Manoocher Birang

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Eddy current system having an elongated core for in-situ profile me...
- Patent number 10,105,811
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- G. Laurie Miller
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for control of print gap
- Patent number 10,029,497
- Issue date Jul 24, 2018
- Kateeva, Inc.
- Robert B. Lowrance
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus and method for control of print gap
- Patent number 9,789,715
- Issue date Oct 17, 2017
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Apparatus and method for control of print gap
- Patent number 9,656,491
- Issue date May 23, 2017
- Kateeva, Inc.
- Robert B. Lowrance
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for control of print gap
- Patent number 9,550,383
- Issue date Jan 24, 2017
- Kateeva, Inc.
- Robert B. Lowrance
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polishing pad for endpoint detection and related methods
- Patent number 9,333,621
- Issue date May 10, 2016
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for control of print gap
- Patent number 9,302,513
- Issue date Apr 5, 2016
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Apparatus and method for control of print gap
- Patent number 9,120,344
- Issue date Sep 1, 2015
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Polishing pad with two-section window having recess
- Patent number 8,858,298
- Issue date Oct 14, 2014
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for in-situ endpoint detection for semiconduct...
- Patent number 8,795,029
- Issue date Aug 5, 2014
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Friction sensor for polishing system
- Patent number 8,758,086
- Issue date Jun 24, 2014
- Applied Materials, Inc.
- Gabriel Lorimer Miller
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing metrology using interference signals
- Patent number 8,556,679
- Issue date Oct 15, 2013
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for in-situ endpoint detection for chemical me...
- Patent number 8,506,356
- Issue date Aug 13, 2013
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for endpoint detection and related methods
- Patent number 8,485,862
- Issue date Jul 16, 2013
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Computer-implemented process control in chemical mechanical polishing
- Patent number 8,460,057
- Issue date Jun 11, 2013
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Friction sensor for polishing system
- Patent number 8,342,906
- Issue date Jan 1, 2013
- Applied Materials, Inc.
- Gabriel Lorimer Miller
- B24 - GRINDING POLISHING
Information Patent Grant
Electrophoretic solar cell metallization process and apparatus
- Patent number 8,216,441
- Issue date Jul 10, 2012
- Applied Materials, Inc.
- Manoocher Birang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Substrate polishing metrology using interference signals
- Patent number 8,092,274
- Issue date Jan 10, 2012
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Eddy current apparatus and method for in-situ profile measurement
- Patent number 7,999,540
- Issue date Aug 16, 2011
- Applied Materials, Inc.
- G. Laurie Miller
- B24 - GRINDING POLISHING
Information Patent Grant
Carbon nanotube-based load cells
- Patent number 7,971,489
- Issue date Jul 5, 2011
- Applied Materials, Inc.
- Victor L. Pushparaj
- G01 - MEASURING TESTING
Information Patent Grant
Copper deposition chamber having integrated bevel clean with edge b...
- Patent number 7,947,131
- Issue date May 24, 2011
- Applied Materials, Inc.
- Chen-An Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electroplating apparatus and method based on an array of anodes
- Patent number 7,935,240
- Issue date May 3, 2011
- Applied Materials, Inc.
- Saravjeet Singh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polishing system with in-line and in-situ metrology
- Patent number 7,927,182
- Issue date Apr 19, 2011
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing metrology using interference signals
- Patent number 7,841,926
- Issue date Nov 30, 2010
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
In-situ profile measurement in an electroplating process
- Patent number 7,837,851
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Manoocher Birang
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for in-situ endpoint detection for chemical me...
- Patent number 7,775,852
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing metrology using interference signals
- Patent number 7,731,566
- Issue date Jun 8, 2010
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Grant
Auxiliary electrode encased in cation exchange membrane tube for el...
- Patent number 7,727,364
- Issue date Jun 1, 2010
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated endpoint detection system with optical and eddy current...
- Patent number 7,682,221
- Issue date Mar 23, 2010
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus of eddy current monitoring for chemical mechan...
- Patent number 7,591,708
- Issue date Sep 22, 2009
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and Method for Control of Print Gap
- Publication number 20180326767
- Publication date Nov 15, 2018
