Membership
Tour
Register
Log in
Manfred Oswald
Follow
Person
Tharandt, DE
People
Overview
Industries
Organizations
People
Information
Impact
Patents Applications
last 30 patents
Information
Patent Application
ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES
Publication number
20100099266
Publication date
Apr 22, 2010
Applied Materials, Inc.
Manfred Oswald
H01 - BASIC ELECTRIC ELEMENTS