Marcel Hendrikus Maria Beems

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus temperature compensation
- Patent number 7,978,339
- Issue date Jul 12, 2011
- ASML Netherlands B.V.
- Tjarko Adriaan Rudolf Van Empel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic interferometer system with an absolute measurement sub...
- Patent number 7,474,409
- Issue date Jan 6, 2009
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING
Information Patent Grant
Integrated plane mirror and differential plane mirror interferomete...
- Patent number 7,443,511
- Issue date Oct 28, 2008
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and positioning apparatus
- Patent number 7,405,811
- Issue date Jul 29, 2008
- ASML Netherlands B.V.
- Marcel Hendrikus Maria Beems
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and computer p...
- Patent number 7,352,473
- Issue date Apr 1, 2008
- ASML Netherlands B.V.
- Johannes Mathias Theodorus Antonius Adriaens
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and positioning apparatus
- Patent number 7,349,069
- Issue date Mar 25, 2008
- ASML Netherlands B.V.
- Marcel Hendrikus Maria Beems
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,349,072
- Issue date Mar 25, 2008
- ASML Netherlands B.V.
- Marcel Hendrikus Maria Beems
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,265,366
- Issue date Sep 4, 2007
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for manipulation and routing of a metrology beam
- Patent number 7,177,059
- Issue date Feb 13, 2007
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position correction in Y of mask object shift due to Z offset and n...
- Patent number 6,853,440
- Issue date Feb 8, 2005
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van De Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Measuring Method, Measuring Apparatus, Lithographic Apparatus and D...
- Publication number 20120212749
- Publication date Aug 23, 2012
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050218342
- Publication date Oct 6, 2005
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method, and measure...
- Publication number 20050128461
- Publication date Jun 16, 2005
- ASML NETHERLANDS B.V.
- Marcel Hendrikus Maria Beems
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method for manipulation and routing of a metrology beam
- Publication number 20040233494
- Publication date Nov 25, 2004
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Marcel Hendrikus Maria Beems

Person

Patents Grantslast 30 patents

Lithographic apparatus temperature compensation

Lithographic interferometer system with an absolute measurement sub...

Integrated plane mirror and differential plane mirror interferomete...

Lithographic apparatus and positioning apparatus

Lithographic apparatus, device manufacturing method, and computer p...

Lithographic apparatus and positioning apparatus

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Device and method for manipulation and routing of a metrology beam

Position correction in Y of mask object shift due to Z offset and n...

Patents Applicationslast 30 patents

Measuring Method, Measuring Apparatus, Lithographic Apparatus and D...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method, and measure...

Device and method for manipulation and routing of a metrology beam