Marc W. Cantell

Person

Sheldon, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Transistor and method of forming the transistor so as to have reduc...
- Patent number 8,846,481
- Issue date Sep 30, 2014
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer spacer with inhibited recess/undercut and method for fa...
- Patent number 7,446,007
- Issue date Nov 4, 2008
- International Business Machines Corporation
- James W. Adkisson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching of hard masks
- Patent number 6,926,843
- Issue date Aug 9, 2005
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffused extrinsic base and method for fabrication
- Patent number 6,900,519
- Issue date May 31, 2005
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffused extrinsic base and method for fabrication
- Patent number 6,869,854
- Issue date Mar 22, 2005
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MOSFET device with in-situ doped, raised source and drain structures
- Patent number 6,858,903
- Issue date Feb 22, 2005
- International Business Machines Corporation
- Wesley C. Natzle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low defect pre-emitter and pre-base oxide etch for bipolar transist...
- Patent number 6,858,532
- Issue date Feb 22, 2005
- International Business Machines Corporation
- Wesley C. Natzle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated cobalt silicide process for semiconductor devices
- Patent number 6,793,735
- Issue date Sep 21, 2004
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacture of MOSFET device with in-situ doped, raised s...
- Patent number 6,774,000
- Issue date Aug 10, 2004
- International Business Machines Corporation
- Wesley C. Natzle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for limiting divot formation in post shallow trench isolatio...
- Patent number 6,541,351
- Issue date Apr 1, 2003
- International Business Machines Corporation
- Peter H. Bartlau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a bipolar transistor having a realigned emitter
- Patent number 6,541,336
- Issue date Apr 1, 2003
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch pre-silicide clean
- Patent number 6,255,179
- Issue date Jul 3, 2001
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated cobalt silicide process for semiconductor devices
- Patent number 6,184,132
- Issue date Feb 6, 2001
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TRANSISTOR AND METHOD OF FORMING THE TRANSISTOR SO AS TO HAVE REDUC...
- Publication number 20140113426
- Publication date Apr 24, 2014
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR AND METHOD OF FORMING THE TRANSISTOR SO AS TO HAVE REDUC...
- Publication number 20120313146
- Publication date Dec 13, 2012
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER SPACER WITH INHIBITED RECESS/UNDERCUT AND METHOD FOR FA...
- Publication number 20080116493
- Publication date May 22, 2008
- James W. Adkisson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOSFET DEVICE WITH IN-SITU DOPED, RAISED SOURCE AND DRAIN STRUCTURES
- Publication number 20040248368
- Publication date Dec 9, 2004
- Wesley C. Natzle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diffused extrinsic base and method for fabrication
- Publication number 20040222495
- Publication date Nov 11, 2004
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low defect pre-emitter and pre-base oxide etch for bipolar transist...
- Publication number 20040110354
- Publication date Jun 10, 2004
- International Business Machines Corporation
- Wesley C. Natzle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacture of MOSFET device with in-situ doped, raised s...
- Publication number 20040097047
- Publication date May 20, 2004
- International Business Machines Corporation
- Wesley C. Natzle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diffused extrinsic base and method for fabrication
- Publication number 20040014271
- Publication date Jan 22, 2004
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching of hard masks
- Publication number 20020063110
- Publication date May 30, 2002
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated cobalt silicide process for semiconductor devices
- Publication number 20010001298
- Publication date May 17, 2001
- International Business Machines Corporation
- Marc W. Cantell
- H01 - BASIC ELECTRIC ELEMENTS

Marc W. Cantell

Person

Patents Grantslast 30 patents

Transistor and method of forming the transistor so as to have reduc...

Multi-layer spacer with inhibited recess/undercut and method for fa...

Etching of hard masks

Diffused extrinsic base and method for fabrication

Diffused extrinsic base and method for fabrication

MOSFET device with in-situ doped, raised source and drain structures

Low defect pre-emitter and pre-base oxide etch for bipolar transist...

Integrated cobalt silicide process for semiconductor devices

Method of manufacture of MOSFET device with in-situ doped, raised s...

Method for limiting divot formation in post shallow trench isolatio...

Method of fabricating a bipolar transistor having a realigned emitter

Plasma etch pre-silicide clean

Integrated cobalt silicide process for semiconductor devices

Patents Applicationslast 30 patents

TRANSISTOR AND METHOD OF FORMING THE TRANSISTOR SO AS TO HAVE REDUC...

TRANSISTOR AND METHOD OF FORMING THE TRANSISTOR SO AS TO HAVE REDUC...

MULTI-LAYER SPACER WITH INHIBITED RECESS/UNDERCUT AND METHOD FOR FA...

MOSFET DEVICE WITH IN-SITU DOPED, RAISED SOURCE AND DRAIN STRUCTURES

Diffused extrinsic base and method for fabrication

Low defect pre-emitter and pre-base oxide etch for bipolar transist...

Method of manufacture of MOSFET device with in-situ doped, raised s...

Diffused extrinsic base and method for fabrication

Etching of hard masks

Integrated cobalt silicide process for semiconductor devices