Manoj VELLAIKAL

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning method
- Patent number 11,087,979
- Issue date Aug 10, 2021
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method
- Patent number 10,199,221
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method
- Patent number 9,870,921
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Safe handling of low energy, high dose arsenic, phosphorus, and bor...
- Patent number 8,927,400
- Issue date Jan 6, 2015
- Applied Materials, Inc.
- Majeed A. Foad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced scavenging of residual fluorine radicals using silicon coa...
- Patent number 8,642,128
- Issue date Feb 4, 2014
- Applied Materials, Inc.
- Dongwon Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for conformal doping
- Patent number 8,501,605
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for quantitative measurement of a plasma immersion process
- Patent number 8,492,177
- Issue date Jul 23, 2013
- Applied Materials, Inc.
- Daping Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process with chamber seasoning an...
- Patent number 8,003,500
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of etch-rate drift in HDP processes
- Patent number 7,867,921
- Issue date Jan 11, 2011
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Impurity control in HDP-CVD DEP/ETCH/DEP processes
- Patent number 7,745,350
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion ion implantation process with chamber seasoning an...
- Patent number 7,659,184
- Issue date Feb 9, 2010
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactive ion etching for semiconductor device feature topography mo...
- Patent number 7,628,897
- Issue date Dec 8, 2009
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gapfill using deposition-etch sequence
- Patent number 7,329,586
- Issue date Feb 12, 2008
- Applied Materials, Inc.
- Manoj Vellaikal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxygen plasma treatment for enhanced HDP-CVD gapfill
- Patent number 7,229,931
- Issue date Jun 12, 2007
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HDP-CVD multistep gapfill process
- Patent number 7,205,240
- Issue date Apr 17, 2007
- Applied Materials, Inc.
- M. Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for improving barrier layer adhesion to HDP-FSG thin films
- Patent number 6,803,325
- Issue date Oct 12, 2004
- Applied Materials Inc.
- Hichem M'Saad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitrogen treatment of polished halogen-doped silicon glass
- Patent number 6,413,871
- Issue date Jul 2, 2002
- Applied Materials, Inc.
- Hichem M'Saad
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for improving barrier layer adhesion to HDP-FSG thin films
- Patent number 6,410,457
- Issue date Jun 25, 2002
- Applied Materials, Inc.
- Hichem M'Saad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
LOW TEMPERATURE N-TYPE CONTACT EPI FORMATION
- Publication number 20230307506
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Nicolas Breil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20220375751
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Yi-Chiau HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD
- Publication number 20190172712
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD
- Publication number 20180138038
- Publication date May 17, 2018
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD
- Publication number 20170084456
- Publication date Mar 23, 2017
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...
- Publication number 20140248759
- Publication date Sep 4, 2014
- Applied Materials, Inc.
- Majeed A. FOAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK AND PROCESS DESIGN FOR BACK PASSIVATED SOLAR CELLS AND L...
- Publication number 20140000686
- Publication date Jan 2, 2014
- Hemant P. MUNGEKAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STATIC DEPOSITION PROFILE MODULATION FOR LINEAR PLASMA SOURCE
- Publication number 20130273262
- Publication date Oct 17, 2013
- Applied Materials, Inc.
- Manoj Vellaikal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR QUANTITATIVE MEASUREMENT OF A PLASMA IMMERSION PROCESS
- Publication number 20130137197
- Publication date May 30, 2013
- Applied Materials, Inc.
- DAPING YAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR IMPLANTING DOPANT SPECIES IN A SUBSTRATE
- Publication number 20130095643
- Publication date Apr 18, 2013
- Applied Materials, Inc.
- KARTIK SANTHANAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE OR POST-IMPLANT PLASMA TREATMENT FOR PLASMA IMMERSED ION IMPLAN...
- Publication number 20120302048
- Publication date Nov 29, 2012
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE DOSE RETENTION OF DOPANTS BY PRE-AMORPHIZATION AND POST IMP...
- Publication number 20120289036
- Publication date Nov 15, 2012
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONFORMAL DOPING
- Publication number 20120238074
- Publication date Sep 20, 2012
- Applied Materials, Inc.
- KARTIK SANTHANAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT HAVING SIDE GAS OUTLETS AND METHODS
- Publication number 20100297347
- Publication date Nov 25, 2010
- Applied Materials, Inc.
- Manoj Vellaikal
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ENHANCED SCAVENGING OF RESIDUAL FLUORINE RADICALS USING SILICON COA...
- Publication number 20100267224
- Publication date Oct 21, 2010
- Applied Materials, Inc.
- DONGWON CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...
- Publication number 20100173484
- Publication date Jul 8, 2010
- Majeed A. Foad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...
- Publication number 20090280628
- Publication date Nov 12, 2009
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation process with reduced polysilicon...
- Publication number 20090215250
- Publication date Aug 27, 2009
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...
- Publication number 20090215251
- Publication date Aug 27, 2009
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF ETCH-RATE DRIFT IN HDP PROCESSES
- Publication number 20090075489
- Publication date Mar 19, 2009
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPURITY CONTROL IN HDP-CVD DEP/ETCH/DEP PROCESSES
- Publication number 20090068853
- Publication date Mar 12, 2009
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAPFILL EXTENSION OF HDP-CVD INTEGRATED PROCESS MODULATION SIO2 PRO...
- Publication number 20080299775
- Publication date Dec 4, 2008
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...
- Publication number 20080153271
- Publication date Jun 26, 2008
- APPLIED MATERIALS, INC.
- Majeed A. Foad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gapfill using deposition-etch sequence
- Publication number 20060292894
- Publication date Dec 28, 2006
- Applied Materials, Inc.,
- Manoj Vellaikal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxygen plasma treatment for enhanced HDP-CVD gapfill
- Publication number 20050282398
- Publication date Dec 22, 2005
- APPLIED MATERIALS, INC., A Delaware corporation
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HDP-CVD MULTISTEP GAPFILL PROCESS
- Publication number 20040245091
- Publication date Dec 9, 2004
- Applied Materials, Inc.
- M Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reactive ion etching for semiconductor device feature topography mo...
- Publication number 20040079728
- Publication date Apr 29, 2004
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for improving barrier layer adhesion to HDP-FSG thin films
- Publication number 20020150682
- Publication date Oct 17, 2002
- Applied Materials, Inc.
- Hichem M'Saad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NITROGEN TREATMENT OF POLISHED HALOGEN-DOPED SILICON GLASS
- Publication number 20010033900
- Publication date Oct 25, 2001
- HICHEM M'SAAD
- C03 - GLASS MINERAL OR SLAG WOOL