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Apparatus and Method for Control of Print Gap
- Publication number 20170246892
- Publication date Aug 31, 2017
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Apparatus and Method for Control of Print Gap
- Publication number 20170144462
- Publication date May 25, 2017
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Apparatus and Method for Control of Print Gap
- Publication number 20170136793
- Publication date May 18, 2017
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Apparatus and Method for Control of Print Gap
- Publication number 20160303877
- Publication date Oct 20, 2016
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Apparatus and Method for Control of Print Gap
- Publication number 20150328910
- Publication date Nov 19, 2015
- Kateeva, Inc.
- Robert B. Lowrance
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
POLISHING PAD WITH TWO-SECTION WINDOW HAVING RECESS
- Publication number 20150004888
- Publication date Jan 1, 2015
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
TRANSPARENT WINDOW IN A POLISHING PAD
- Publication number 20140038501
- Publication date Feb 6, 2014
- Applied Materials, Inc.
- Manoocher Birang
- G01 - MEASURING TESTING
Information Patent Application
POLISHING PAD FOR ENDPOINT DETECTION AND RELATED METHODS
- Publication number 20130295826
- Publication date Nov 7, 2013
- Boguslaw A. Swedek
- G01 - MEASURING TESTING
Information Patent Application
POLISHING PAD WITH TWO-SECTION WINDOW HAVING RECESS
- Publication number 20130231032
- Publication date Sep 5, 2013
- Applied Materials, Inc., a Delaware corporation
- Boguslaw A. Swedek
- G01 - MEASURING TESTING
Information Patent Application
FRICTION SENSOR FOR POLISHING SYSTEM
- Publication number 20130167614
- Publication date Jul 4, 2013
- Gabriel Lorimer Miller
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR IN-SITU ENDPOINT DETECTION FOR SEMICONDUCT...
- Publication number 20130130413
- Publication date May 23, 2013
- Manoocher Birang
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR CONTROL OF PRINT GAP
- Publication number 20130038649
- Publication date Feb 14, 2013
- KATEEVA, INC.
- Robert B. LOWRANCE
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
SUBSTRATE POLISHING METROLOGY USING INTERFERENCE SIGNALS
- Publication number 20120107971
- Publication date May 3, 2012
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
Eddy Current System for In-Situ Profile Measurement
- Publication number 20110294402
- Publication date Dec 1, 2011
- G. Laurie Miller
- B24 - GRINDING POLISHING
Information Patent Application
ELECTROPLATING APPARATUS BASED ON AN ARRAY OF ANODES
- Publication number 20110198229
- Publication date Aug 18, 2011
- APPLIED MATERIALS, INC.
- SARAVJEET SINGH
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY
- Publication number 20110195528
- Publication date Aug 11, 2011
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING METROLOGY USING INTERFERENCE SIGNALS
- Publication number 20110070808
- Publication date Mar 24, 2011
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
IN-SITU PROFILE MEASUREMENT IN AN ELECTROPLATING PROCESS
- Publication number 20110031112
- Publication date Feb 10, 2011
- MANOOCHER BIRANG
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
APPARATUS AND METHOD FOR IN-SITU ENDPOINT DETECTION FOR CHEMICAL ME...
- Publication number 20100297917
- Publication date Nov 25, 2010
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHOD OF ALIGNING AND POSITIONING A COLD SUBSTRATE O...
- Publication number 20100279516
- Publication date Nov 4, 2010
- Chen-An Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE POLISHING METROLOGY USING INTERFERENCE SIGNALS
- Publication number 20100240281
- Publication date Sep 23, 2010
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
COPPER DEPOSITION CHAMBER HAVING INTEGRATED BEVEL CLEAN WITH EDGE B...
- Publication number 20100218784
- Publication date Sep 2, 2010
- CHEN-AN CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY
- Publication number 20100062684
- Publication date Mar 11, 2010
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
CARBON NANOTUBE-BASED LOAD CELLS
- Publication number 20100050779
- Publication date Mar 4, 2010
- Victor L. Pushparaj
- G01 - MEASURING TESTING
Information Patent Application
FRICTION SENSOR FOR POLISHING SYSTEM
- Publication number 20090253351
- Publication date Oct 8, 2009
- APPLIED MATERIALS, INC.
- Gabriel Lorimer Miller
- B24 - GRINDING POLISHING
Information Patent Application
ELECTROPHORETIC SOLAR CELL METALLIZATION PROCESS AND APPARATUS
- Publication number 20090145760
- Publication date Jun 11, 2009
- MANOOCHER BIRANG
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHODS AND APPARATUS FOR POLISHING CONTROL
- Publication number 20080268643
- Publication date Oct 30, 2008
- Applied Materials, Inc., a Delaware corporation
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
Substrate polishing metrology using interference signals
- Publication number 20080227367
- Publication date Sep 18, 2008
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING WITH NAPPED POROMERIC
- Publication number 20080076330
- Publication date Mar 27, 2008
- Applied Materials, Inc.
- Manoocher Birang
- B24 - GRINDING POLISHING

