Manuel B. Madriaga

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Automated process control using an adjusted metrology output signal
- Patent number 9,103,664
- Issue date Aug 11, 2015
- Tokyo Electron Limited
- Shifang Li
- G05 - CONTROLLING REGULATING
Information Patent Grant
Process control using ray tracing-based libraries and machine learn...
- Patent number 8,838,422
- Issue date Sep 16, 2014
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Optimization of ray tracing and beam propagation parameters
- Patent number 8,289,527
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Etch process control using optical metrology and sensor devices
- Patent number 8,193,007
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Manuel Madriaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stage measurement system
- Patent number 8,173,451
- Issue date May 8, 2012
- Tokyo Electron Limited
- Xinkang Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of designing an etch stage measurement system
- Patent number 8,173,450
- Issue date May 8, 2012
- Tokyo Electron Limited
- Xinkang Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimizing sensitivity of optical metrology measurements
- Patent number 7,961,306
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Training a machine learning system to determine photoresist parameters
- Patent number 7,949,618
- Issue date May 24, 2011
- Tokyo Electron Limited
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automated process control using an optical metrology system optimiz...
- Patent number 7,761,178
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology system optimized with design goals
- Patent number 7,761,250
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Designing an optical metrology system optimized with signal criteria
- Patent number 7,742,889
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for designing an optical metrology system optimized with...
- Patent number 7,734,437
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using optical metrology and a correlation...
- Patent number 7,667,858
- Issue date Feb 23, 2010
- Tokyo Electron Limited
- Jeffrey Alexander Chard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for auto focusing a workpiece using two or more focus par...
- Patent number 7,660,696
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using optical metrology with a photonic n...
- Patent number 7,639,351
- Issue date Dec 29, 2009
- Tokyo Electron Limited
- Zhigang Chen
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control of a fabrication tool using a dispersion...
- Patent number 7,636,649
- Issue date Dec 22, 2009
- Tokyo Electron Limited
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using parameters determined with approxim...
- Patent number 7,627,392
- Issue date Dec 1, 2009
- Tokyo Electron Limited
- Wei Liu
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology system optimized with a plurality of design goals
- Patent number 7,595,869
- Issue date Sep 29, 2009
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Process control using an optical metrology system optimized with si...
- Patent number 7,589,845
- Issue date Sep 15, 2009
- Tokyo Electron Limited
- Xinkang Tian
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using optical metrology and photoresist p...
- Patent number 7,567,353
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Controlling a fabrication tool using support vector machine
- Patent number 7,567,352
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Wen Jin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Managing and using metrology data for process and equipment control
- Patent number 7,526,354
- Issue date Apr 28, 2009
- Tokyo Electron Limited
- Manuel Madriaga
- G01 - MEASURING TESTING
Information Patent Grant
Consecutive measurement of structures formed on a semiconductor waf...
- Patent number 7,522,295
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using parameters determined from a photom...
- Patent number 7,480,062
- Issue date Jan 20, 2009
- Tokyo Electron Limited
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized characterization of wafers structures for optical metrology
- Patent number 7,444,196
- Issue date Oct 28, 2008
- Timbre Technologies, Inc.
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Grant
Adaptive correlation of pattern resist structures using optical met...
- Patent number 7,440,881
- Issue date Oct 21, 2008
- Timbre Technologies, Inc.
- Daniel Edward Engelhard
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Consecutive measurement of structures formed on a semiconductor waf...
- Patent number 7,417,750
- Issue date Aug 26, 2008
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Controlling a fabrication tool using support vector machine
- Patent number 7,372,583
- Issue date May 13, 2008
- Tokyo Electron Limited
- Wen Jin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parametric optimization of optical metrology model
- Patent number 7,126,700
- Issue date Oct 24, 2006
- Timbre Technologies, Inc.
- Junwei Bao
- G01 - MEASURING TESTING
Information Patent Grant
Adaptive correlation of pattern resist structures using optical met...
- Patent number 6,791,679
- Issue date Sep 14, 2004
- Timbre Technologies, Inc.
- Daniel Edward Engelhard
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
PROCESS CONTROL USING RAY TRACING-BASED LIBRARIES AND MACHINE LEARN...
- Publication number 20130148130
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
AUTOMATED PROCESS CONTROL USING AN ADJUSTED METROLOGY OUTPUT SIGNAL
- Publication number 20110245955
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF RAY TRACING AND BEAM PROPAGATION PARAMETERS
- Publication number 20110246142
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
OPTIMIZING SENSITIVITY OF OPTICAL METROLOGY MEASUREMENTS
- Publication number 20100245807
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
AUTO FOCUS ARRAY DETECTOR OPTIMIZED FOR OPERATING OBJECTIVES
- Publication number 20100118316
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- MIHAIL MIHAYLOV
- G02 - OPTICS
Information Patent Application
AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZ...
- Publication number 20090319075
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS
- Publication number 20090319214
- Publication date Dec 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA
- Publication number 20090248339
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH...
- Publication number 20090248340
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SI...
- Publication number 20090248341
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR O...
- Publication number 20090240537
- Publication date Sep 24, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERA...
- Publication number 20090234687
- Publication date Sep 17, 2009
- TOKYO ELECTRON LIMITED
- XINKANG TIAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AUTOMATED PROCESS CONTROL OF A FABRICATION TOOL USING A DISPERSION...
- Publication number 20090082993
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G01 - MEASURING TESTING
Information Patent Application
AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED WITH APPROXIM...
- Publication number 20090063077
- Publication date Mar 5, 2009
- TOKYO ELECTRON LIMITED
- WEI LIU
- G05 - CONTROLLING REGULATING
Information Patent Application
AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED FROM A PHOTOM...
- Publication number 20080291429
- Publication date Nov 27, 2008
- TOKYO ELECTRON LIMITED
- SHIFANG LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROLLING A FABRICATION TOOL USING SUPPORT VECTOR MACHINE
- Publication number 20080252908
- Publication date Oct 16, 2008
- TOKYO ELECTRON LIMITED
- Wen JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Automated process control using optical metrology and photoresist p...
- Publication number 20080241975
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Training a machine learning system to determine photoresist parameters
- Publication number 20080243730
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Automated process control using optical metrology with a photonic n...
- Publication number 20080231863
- Publication date Sep 25, 2008
- TOKYO ELECTRON LIMITED
- Zhigang Chen
- G01 - MEASURING TESTING
Information Patent Application
Automated process control using optical metrology and a correlation...
- Publication number 20080170241
- Publication date Jul 17, 2008
- TOKYO ELECTRON LIMITED
- Jeffrey Chard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Consecutive measurement of structures formed on a semiconductor waf...
- Publication number 20080106728
- Publication date May 8, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
CONSECUTIVE MEASUREMENT OF STRUCTURES FORMED ON A SEMICONDUCTOR WAF...
- Publication number 20080106729
- Publication date May 8, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Managing and using metrology data for process and equipment control
- Publication number 20080009081
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Manuel Madriaga
- G01 - MEASURING TESTING
Information Patent Application
Optimized characterization of wafers structures for optical metrology
- Publication number 20070250200
- Publication date Oct 25, 2007
- Timbre Technologies, Inc.
- Steven Scheer
- G01 - MEASURING TESTING
Information Patent Application
Parametric optimization of optical metrology model
- Publication number 20050128489
- Publication date Jun 16, 2005
- Junwei Bao
- G01 - MEASURING TESTING
Information Patent Application
Adaptive correlation of pattern resist structures using optical met...
- Publication number 20050007577
- Publication date Jan 13, 2005
- Timbre Technologies, Inc.
- Daniel Edward Engelhard
- G05 - CONTROLLING REGULATING
Information Patent Application
Adaptive correlation of pattern resist structures using optical met...
- Publication number 20040152221
- Publication date Aug 5, 2004
- Daniel Edward Engelhard
- G05 - CONTROLLING REGULATING