Manoj VELLAIKAL

Person

Patents Grantslast 30 patents

Cleaning method

Cleaning method

Cleaning method

Safe handling of low energy, high dose arsenic, phosphorus, and bor...

Enhanced scavenging of residual fluorine radicals using silicon coa...

Methods and apparatus for conformal doping

Methods for quantitative measurement of a plasma immersion process

Plasma immersion ion implantation process with chamber seasoning an...

Reduction of etch-rate drift in HDP processes

Impurity control in HDP-CVD DEP/ETCH/DEP processes

Plasma immersion ion implantation process with chamber seasoning an...

Reactive ion etching for semiconductor device feature topography mo...

Gapfill using deposition-etch sequence

Oxygen plasma treatment for enhanced HDP-CVD gapfill

HDP-CVD multistep gapfill process

Apparatus for improving barrier layer adhesion to HDP-FSG thin films

Nitrogen treatment of polished halogen-doped silicon glass

Method for improving barrier layer adhesion to HDP-FSG thin films

Patents Applicationslast 30 patents

LOW TEMPERATURE N-TYPE CONTACT EPI FORMATION

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

CLEANING METHOD

CLEANING METHOD

CLEANING METHOD

SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...

FILM STACK AND PROCESS DESIGN FOR BACK PASSIVATED SOLAR CELLS AND L...

STATIC DEPOSITION PROFILE MODULATION FOR LINEAR PLASMA SOURCE

METHODS FOR QUANTITATIVE MEASUREMENT OF A PLASMA IMMERSION PROCESS

METHODS FOR IMPLANTING DOPANT SPECIES IN A SUBSTRATE

PRE OR POST-IMPLANT PLASMA TREATMENT FOR PLASMA IMMERSED ION IMPLAN...

SURFACE DOSE RETENTION OF DOPANTS BY PRE-AMORPHIZATION AND POST IMP...

METHODS AND APPARATUS FOR CONFORMAL DOPING

SUBSTRATE SUPPORT HAVING SIDE GAS OUTLETS AND METHODS

ENHANCED SCAVENGING OF RESIDUAL FLUORINE RADICALS USING SILICON COA...

SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...

PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...

Plasma immersion ion implantation process with reduced polysilicon...

PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...

REDUCTION OF ETCH-RATE DRIFT IN HDP PROCESSES

IMPURITY CONTROL IN HDP-CVD DEP/ETCH/DEP PROCESSES

GAPFILL EXTENSION OF HDP-CVD INTEGRATED PROCESS MODULATION SIO2 PRO...

SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...

Gapfill using deposition-etch sequence

Oxygen plasma treatment for enhanced HDP-CVD gapfill

HDP-CVD MULTISTEP GAPFILL PROCESS

Reactive ion etching for semiconductor device feature topography mo...

Apparatus for improving barrier layer adhesion to HDP-FSG thin films

NITROGEN TREATMENT OF POLISHED HALOGEN-DOPED SILICON GLASS