Mari Nozoe

Person

Hino, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam applied apparatus, and irradiation method
- Patent number 8,907,278
- Issue date Dec 9, 2014
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting pattern and inspecting instrument
- Patent number 8,558,173
- Issue date Oct 15, 2013
- Hitachi, Ltd.
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam device and sample observation method
- Patent number 8,552,373
- Issue date Oct 8, 2013
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern check device and pattern check method
- Patent number 8,421,008
- Issue date Apr 16, 2013
- Hitachi High-Technologies Corporation
- Mari Nozoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern
- Patent number 7,952,074
- Issue date May 31, 2011
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting pattern and inspecting instrument
- Patent number 7,876,113
- Issue date Jan 25, 2011
- Hitachi, Ltd.
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and inspection system using charged particle beam
- Patent number 7,526,747
- Issue date Apr 28, 2009
- Hitachi, Ltd.
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method and inspection system using charged particle beam
- Patent number 7,521,679
- Issue date Apr 21, 2009
- Hitachi High-Technologies Corporation
- Hidetoshi Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern
- Patent number 7,417,444
- Issue date Aug 26, 2008
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,397,031
- Issue date Jul 8, 2008
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting patterns
- Patent number 7,394,070
- Issue date Jul 1, 2008
- Hitachi High-Technologies Corporation
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting pattern and inspecting instrument
- Patent number 7,375,538
- Issue date May 20, 2008
- Hitachi, Ltd.
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus using charged particle beam
- Patent number 7,276,693
- Issue date Oct 2, 2007
- Hitachi High-Technologies Corporation
- Hikaru Koyama
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and inspection apparatus using electron beam
- Patent number 7,271,385
- Issue date Sep 18, 2007
- Hitachi High-Technologies Corporation
- Yasuhiro Gunji
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for inspecting a pattern
- Patent number 7,260,256
- Issue date Aug 21, 2007
- Renesas Technology Corporation
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 7,242,015
- Issue date Jul 10, 2007
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus for circuit pattern
- Patent number 7,218,126
- Issue date May 15, 2007
- Hitachi, Ltd.
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and inspection system using charged particle beam
- Patent number 7,211,797
- Issue date May 1, 2007
- Hitachi High-Technologies Corporation
- Hidetoshi Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection method and apparatus and semiconductor man...
- Patent number 7,122,796
- Issue date Oct 17, 2006
- Hitachi Ltd.
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting a pattern and an apparatus thereof and a metho...
- Patent number 7,116,816
- Issue date Oct 3, 2006
- Hitachi, Ltd.
- Maki Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for inspecting a semiconductor device
- Patent number 7,116,817
- Issue date Oct 3, 2006
- Hitachi, Ltd.
- Maki Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting pattern and inspecting instrument
- Patent number 7,112,791
- Issue date Sep 26, 2006
- Hitachi Tokyo Electronics Co. Ltd.
- Mari Nozoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,098,455
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern
- Patent number 7,026,830
- Issue date Apr 11, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus using charged particle beam
- Patent number 7,019,294
- Issue date Mar 28, 2006
- Hitachi High-Technologies Corporation
- Hikaru Koyama
- G01 - MEASURING TESTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 6,979,823
- Issue date Dec 27, 2005
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Circuit pattern inspection method and apparatus
- Patent number 6,975,754
- Issue date Dec 13, 2005
- Hitachi, Ltd.
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method and apparatus for circuit pattern of resist material
- Patent number 6,952,105
- Issue date Oct 4, 2005
- Hitachi, Ltd.
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspecting a semiconductor device
- Patent number 6,952,492
- Issue date Oct 4, 2005
- Hitachi, Ltd.
- Maki Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and inspection system using charged particle beam
- Patent number 6,931,620
- Issue date Aug 16, 2005
- Hitachi, Ltd.
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM APPLIED APPARATUS, AND IRRADIATION METHOD
- Publication number 20130299697
- Publication date Nov 14, 2013
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUIT PATTERN INSPECTION APPARATUS AND CIRCUIT PATTERN INSPECTION...
- Publication number 20130082177
- Publication date Apr 4, 2013
- Hitachi High-Technologies Corporation
- Takashi Hiroi
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD
- Publication number 20120061565
- Publication date Mar 15, 2012
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN CHECK DEVICE AND PATTERN CHECK METHOD
- Publication number 20110278452
- Publication date Nov 17, 2011
- Mari Nozoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN INSPECTION DEVICE AND METHOD
- Publication number 20110133066
- Publication date Jun 9, 2011
- Mari Nozoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection Method And Inspection System Using Charged Particle Beam
- Publication number 20090194690
- Publication date Aug 6, 2009
- Hidetoshi Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION METHOD AND INSPECTION SYSTEM USING CHARGED PARTICLE BEAM
- Publication number 20090189075
- Publication date Jul 30, 2009
- Hitachi, Ltd
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR INSPECTING INTEGRATED CIRCUIT PATTERN
- Publication number 20080302964
- Publication date Dec 11, 2008
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Method of inspecting pattern and inspecting instrument
- Publication number 20080122462
- Publication date May 29, 2008
- Hitachi, Ltd.
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Application
Inspection method and inspection system using charged particle beam
- Publication number 20070138390
- Publication date Jun 21, 2007
- Hidetoshi Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of inspecting pattern and inspecting instrument
- Publication number 20070023658
- Publication date Feb 1, 2007
- Mari Nozoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of inspecting a circuit pattern and inspecting instrument
- Publication number 20060243908
- Publication date Nov 2, 2006
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for inspecting patterns
- Publication number 20060163477
- Publication date Jul 27, 2006
- Hitachi High-Technologies Corporation
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Application
Inspection method and apparatus using charged particle beam
- Publication number 20060163480
- Publication date Jul 27, 2006
- Hikaru Koyama
- G01 - MEASURING TESTING
Information Patent Application
Inspection method and inspection apparatus using electron beam
- Publication number 20060076490
- Publication date Apr 13, 2006
- Yasuhiro Gunji
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for inspecting integrated circuit pattern
- Publication number 20060043982
- Publication date Mar 2, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Inspection method and apparatus for circuit pattern
- Publication number 20060028218
- Publication date Feb 9, 2006
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Evaluation method and manufacturing method of semiconductor device
- Publication number 20060022295
- Publication date Feb 2, 2006
- Atsuko Takafuji
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for inspecting a semiconductor device
- Publication number 20060018532
- Publication date Jan 26, 2006
- Maki Tanaka
- G01 - MEASURING TESTING
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20060017014
- Publication date Jan 26, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Method of inspecting pattern and inspecting instrument
- Publication number 20050250224
- Publication date Nov 10, 2005
- Hitachi, Ltd.
- Mari Nozoe
- G01 - MEASURING TESTING
Information Patent Application
Inspection method and inspection system using charged particle beam
- Publication number 20050236648
- Publication date Oct 27, 2005
- Hitachi, Ltd.
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inspection method and inspection system using charged particle beam
- Publication number 20050218325
- Publication date Oct 6, 2005
- Hidetoshi Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection method and apparatus using charged particle beam
- Publication number 20050190310
- Publication date Sep 1, 2005
- Hikaru Koyama
- G01 - MEASURING TESTING
Information Patent Application
Inspection method and apparatus for circuit pattern of resist material
- Publication number 20050099189
- Publication date May 12, 2005
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam inspection method and apparatus and semiconductor man...
- Publication number 20050082476
- Publication date Apr 21, 2005
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection method and inspection apparatus using electron beam
- Publication number 20050040331
- Publication date Feb 24, 2005
- Yasuhiro Gunji
- G01 - MEASURING TESTING
Information Patent Application
Method of inspecting pattern and inspecting instrument
- Publication number 20050006583
- Publication date Jan 13, 2005
- Mari Nozoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20040222377
- Publication date Nov 11, 2004
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection method and apparatus and semiconductor man...
- Publication number 20040164244
- Publication date Aug 26, 2004
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Charged particle beam applied apparatus, and irradiation method

Method of inspecting pattern and inspecting instrument

Charged particle beam device and sample observation method

Pattern check device and pattern check method

Method and apparatus for inspecting integrated circuit pattern

Method of inspecting pattern and inspecting instrument

Inspection method and inspection system using charged particle beam

Inspection method and inspection system using charged particle beam

Method and apparatus for inspecting integrated circuit pattern

Method of inspecting a circuit pattern and inspecting instrument

Method and apparatus for inspecting patterns

Method of inspecting pattern and inspecting instrument

Inspection method and apparatus using charged particle beam

Inspection method and inspection apparatus using electron beam

Method and system for inspecting a pattern

Patterned wafer inspection method and apparatus therefor

Inspection method and apparatus for circuit pattern

Inspection method and inspection system using charged particle beam

Electron beam inspection method and apparatus and semiconductor man...

Method of inspecting a pattern and an apparatus thereof and a metho...

Method and apparatus for inspecting a semiconductor device

Method of inspecting pattern and inspecting instrument

Method of inspecting a circuit pattern and inspecting instrument

Method and apparatus for inspecting integrated circuit pattern

Inspection method and apparatus using charged particle beam

Patterned wafer inspection method and apparatus therefor

Circuit pattern inspection method and apparatus

Inspection method and apparatus for circuit pattern of resist material

Method and apparatus for inspecting a semiconductor device

Inspection method and inspection system using charged particle beam

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM APPLIED APPARATUS, AND IRRADIATION METHOD

CIRCUIT PATTERN INSPECTION APPARATUS AND CIRCUIT PATTERN INSPECTION...

CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD

PATTERN CHECK DEVICE AND PATTERN CHECK METHOD

PATTERN INSPECTION DEVICE AND METHOD

Inspection Method And Inspection System Using Charged Particle Beam

INSPECTION METHOD AND INSPECTION SYSTEM USING CHARGED PARTICLE BEAM

METHOD AND APPARATUS FOR INSPECTING INTEGRATED CIRCUIT PATTERN

Method of inspecting pattern and inspecting instrument

Inspection method and inspection system using charged particle beam

Method of inspecting pattern and inspecting instrument

Method of inspecting a circuit pattern and inspecting instrument

Method and apparatus for inspecting patterns

Inspection method and apparatus using charged particle beam

Inspection method and inspection apparatus using electron beam

Method and apparatus for inspecting integrated circuit pattern

Inspection method and apparatus for circuit pattern

Evaluation method and manufacturing method of semiconductor device

Method and apparatus for inspecting a semiconductor device

Patterned wafer inspection method and apparatus therefor

Method of inspecting pattern and inspecting instrument

Inspection method and inspection system using charged particle beam

Inspection method and inspection system using charged particle beam

Inspection method and apparatus using charged particle beam

Inspection method and apparatus for circuit pattern of resist material

Electron beam inspection method and apparatus and semiconductor man...

Inspection method and inspection apparatus using electron beam

Method of inspecting pattern and inspecting instrument

Patterned wafer inspection method and apparatus therefor

Electron beam inspection method and apparatus and semiconductor man...