Manuel B. Madriaga

Person

Patents Grantslast 30 patents

Automated process control using an adjusted metrology output signal

Process control using ray tracing-based libraries and machine learn...

Optimization of ray tracing and beam propagation parameters

Etch process control using optical metrology and sensor devices

Etch stage measurement system

Method of designing an etch stage measurement system

Optimizing sensitivity of optical metrology measurements

Training a machine learning system to determine photoresist parameters

Automated process control using an optical metrology system optimiz...

Optical metrology system optimized with design goals

Designing an optical metrology system optimized with signal criteria

Apparatus for designing an optical metrology system optimized with...

Automated process control using optical metrology and a correlation...

Apparatus for auto focusing a workpiece using two or more focus par...

Automated process control using optical metrology with a photonic n...

Automated process control of a fabrication tool using a dispersion...

Automated process control using parameters determined with approxim...

Optical metrology system optimized with a plurality of design goals

Process control using an optical metrology system optimized with si...

Automated process control using optical metrology and photoresist p...

Controlling a fabrication tool using support vector machine

Managing and using metrology data for process and equipment control

Consecutive measurement of structures formed on a semiconductor waf...

Automated process control using parameters determined from a photom...

Optimized characterization of wafers structures for optical metrology

Adaptive correlation of pattern resist structures using optical met...

Consecutive measurement of structures formed on a semiconductor waf...

Controlling a fabrication tool using support vector machine

Parametric optimization of optical metrology model

Adaptive correlation of pattern resist structures using optical met...

Patents Applicationslast 30 patents

PROCESS CONTROL USING RAY TRACING-BASED LIBRARIES AND MACHINE LEARN...

AUTOMATED PROCESS CONTROL USING AN ADJUSTED METROLOGY OUTPUT SIGNAL

OPTIMIZATION OF RAY TRACING AND BEAM PROPAGATION PARAMETERS

OPTIMIZING SENSITIVITY OF OPTICAL METROLOGY MEASUREMENTS

AUTO FOCUS ARRAY DETECTOR OPTIMIZED FOR OPERATING OBJECTIVES

AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZ...

OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS

DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA

APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH...

PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SI...

APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR O...

METHOD OF DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERA...

AUTOMATED PROCESS CONTROL OF A FABRICATION TOOL USING A DISPERSION...

AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED WITH APPROXIM...

AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED FROM A PHOTOM...

CONTROLLING A FABRICATION TOOL USING SUPPORT VECTOR MACHINE

Automated process control using optical metrology and photoresist p...

Training a machine learning system to determine photoresist parameters

Automated process control using optical metrology with a photonic n...

Automated process control using optical metrology and a correlation...

Consecutive measurement of structures formed on a semiconductor waf...

CONSECUTIVE MEASUREMENT OF STRUCTURES FORMED ON A SEMICONDUCTOR WAF...

Managing and using metrology data for process and equipment control

Optimized characterization of wafers structures for optical metrology

Parametric optimization of optical metrology model

Adaptive correlation of pattern resist structures using optical met...

Adaptive correlation of pattern resist structures using optical met...