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Marco Pieters
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Eindhoven, NL
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last 30 patents
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Patent Grant
Inspection method, lithographic apparatus, mask and substrate
Patent number
10,394,137
Issue date
Aug 27, 2019
ASML Netherlands B.V.
Youri Johannes Laurentius Maria Van Dommelen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Inspection method, lithographic apparatus, mask and substrate
Patent number
10,001,711
Issue date
Jun 19, 2018
ASML Netherlands B.V.
Youri Johannes Laurentius Maria Van Dommelen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithographic apparatus focus test method and system, and device man...
Patent number
7,209,214
Issue date
Apr 24, 2007
ASML Netherlands B.V.
Jan Hauschild
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
Publication number
20180253018
Publication date
Sep 6, 2018
ASML NETHERLANDS B.V.
Youri Johannes Laurentius Maria VAN DOMMELEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
Publication number
20160313656
Publication date
Oct 27, 2016
ASML NETHERLANDS B.V.
Youri Johannes Laurentius Maria VAN DOMMELEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Lithographic apparatus focus test method and system, and device man...
Publication number
20060132744
Publication date
Jun 22, 2006
ASML NETHERLANDS B.V.
Jan Hauschild
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY