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Manouk RIJPSTRA

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  • Eindhoven, NL
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Patents Grantslast 30 patents

  • Information Patent Grant

    Metrology method and associated metrology and lithographic apparatuses
    • Patent number 12,189,314
    • Issue date Jan 7, 2025
    • ASML Netherlands B.V.
    • Sebastianus Adrianus Goorden
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Computational metrology based correction and control
    • Patent number 11,448,973
    • Issue date Sep 20, 2022
    • ASML Netherlands B.V.
    • Manouk Rijpstra
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Lithographic method
    • Patent number 11,029,610
    • Issue date Jun 8, 2021
    • ASML Netherlands B.V.
    • Patricius Aloysius Jacobus Tinnemans
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Lithographic method
    • Patent number 10,962,887
    • Issue date Mar 30, 2021
    • ASML Netherlands B.V.
    • Patricius Aloysius Jacobus Tinnemans
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Lithographic method
    • Patent number 10,527,958
    • Issue date Jan 7, 2020
    • ASML Netherlands B.V.
    • Patricius Aloysius Jacobus Tinnemans
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
    • Publication number 20240012342
    • Publication date Jan 11, 2024
    • ASML NETHERLANDS B.V.
    • Sebastianus Adrianus GOORDEN
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
    • Publication number 20220365446
    • Publication date Nov 17, 2022
    • ASML NETHERLANDS B.V.
    • Manouk RIJPSTRA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
    • Publication number 20210080837
    • Publication date Mar 18, 2021
    • ASML NETHERLANDS B.V.
    • Manouk RIJPSTRA
    • G05 - CONTROLLING REGULATING
  • Information Patent Application

    LITHOGRAPHIC METHOD
    • Publication number 20200272061
    • Publication date Aug 27, 2020
    • ASML NETHERLANDS B.V.
    • Patricius Aloysius Jacobus TINNEMANS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    LITHOGRAPHIC METHOD
    • Publication number 20200081356
    • Publication date Mar 12, 2020
    • ASML NETHERLANDS B.V.
    • Patricius Aloysius Jacobus TINNEMANS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    LITHOGRAPHIC METHOD
    • Publication number 20190094721
    • Publication date Mar 28, 2019
    • ASML NETHERLANDS B.V.
    • Patricius Aloysius Jacobus TINNEMANS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY