Marco Jan Jaco Wieland

Person

GD Delft, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography system, method of heat dissipation and frame
- Patent number 8,325,321
- Issue date Dec 4, 2012
- Mapper Lithography IP B.V.
- Pieter Kruit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beamlet blanker arrangement
- Patent number 8,258,484
- Issue date Sep 4, 2012
- Mapper Lithography IP B.V.
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical switching in a lithography system
- Patent number 8,242,470
- Issue date Aug 14, 2012
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system and projection method
- Patent number 8,242,467
- Issue date Aug 14, 2012
- Mapper Lithography IP B.V.
- Remco Jager
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection lens arrangement
- Patent number 8,089,056
- Issue date Jan 3, 2012
- Mapper Lithography IP B.V.
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number 7,868,300
- Issue date Jan 11, 2011
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system and projection method
- Patent number 7,842,936
- Issue date Nov 30, 2010
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system and projection method
- Patent number 7,709,815
- Issue date May 4, 2010
- Mapper Lithography IP B.V.
- Remco Jager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure system
- Patent number 7,091,504
- Issue date Aug 15, 2006
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beamlet exposure system
- Patent number 7,084,414
- Issue date Aug 1, 2006
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulator circuitry
- Patent number 7,019,908
- Issue date Mar 28, 2006
- Mapper Lithography IP B.V.
- Johannes Christiaan van 't Spijker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure system
- Patent number 6,897,458
- Issue date May 24, 2005
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH APERTURE ARRAY COOLING
- Publication number 20120292524
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20120293780
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM MODULATOR
- Publication number 20120292491
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
DATA PATH FOR LITHOGRAPHY APPARATUS
- Publication number 20120287410
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN DATA CONVERSION FOR LITHOGRAPHY SYSTEM
- Publication number 20120286173
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
DUAL PASS SCANNING
- Publication number 20120286170
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
DATA PATH FOR LITHOGRAPHY APPARATUS
- Publication number 20120286168
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Henk Derks
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF GENERATING A TWO-LEVEL PATTERN FOR LITHOGRAPHIC PROCESSIN...
- Publication number 20120286169
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
MODULATION DEVICE AND CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SY...
- Publication number 20120273658
- Publication date Nov 1, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE
- Publication number 20120273691
- Publication date Nov 1, 2012
- Alrik van den Brom
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE SYSTEM COMPRISING A MANIPULATOR DEVICE FOR MANIPUL...
- Publication number 20120273690
- Publication date Nov 1, 2012
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20120145916
- Publication date Jun 14, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
BEAMLET BLANKER ARRANGEMENT
- Publication number 20120091318
- Publication date Apr 19, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20120091358
- Publication date Apr 19, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20120061583
- Publication date Mar 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle multi-beamlet lithography system, modulation devic...
- Publication number 20110266418
- Publication date Nov 3, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
Modulation device and charged particle multi-beamlet lithography sy...
- Publication number 20110261340
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle multi-beamlet lithography system with modulation d...
- Publication number 20110260040
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMAGING SYSTEM
- Publication number 20110079730
- Publication date Apr 7, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF AND SYSTEM FOR EXPOSING A TARGET
- Publication number 20110073782
- Publication date Mar 31, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF CLAMPING A SUBSTRATE AND CLAMP PREPARATION UNIT
- Publication number 20100265486
- Publication date Oct 21, 2010
- MAPPER LITHOGRAPHY IP BV
- Hendrik Jan DE JONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND PROJECTION METHOD
- Publication number 20100171046
- Publication date Jul 8, 2010
- Remco Jager
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20090261267
- Publication date Oct 22, 2009
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20090212229
- Publication date Aug 27, 2009
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography system and projection method
- Publication number 20070064213
- Publication date Mar 22, 2007
- Remco Jager
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography system, sensor and measuring method
- Publication number 20070057204
- Publication date Mar 15, 2007
- Pieter Kruit
- B82 - NANO-TECHNOLOGY

Marco Jan Jaco Wieland

Person

Patents Grantslast 30 patents

Lithography system, method of heat dissipation and frame

Beamlet blanker arrangement

Optical switching in a lithography system

Lithography system and projection method

Projection lens arrangement

Lithography system, sensor and measuring method

Lithography system and projection method

Lithography system and projection method

Electron beam exposure system

Charged particle beamlet exposure system

Modulator circuitry

Electron beam exposure system

Patents Applicationslast 30 patents

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH APERTURE ARRAY COOLING

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER

CHARGED PARTICLE BEAM MODULATOR

DATA PATH FOR LITHOGRAPHY APPARATUS

PATTERN DATA CONVERSION FOR LITHOGRAPHY SYSTEM

DUAL PASS SCANNING

DATA PATH FOR LITHOGRAPHY APPARATUS

METHOD OF GENERATING A TWO-LEVEL PATTERN FOR LITHOGRAPHIC PROCESSIN...

MODULATION DEVICE AND CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SY...

CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE

CHARGED PARTICLE SYSTEM COMPRISING A MANIPULATOR DEVICE FOR MANIPUL...

PROJECTION LENS ARRANGEMENT

BEAMLET BLANKER ARRANGEMENT

PROJECTION LENS ARRANGEMENT

PROJECTION LENS ARRANGEMENT

Charged particle multi-beamlet lithography system, modulation devic...

Modulation device and charged particle multi-beamlet lithography sy...

Charged particle multi-beamlet lithography system with modulation d...

IMAGING SYSTEM

METHOD OF AND SYSTEM FOR EXPOSING A TARGET

METHOD OF CLAMPING A SUBSTRATE AND CLAMP PREPARATION UNIT

LITHOGRAPHY SYSTEM AND PROJECTION METHOD

PROJECTION LENS ARRANGEMENT

PROJECTION LENS ARRANGEMENT

Lithography system and projection method

Lithography system, sensor and measuring method