Maolin Long

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma strip tool with movable insert
- Patent number 12,283,467
- Issue date Apr 22, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- B08 - CLEANING
Information Patent Grant
Systems and methods for multi-level pulsing in RF plasma tools
- Patent number 12,283,463
- Issue date Apr 22, 2025
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid plasma source array
- Patent number 12,266,503
- Issue date Apr 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protection system for switches in direct drive circuits of substrat...
- Patent number 12,261,029
- Issue date Mar 25, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for plasma processing apparatus
- Patent number 12,261,073
- Issue date Mar 25, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooled shield for ICP source
- Patent number 12,159,770
- Issue date Dec 3, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for plasma processing apparatus
- Patent number 12,119,254
- Issue date Oct 15, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF reference measuring circuit for a direct drive system supplying...
- Patent number 12,106,947
- Issue date Oct 1, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual frequency matching circuit for inductively coupled plasma (ICP...
- Patent number 12,040,159
- Issue date Jul 16, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lift pin assembly for a plasma processing apparatus
- Patent number 12,009,184
- Issue date Jun 11, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Changle Guan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for plasma processing apparatus
- Patent number 12,002,701
- Issue date Jun 4, 2024
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for plasma processing apparatus
- Patent number 11,837,493
- Issue date Dec 5, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for reverse pulsing
- Patent number 11,798,785
- Issue date Oct 24, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct frequency tuning for matchless plasma source in substrate pr...
- Patent number 11,728,137
- Issue date Aug 15, 2023
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,728,136
- Issue date Aug 15, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,716,805
- Issue date Aug 1, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 11,437,219
- Issue date Sep 6, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing within pulsing for semiconductor RF plasma processing
- Patent number 11,342,159
- Issue date May 24, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,224,116
- Issue date Jan 11, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 11,056,321
- Issue date Jul 6, 2021
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct drive RF circuit for substrate processing systems
- Patent number 10,847,345
- Issue date Nov 24, 2020
- Lam Research Corporation
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
RF voltage sensor incorporating multiple voltage dividers for detec...
- Patent number 10,784,083
- Issue date Sep 22, 2020
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for transformer coupled plasma pulsing with tra...
- Patent number 10,734,195
- Issue date Aug 4, 2020
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiofrequency (RF) filter for multi-frequency RF bias
- Patent number 10,715,095
- Issue date Jul 14, 2020
- Lam Research Corporation
- Maolin Long
- G01 - MEASURING TESTING
Information Patent Grant
Frequency tuning for a matchless plasma source
- Patent number 10,672,590
- Issue date Jun 2, 2020
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode RF asymmetry detection probe for semiconductor RF plasma pr...
- Patent number 10,649,006
- Issue date May 12, 2020
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 10,638,593
- Issue date Apr 28, 2020
- Lam Research Corporation
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Direct drive RF circuit for substrate processing systems
- Patent number 10,515,781
- Issue date Dec 24, 2019
- Lam Research Corporation
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250106976
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
- Publication number 20250079121
- Publication date Mar 6, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cooled Shield for ICP Source
- Publication number 20250062103
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS
- Publication number 20250014935
- Publication date Jan 9, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...
- Publication number 20240429035
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...
- Publication number 20240339298
- Publication date Oct 10, 2024
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Assembly for Plasma Processing Apparatus
- Publication number 20240282614
- Publication date Aug 22, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS
- Publication number 20240096680
- Publication date Mar 21, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REVERSE PULSING
- Publication number 20240030000
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20230360883
- Publication date Nov 9, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20230354502
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protection System for Switches in Direct Drive Circuits of Substrat...
- Publication number 20230245873
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW FOR SUBSTRATE PROCESSING CHAMBER
- Publication number 20230126058
- Publication date Apr 27, 2023
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...
- Publication number 20230113683
- Publication date Apr 13, 2023
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conductive Member for Cleaning Focus Ring of a Plasma Processing Ap...
- Publication number 20230071494
- Publication date Mar 9, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pressure Control System for a Multi-Head Processing Chamber of a Pl...
- Publication number 20230012873
- Publication date Jan 19, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lift Pin Assembly for a Plasma Processing Apparatus
- Publication number 20230010075
- Publication date Jan 12, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Changle Guan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS
- Publication number 20230005778
- Publication date Jan 5, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20220415619
- Publication date Dec 29, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hybrid Plasma Source Array
- Publication number 20220384144
- Publication date Dec 1, 2022
- Beijing E-Town Semiconductor Technology Co., LTD
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...
- Publication number 20220344130
- Publication date Oct 27, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING
- Publication number 20220254608
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS
- Publication number 20220216038
- Publication date Jul 7, 2022
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Grid Assembly for Plasma Processing Apparatus
- Publication number 20220208514
- Publication date Jun 30, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Directly Driven Hybrid ICP-CCP Plasma Source
- Publication number 20220208518
- Publication date Jun 30, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Configurable Faraday Shield
- Publication number 20220208529
- Publication date Jun 30, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Assembly for Plasma Processing Apparatus
- Publication number 20220208591
- Publication date Jun 30, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Outer Gas Channel Insert
- Publication number 20220208523
- Publication date Jun 30, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cooled Shield for ICP Source
- Publication number 20220208527
- Publication date Jun 30, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Induction Coil Assembly for Plasma Processing Apparatus
- Publication number 20220208512
- Publication date Jun 30, 2022
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS

Maolin Long

Person

Patents Grantslast 30 patents

Plasma strip tool with movable insert

Systems and methods for multi-level pulsing in RF plasma tools

Hybrid plasma source array

Protection system for switches in direct drive circuits of substrat...

Electrostatic chuck assembly for plasma processing apparatus

Matchless plasma source for semiconductor wafer fabrication

Dual-frequency, direct-drive inductively coupled plasma source

Cooled shield for ICP source

Electrostatic chuck assembly for plasma processing apparatus

RF reference measuring circuit for a direct drive system supplying...

Dual frequency matching circuit for inductively coupled plasma (ICP...

Lift pin assembly for a plasma processing apparatus

Electrostatic chuck assembly for plasma processing apparatus

Electrostatic chuck assembly for plasma processing apparatus

Systems for reverse pulsing

Direct frequency tuning for matchless plasma source in substrate pr...

RF pulsing within pulsing for semiconductor RF plasma processing

Matchless plasma source for semiconductor wafer fabrication

Frequency tuning for a matchless plasma source

RF pulsing within pulsing for semiconductor RF plasma processing

Matchless plasma source for semiconductor wafer fabrication

Metal contamination reduction in substrate processing systems with...

Direct drive RF circuit for substrate processing systems

RF voltage sensor incorporating multiple voltage dividers for detec...

Systems and methods for transformer coupled plasma pulsing with tra...

Radiofrequency (RF) filter for multi-frequency RF bias

Frequency tuning for a matchless plasma source

Cathode RF asymmetry detection probe for semiconductor RF plasma pr...

Matchless plasma source for semiconductor wafer fabrication

Direct drive RF circuit for substrate processing systems

Patents Applicationslast 30 patents

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE

Cooled Shield for ICP Source

ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS

RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...

Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...

Electrostatic Chuck Assembly for Plasma Processing Apparatus

ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS

SYSTEMS AND METHODS FOR REVERSE PULSING

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

Protection System for Switches in Direct Drive Circuits of Substrat...

DIELECTRIC WINDOW FOR SUBSTRATE PROCESSING CHAMBER

RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...

Conductive Member for Cleaning Focus Ring of a Plasma Processing Ap...

Pressure Control System for a Multi-Head Processing Chamber of a Pl...

Lift Pin Assembly for a Plasma Processing Apparatus

ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus

Hybrid Plasma Source Array

Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP...

RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING

SYSTEMS AND METHODS FOR MULTI-LEVEL PULSING IN RF PLASMA TOOLS

Grid Assembly for Plasma Processing Apparatus

Directly Driven Hybrid ICP-CCP Plasma Source

Configurable Faraday Shield

Electrostatic Chuck Assembly for Plasma Processing Apparatus

Workpiece Processing Apparatus with Outer Gas Channel Insert

Cooled Shield for ICP Source

Induction Coil Assembly for Plasma Processing Apparatus