Marie-Claire VAN LARE

Person

Utrecht, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Patterning device and method of use thereof
- Patent number 12,197,120
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marie-Claire Van Lare
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging via zeroth order suppression
- Patent number 11,892,776
- Issue date Feb 6, 2024
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING VIA ZEROTH ORDER SUPPRESSION
- Publication number 20240219843
- Publication date Jul 4, 2024
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS
- Publication number 20240210336
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CALIBRATING SIMULATION PROCESS BASED ON DEFECT-BASED PRO...
- Publication number 20230076218
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Koenraad VAN INGEN SCHENAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR GENERATING PREDICTIVE IMAGES FOR WAFER INSPEC...
- Publication number 20220375063
- Publication date Nov 24, 2022
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR APPLYING A DEPOSITION MODEL IN A SEMICONDUCTOR MANUFACTU...
- Publication number 20220350254
- Publication date Nov 3, 2022
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A PATTERNING DEVICE
- Publication number 20220214610
- Publication date Jul 7, 2022
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A PATTERNING DEVICE AND METHOD OF USE THEREOF
- Publication number 20220121105
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION
- Publication number 20220066327
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL
- Publication number 20210079519
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST COMPOSITIONS
- Publication number 20190129301
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Willem-Pieter VOORTHUIJZEN
- H01 - BASIC ELECTRIC ELEMENTS

Marie-Claire VAN LARE

Person

Patents Grantslast 30 patents

Patterning device and method of use thereof

Imaging via zeroth order suppression

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

IMAGING VIA ZEROTH ORDER SUPPRESSION

PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS

METHOD FOR CALIBRATING SIMULATION PROCESS BASED ON DEFECT-BASED PRO...

SYSTEM AND METHOD FOR GENERATING PREDICTIVE IMAGES FOR WAFER INSPEC...

METHOD FOR APPLYING A DEPOSITION MODEL IN A SEMICONDUCTOR MANUFACTU...

A PATTERNING DEVICE

A PATTERNING DEVICE AND METHOD OF USE THEREOF

IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION

METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL

RESIST COMPOSITIONS