Marco Wedowski

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective optical element, optical system EUV and lithography device
- Patent number 8,633,460
- Issue date Jan 21, 2014
- Carl Zeiss SMT GmbH
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element for radiation in the EUV and/or soft X-ray region a...
- Patent number 8,164,077
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element, optical system and EUV lithography device
- Patent number 8,003,960
- Issue date Aug 23, 2011
- Carl Zeiss SMT GmbH
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element for radiation in the EUV and/or soft X-ray region a...
- Patent number 7,646,004
- Issue date Jan 12, 2010
- Carl Zeiss SMT AG
- Marco Wedowski
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective X-ray microscope and inspection system for examining obj...
- Patent number 7,623,620
- Issue date Nov 24, 2009
- Carl Zeiss SMT AG
- Hans-Jürgen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Device, EUV lithographic device and method for preventing and clean...
- Patent number 7,462,842
- Issue date Dec 9, 2008
- Carl Zeiss SMT AG
- Marco E. Wedowski
- B08 - CLEANING
Information Patent Grant
Optical element and method for its manufacture as well as lithograp...
- Patent number 7,172,788
- Issue date Feb 6, 2007
- Carl Zeiss SMT AG
- Andrey E. Yakshin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Narrow-band spectral filter and the use thereof
- Patent number 7,154,666
- Issue date Dec 26, 2006
- Carl Zeiss SMT AG
- Marco Wedowski
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Device, EUV-lithographic device and method for preventing and clean...
- Patent number 7,060,993
- Issue date Jun 13, 2006
- Carl Zeiss SMT AG
- Marco E. Wedowski
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE OPTICAL ELEMENT, OPTICAL SYSTEM EUV AND LITHOGRAPHY DEVICE
- Publication number 20110261343
- Publication date Oct 27, 2011
- Carl Zeiss SMT GMBH
- Marco WEDOWSKI
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION A...
- Publication number 20100067653
- Publication date Mar 18, 2010
- Carl Zeiss SMT AG
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, OPTICAL SYSTEM AND EUV LITHOGRAPHY DEVICE
- Publication number 20090173895
- Publication date Jul 9, 2009
- Carl Zeiss SMT AG
- Marco WEDOWSKI
- G02 - OPTICS
Information Patent Application
Method For Manufacturing Reflective Optical Element, Reflective Opt...
- Publication number 20070285643
- Publication date Dec 13, 2007
- Carl Zeiss SMT AG
- Marco Wedowski
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for the detection of a surface reaction, espec...
- Publication number 20070143032
- Publication date Jun 21, 2007
- Carl Zeiss SMT AG
- Fokko Pieter Wieringa
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Optical element for radiation in the EUV and/or soft X-ray region a...
- Publication number 20070114466
- Publication date May 24, 2007
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for preventing contamination and lithographic device
- Publication number 20070054497
- Publication date Mar 8, 2007
- Markus Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device, EUV lithographic device and method for preventing and clean...
- Publication number 20060192158
- Publication date Aug 31, 2006
- Marco E. Wedowski
- B08 - CLEANING
Information Patent Application
Reflective optical element, optical system and EUV lithography device
- Publication number 20060076516
- Publication date Apr 13, 2006
- Marco Wedowski
- G02 - OPTICS
Information Patent Application
Reflective X-ray microscope and inspection system for examining obj...
- Publication number 20050201514
- Publication date Sep 15, 2005
- Hans-Jurgen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
Device, euv-lithographic device and method for preventing and clean...
- Publication number 20050104015
- Publication date May 19, 2005
- Marco Wedowski
- B08 - CLEANING
Information Patent Application
Narrow-band spectral filter and the use thereof
- Publication number 20040061930
- Publication date Apr 1, 2004
- Marco Wedowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Marco Wedowski

Person

Patents Grantslast 30 patents

Reflective optical element, optical system EUV and lithography device

Optical element for radiation in the EUV and/or soft X-ray region a...

Reflective optical element, optical system and EUV lithography device

Optical element for radiation in the EUV and/or soft X-ray region a...

Reflective X-ray microscope and inspection system for examining obj...

Device, EUV lithographic device and method for preventing and clean...

Optical element and method for its manufacture as well as lithograp...

Narrow-band spectral filter and the use thereof

Device, EUV-lithographic device and method for preventing and clean...

Patents Applicationslast 30 patents

REFLECTIVE OPTICAL ELEMENT, OPTICAL SYSTEM EUV AND LITHOGRAPHY DEVICE

OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION A...

REFLECTIVE OPTICAL ELEMENT, OPTICAL SYSTEM AND EUV LITHOGRAPHY DEVICE

Method For Manufacturing Reflective Optical Element, Reflective Opt...

Apparatus and method for the detection of a surface reaction, espec...

Optical element for radiation in the EUV and/or soft X-ray region a...

Method for preventing contamination and lithographic device

Device, EUV lithographic device and method for preventing and clean...

Reflective optical element, optical system and EUV lithography device

Reflective X-ray microscope and inspection system for examining obj...

Device, euv-lithographic device and method for preventing and clean...

Narrow-band spectral filter and the use thereof