Mariappan Hariharaputhiran

Person

Ballston Lake, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure having gap fill dielectric layer disposed b...
- Patent number 9,735,154
- Issue date Aug 15, 2017
- GLOBALFOUNDRIES Inc.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate structure and method of formation
- Patent number 9,608,086
- Issue date Mar 28, 2017
- Global Foundries Inc.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor fins
- Patent number 9,196,499
- Issue date Nov 24, 2015
- GLOBALFOUNDRIES Inc.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices and methods of forming finFETs with self aligned fin formation
- Patent number 9,147,696
- Issue date Sep 29, 2015
- GLOBALFOUNDRIES Inc.
- Jing Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices and methods of forming fins at tight fin pitches
- Patent number 9,105,478
- Issue date Aug 11, 2015
- GLOBALFOUNDRIES Inc.
- Andy Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METAL GATE STRUCTURE AND METHOD OF FORMATION
- Publication number 20170162688
- Publication date Jun 8, 2017
- GLOBALFOUNDRIES INC.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR FINS
- Publication number 20160043081
- Publication date Feb 11, 2016
- GLOBALFOUNDRIES INC.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE STRUCTURE AND METHOD OF FORMATION
- Publication number 20150340461
- Publication date Nov 26, 2015
- GLOBALFOUNDRIES INC.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES AND METHODS OF FORMING FINFETS WITH SELF ALIGNED FIN FORMATION
- Publication number 20150333067
- Publication date Nov 19, 2015
- GLOBALFOUNDRIES INC.
- Jing WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES AND METHODS OF FORMING FINS AT TIGHT FIN PITCHES
- Publication number 20150287595
- Publication date Oct 8, 2015
- GLOBALFOUNDRIES INC.
- Andy WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR FINS
- Publication number 20150279684
- Publication date Oct 1, 2015
- GLOBALFOUNDRIES INC.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTIALLY CRYSTALLIZED FIN HARD MASK FOR FIN FIELD-EFFECT-TRANSISTO...
- Publication number 20150270175
- Publication date Sep 24, 2015
- GLOBALFOUNDRIES INC.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPANT DIFFUSION BARRIER TO FORM ISOLATED SOURCE/DRAINS IN A SEMICO...
- Publication number 20150214345
- Publication date Jul 30, 2015
- GLOBALFOUNDRIES INC.
- Jing Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES AND METHODS OF FORMING FINS AT TIGHT FIN PITCHES
- Publication number 20150115418
- Publication date Apr 30, 2015
- GLOBALFOUNDRIES INC.
- Andy WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES AND METHODS OF FORMING FINFETS WITH SELF ALIGNED FIN FORMATION
- Publication number 20150091094
- Publication date Apr 2, 2015
- GLOBALFOUNDRIES INC.
- Jing WAN
- H01 - BASIC ELECTRIC ELEMENTS

Mariappan Hariharaputhiran

Person

Patents Grantslast 30 patents

Semiconductor structure having gap fill dielectric layer disposed b...

Metal gate structure and method of formation

Method of forming semiconductor fins

Devices and methods of forming finFETs with self aligned fin formation

Devices and methods of forming fins at tight fin pitches

Patents Applicationslast 30 patents

METAL GATE STRUCTURE AND METHOD OF FORMATION

METHOD OF FORMING SEMICONDUCTOR FINS

METAL GATE STRUCTURE AND METHOD OF FORMATION

DEVICES AND METHODS OF FORMING FINFETS WITH SELF ALIGNED FIN FORMATION

DEVICES AND METHODS OF FORMING FINS AT TIGHT FIN PITCHES

METHOD OF FORMING SEMICONDUCTOR FINS

PARTIALLY CRYSTALLIZED FIN HARD MASK FOR FIN FIELD-EFFECT-TRANSISTO...

DOPANT DIFFUSION BARRIER TO FORM ISOLATED SOURCE/DRAINS IN A SEMICO...

DEVICES AND METHODS OF FORMING FINS AT TIGHT FIN PITCHES

DEVICES AND METHODS OF FORMING FINFETS WITH SELF ALIGNED FIN FORMATION