug 14, 2014
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140211188
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...
- Publication number 20140078567
- Publication date Mar 20, 2014
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION
- Publication number 20130278913
- Publication date Oct 24, 2013
- Manfred Maul
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20130148092
- Publication date Jun 13, 2013
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20130077074
- Publication date Mar 28, 2013
- Carl Zeiss SMT GMBH
- Andras G. Major
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20120293784
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120293786
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION
- Publication number 20120281198
- Publication date Nov 8, 2012
- Carl Zeiss SMT GMBH
- Manfred Maul
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120188527
- Publication date Jul 26, 2012
- Carl Zeiss SMT GMBH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Manfred Maul

Person

Patents Grantslast 30 patents

Microlithographic projection exposure apparatus having a multi-mirr...

Illumination system for microlithography

Correction of optical elements by correction light irradiated in a...

Illumination optical unit for projection lithography

EUV light source for generating a usable output beam for a projecti...

Method and device for monitoring multiple mirror arrays in an illum...

Illumination optical unit for projection lithography

Illumination optical unit for projection lithography

Illumination optical unit for projection lithography

Optical system of a microlithographic projection exposure apparatus

Illumination system for microlithography

Illumination system for a microlithographic projection exposure app...

Correction of optical elements by correction light irradiated in a...

Illumination system for microlithography

Method and device for monitoring multiple mirror arrays in an illum...

Illumination system for a microlithographic projection exposure app...

Illumination system of a microlithographic projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Illumination system of a microlithographic projection exposure appa...

Microlithographic projection exposure apparatus

Illumination system for microlithography

Correction of optical elements by correction light irradiated in a...

Correction of optical elements by correction light irradiated in a...

Illumination system for a microlithographic projection exposure app...

Microlithographic projection exposure apparatus having a multi-mirr...

Filter device for the compensation of an asymmetric pupil illumination

Patents Applicationslast 30 patents

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

SPECTACLE LENS FOR A DISPLAY DEVICE THAT CAN BE FITTED ON THE HEAD...

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

METHOD FOR ADJUSTING A DISPLAY DEVICE

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

Illumination Optical Unit For Projection Lithography

Illumination Optical Unit For Projection Lithography

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...

EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTI...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

CORRECTION OF OPTICAL ELEMENTS BY CORRECTION LIGHT IRRADIATED IN A...

FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...