Manoocher Birang

Person

Patents Grantslast 30 patents

Eddy current system having an elongated core for in-situ profile me...

Apparatus and method for control of print gap

Apparatus and method for control of print gap

Apparatus and method for control of print gap

Apparatus and method for control of print gap

Polishing pad for endpoint detection and related methods

Apparatus and method for control of print gap

Apparatus and method for control of print gap

Polishing pad with two-section window having recess

Apparatus and method for in-situ endpoint detection for semiconduct...

Friction sensor for polishing system

Substrate polishing metrology using interference signals

Apparatus and method for in-situ endpoint detection for chemical me...

Polishing pad for endpoint detection and related methods

Computer-implemented process control in chemical mechanical polishing

Friction sensor for polishing system

Electrophoretic solar cell metallization process and apparatus

Substrate polishing metrology using interference signals

Eddy current apparatus and method for in-situ profile measurement

Carbon nanotube-based load cells

Copper deposition chamber having integrated bevel clean with edge b...

Electroplating apparatus and method based on an array of anodes

Polishing system with in-line and in-situ metrology

Substrate polishing metrology using interference signals

In-situ profile measurement in an electroplating process

Apparatus and method for in-situ endpoint detection for chemical me...

Substrate polishing metrology using interference signals

Auxiliary electrode encased in cation exchange membrane tube for el...

Integrated endpoint detection system with optical and eddy current...

Method and apparatus of eddy current monitoring for chemical mechan...

Patents Applicationslast 30 patents

Apparatus and Method for Control of Print Gap

Apparatus and Method for Control of Print Gap

Apparatus and Method for Control of Print Gap

Apparatus and Method for Control of Print Gap

Apparatus and Method for Control of Print Gap

Apparatus and Method for Control of Print Gap

POLISHING PAD WITH TWO-SECTION WINDOW HAVING RECESS

TRANSPARENT WINDOW IN A POLISHING PAD

POLISHING PAD FOR ENDPOINT DETECTION AND RELATED METHODS

POLISHING PAD WITH TWO-SECTION WINDOW HAVING RECESS

FRICTION SENSOR FOR POLISHING SYSTEM

APPARATUS AND METHOD FOR IN-SITU ENDPOINT DETECTION FOR SEMICONDUCT...

APPARATUS AND METHOD FOR CONTROL OF PRINT GAP

SUBSTRATE POLISHING METROLOGY USING INTERFERENCE SIGNALS

Eddy Current System for In-Situ Profile Measurement

ELECTROPLATING APPARATUS BASED ON AN ARRAY OF ANODES

POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY

SUBSTRATE POLISHING METROLOGY USING INTERFERENCE SIGNALS

IN-SITU PROFILE MEASUREMENT IN AN ELECTROPLATING PROCESS

APPARATUS AND METHOD FOR IN-SITU ENDPOINT DETECTION FOR CHEMICAL ME...

APPARATUS AND METHOD OF ALIGNING AND POSITIONING A COLD SUBSTRATE O...

SUBSTRATE POLISHING METROLOGY USING INTERFERENCE SIGNALS

COPPER DEPOSITION CHAMBER HAVING INTEGRATED BEVEL CLEAN WITH EDGE B...

POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY

CARBON NANOTUBE-BASED LOAD CELLS

FRICTION SENSOR FOR POLISHING SYSTEM

ELECTROPHORETIC SOLAR CELL METALLIZATION PROCESS AND APPARATUS

METHODS AND APPARATUS FOR POLISHING CONTROL

Substrate polishing metrology using interference signals

CHEMICAL MECHANICAL POLISHING WITH NAPPED POROMERIC