Marcel Maria Cornelius Franciscu TEUNISSEN

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Grathem, NL

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Patents Grantslast 30 patents

Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,860,546
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,454,892
- Issue date Sep 27, 2022
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder for use in a lithographic apparatus
- Patent number 11,448,976
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Thomas Poiesz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,029,607
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS
- Publication number 20230053840
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Pepijn VAN DEN EIJNDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20220357675
- Publication date Nov 10, 2022
- ASML NETHERLANDS B.V.
- Thomas POIESZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS
- Publication number 20210263424
- Publication date Aug 26, 2021
- ASML NETHERLANDS B.V.
- Pepijn VAN DEN EIJNDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20210165334
- Publication date Jun 3, 2021
- ASML NETHERLANDS B.V.
- Thomas POIESZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS
- Publication number 20200409270
- Publication date Dec 31, 2020
- ASML NETHERLANDS B.V.
- Pepijn VAN DEN EIJNDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY