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Maolin Long
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Guangzhou, CN
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Patents Grants
last 30 patents
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Patent Grant
Measuring plasma uniformity in-situ at wafer level
Patent number
7,091,503
Issue date
Aug 15, 2006
Tokyo Electron Limited
Wayne L. Johnson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Adjustable segmented electrode apparatus and method
Patent number
6,916,401
Issue date
Jul 12, 2005
Tokyo Electron Limited
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Measuring plasma uniformity in-situ at wafer level
Publication number
20040021094
Publication date
Feb 5, 2004
Wayne L Johnson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Wafer bias drive for plasma source
Publication number
20040018127
Publication date
Jan 29, 2004
TOKYO ELECTRON LIMITED
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Adjustable segmented electrode apparatus and method
Publication number
20030103877
Publication date
Jun 5, 2003
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Multi-zone RF electrode for field/plasma uniformity control in capa...
Publication number
20030079983
Publication date
May 1, 2003
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS