Marinus JOCHEMSEN

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 11,681,229
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 10,962,886
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Focus-dose co-optimization based on overlapping process window
- Patent number 10,459,345
- Issue date Oct 29, 2019
- ASML Netherlands B.V.
- Stefan Hunsche
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20230333481
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20210216017
- Publication date Jul 15, 2021
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20190025705
- Publication date Jan 24, 2019
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FOCUS-DOSE CO-OPTIMIZATION BASED ON OVERLAPPING PROCESS WINDOW
- Publication number 20180074413
- Publication date Mar 15, 2018
- Stefan HUNSCHE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY