Marco Jan-Jaco Wieland

Person

CJ Delft, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle optical device, objective lens assembly, detector,...
- Patent number 11,821,859
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and arrangement for handling and processing substrates
- Patent number RE49725
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Hendrik Jan De Jong
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,798,783
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE49602
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Memory device with predetermined start-up value
- Patent number 11,501,952
- Issue date Nov 15, 2022
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus Van Kervinck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 11,152,302
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE48046
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 10,600,733
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 10,418,324
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle lithography system
- Patent number 10,297,420
- Issue date May 21, 2019
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and encoding device for encoding a sequence of m-bit pattern...
- Patent number 10,110,343
- Issue date Oct 23, 2018
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 10,079,206
- Issue date Sep 18, 2018
- Mapper Lithography IP B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and arrangement for handling and processing substrates
- Patent number 10,078,274
- Issue date Sep 18, 2018
- Mapper Lithography IP B.V.
- Hendrik Jan De Jong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for exposing a wafer
- Patent number 9,978,562
- Issue date May 22, 2018
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-electrode electron optics
- Patent number 9,905,322
- Issue date Feb 27, 2018
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and device for generating a decoded and synchronized output
- Patent number 9,887,707
- Issue date Feb 6, 2018
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Dual pass scanning
- Patent number 9,691,589
- Issue date Jun 27, 2017
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Enhanced stitching by overlap dose and feature reduction
- Patent number 9,460,260
- Issue date Oct 4, 2016
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of clamping a substrate and clamp preparation unit using cap...
- Patent number 9,460,954
- Issue date Oct 4, 2016
- Mapper Lithography IP B.V.
- Hendrik Jan De Jong
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electro-optical element for multiple beam alignment
- Patent number 9,362,084
- Issue date Jun 7, 2016
- Mapper Lithography IP B.V.
- Alrik van den Brom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electrode stack arrangement
- Patent number 9,355,751
- Issue date May 31, 2016
- Mapper Lithography IP B.V.
- Willem Henk Urbanus
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Data path for lithography apparatus
- Patent number 9,305,747
- Issue date Apr 5, 2016
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPA...
- Publication number 20240339291
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Herre Tjerk STEENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
- Publication number 20240339290
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL DEVICE
- Publication number 20240321547
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
- Publication number 20240288389
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- B08 - CLEANING
Information Patent Application
DETECTOR ASSEMBLY, CHARGED PARTICLE DEVICE, APPARATUS, AND METHODS
- Publication number 20240264099
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS
- Publication number 20240210336
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF COMPENSATING FOR AN EFFECT OF ELECTRODE DISTORTION, ASSES...
- Publication number 20240105416
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...
- Publication number 20240087842
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT SYSTEM, METHOD OF ASSESSING
- Publication number 20240079205
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
- Publication number 20240071716
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...
- Publication number 20240044824
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- G01 - MEASURING TESTING
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20230352266
- Publication date Nov 2, 2023
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SYSTEM, METHOD OF PROCESSING A SAMPLE USING A MULT...
- Publication number 20230326715
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...
- Publication number 20230326706
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING
- Publication number 20230317402
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Derk Ferdinand WALVOORT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230290609
- Publication date Sep 14, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE PATTERNS FOR DEFINING MULTI-BEAMS
- Publication number 20230282440
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230245849
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSES...
- Publication number 20230238211
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE MULTI-BEAM COLUMN, CHARGED-PARTICLE MULTI-BEAM COL...
- Publication number 20230238215
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230230795
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE, METHOD OF COMPENSATING FOR VARIATIONS IN A...
- Publication number 20230207253
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230125800
- Publication date Apr 27, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230096574
- Publication date Mar 30, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE MANIPULATOR DEVICE
- Publication number 20230072858
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Pieter Lucas BRANDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230054632
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICE WITH PREDETERMINED START-UP VALUE
- Publication number 20230048507
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Marcel Nicolaas Jacobus VAN KERVINCK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK DEFECT DETECTION
- Publication number 20230046682
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Fuming WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Marco Jan-Jaco Wieland

Person

Patents Grantslast 30 patents

Multi-source charged particle illumination apparatus

Charged particle assessment tool, inspection method

Vacuum chamber arrangement for charged particle beam generator

Charged particle optical device, objective lens assembly, detector,...

Method and arrangement for handling and processing substrates

Charged particle assessment tool, inspection method

Lithography system, sensor and measuring method

Vacuum chamber arrangement for charged particle beam generator

Memory device with predetermined start-up value

Aberration correction in charged particle system

Fabricating unique chips using a charged particle multi-beamlet lit...

Vacuum chamber arrangement for charged particle beam generator

Deflection scan speed adjustment during charged particle exposure

Lithography system, sensor and measuring method

Fabricating unique chips using a charged particle multi-beamlet lit...

Vacuum chamber arrangement for charged particle beam generator

Fabricating unique chips using a charged particle multi-beamlet lit...

Charged particle lithography system

Method and encoding device for encoding a sequence of m-bit pattern...

Fabricating unique chips using a charged particle multi-beamlet lit...

Method and arrangement for handling and processing substrates

Method for exposing a wafer

Multi-electrode electron optics

Method and device for generating a decoded and synchronized output

Dual pass scanning

Enhanced stitching by overlap dose and feature reduction

Method of clamping a substrate and clamp preparation unit using cap...

Electro-optical element for multiple beam alignment

Multi-electrode stack arrangement

Data path for lithography apparatus

Patents Applicationslast 30 patents

DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPA...

METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM

CHARGED-PARTICLE OPTICAL DEVICE

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

DETECTOR ASSEMBLY, CHARGED PARTICLE DEVICE, APPARATUS, AND METHODS

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS

METHOD OF COMPENSATING FOR AN EFFECT OF ELECTRODE DISTORTION, ASSES...

DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYST...

ASSESSMENT SYSTEM, METHOD OF ASSESSING

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

ELECTRON-OPTICAL DEVICE

CHARGED PARTICLE SYSTEM, METHOD OF PROCESSING A SAMPLE USING A MULT...

APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...

ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

APERTURE PATTERNS FOR DEFINING MULTI-BEAMS

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSES...

CHARGED-PARTICLE MULTI-BEAM COLUMN, CHARGED-PARTICLE MULTI-BEAM COL...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

ELECTRON-OPTICAL DEVICE, METHOD OF COMPENSATING FOR VARIATIONS IN A...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

CHARGED PARTICLE MANIPULATOR DEVICE

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

MEMORY DEVICE WITH PREDETERMINED START-UP VALUE

MASK DEFECT DETECTION