Marinus JOCHEMSEN

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,768,442
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Separation of contributions to metrology data
- Patent number 11,520,239
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,513,442
- Issue date Nov 29, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing a sequence of processes for manufacturing of product units
- Patent number 11,442,367
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Jochem Sebastiaan Wildenberg
- G05 - CONTROLLING REGULATING
Information Patent Grant
Identification of hot spots or defects by machine learning
- Patent number 11,443,083
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to change an etch parameter
- Patent number 11,300,887
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing a sequence of processes for manufacturing of product units
- Patent number 11,106,141
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Jochem Sebastiaan Wildenberg
- G05 - CONTROLLING REGULATING
Information Patent Grant
Computational metrology
- Patent number 11,067,902
- Issue date Jul 20, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a patterning process, lithographic apparatus,...
- Patent number 11,048,174
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Michael Kubis
- G01 - MEASURING TESTING
Information Patent Grant
Methods for defect validation
- Patent number 10,859,926
- Issue date Dec 8, 2020
- ASML Netherlands B.V.
- Stefan Hunsche
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Displacement based overlay or alignment
- