Mariko Takayanagi

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Strain and pressure sensing device, microphone, method for manufact...
- Patent number 10,246,324
- Issue date Apr 2, 2019
- Kabushiki Kaisha Toshiba
- Hideaki Fukuzawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Strain and pressure sensing device, microphone, method for manufact...
- Patent number 9,790,087
- Issue date Oct 17, 2017
- Kabushiki Kaisha Toshiba
- Hideaki Fukuzawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Strain and pressure sensing device, microphone, method for manufact...
- Patent number 8,958,574
- Issue date Feb 17, 2015
- Kabushiki Kaisha Toshiba
- Hideaki Fukuzawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 7,816,215
- Issue date Oct 19, 2010
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device includes gate insulating film having a high di...
- Patent number 7,396,748
- Issue date Jul 8, 2008
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device includes gate insulating film having a high di...
- Patent number 6,949,425
- Issue date Sep 27, 2005
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having a gate electrode with a sidewall insula...
- Patent number 6,927,459
- Issue date Aug 9, 2005
- Kabushiki Kaisha Toshiba
- Akira Hokazono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 6,746,943
- Issue date Jun 8, 2004
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of preparing pattern data of electronic part
- Patent number 6,675,368
- Issue date Jan 6, 2004
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device includes gate insulating film having a high di...
- Patent number 6,664,577
- Issue date Dec 16, 2003
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 6,600,212
- Issue date Jul 29, 2003
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a gate electrode with a sidewall insula...
- Patent number 6,545,317
- Issue date Apr 8, 2003
- Kabushiki Kaisha Toshiba
- Akira Hokazono
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACT...
- Publication number 20180009656
- Publication date Jan 11, 2018
- KABUSHIKI KAISHA TOSHIBA
- Hideaki FUKUZAWA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACT...
- Publication number 20150118779
- Publication date Apr 30, 2015
- KABUSHIKI KAISHA TOSHIBA
- Hideaki FUKUZAWA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACT...
- Publication number 20130170669
- Publication date Jul 4, 2013
- Kabushiki Kaisha Toshiba
- Hideaki FUKUZAWA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20070158705
- Publication date Jul 12, 2007
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device includes gate insulating film having a high di...
- Publication number 20050263803
- Publication date Dec 1, 2005
- Mariko Takayanagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device manufacturing method
- Publication number 20050064667
- Publication date Mar 24, 2005
- Kabushiki Kaisha Toshiba
- Daisuke Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040070037
- Publication date Apr 15, 2004
- Mariko Takayanagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method of fabricating the same
- Publication number 20030207555
- Publication date Nov 6, 2003
- Kabushiki Kaisha Toshiba
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a gate electrode with a sidewall insula...
- Publication number 20030141551
- Publication date Jul 31, 2003
- Kabushiki Kaisha Toshiba
- Akira Hokazono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20020140098
- Publication date Oct 3, 2002
- Mariko Takayanagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method of fabricating the same
- Publication number 20020130393
- Publication date Sep 19, 2002
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for and method of preparing pattern data of electronic part
- Publication number 20020042906
- Publication date Apr 11, 2002
- Mariko Takayanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a gate electrode with a sidewall insula...
- Publication number 20020000611
- Publication date Jan 3, 2002
- Kabushiki Kaisha Toshiba
- Akira Hokazono
- H01 - BASIC ELECTRIC ELEMENTS

Mariko Takayanagi

Person

Patents Grantslast 30 patents

Strain and pressure sensing device, microphone, method for manufact...

Strain and pressure sensing device, microphone, method for manufact...

Strain and pressure sensing device, microphone, method for manufact...

Semiconductor device manufacturing method

Semiconductor device includes gate insulating film having a high di...

Semiconductor device includes gate insulating film having a high di...

Semiconductor device having a gate electrode with a sidewall insula...

Semiconductor device and method of fabricating the same

Apparatus for and method of preparing pattern data of electronic part

Semiconductor device includes gate insulating film having a high di...

Semiconductor device and method of fabricating the same

Semiconductor device having a gate electrode with a sidewall insula...

Patents Applicationslast 30 patents

STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACT...

STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACT...

STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACT...

SEMICONDUCTOR DEVICE

Semiconductor device includes gate insulating film having a high di...

Semiconductor device manufacturing method

Semiconductor device and method of manufacturing the same

Semiconductor device and method of fabricating the same

Semiconductor device having a gate electrode with a sidewall insula...

Semiconductor device and method of manufacturing the same

Semiconductor device and method of fabricating the same

Apparatus for and method of preparing pattern data of electronic part

Semiconductor device having a gate electrode with a sidewall insula...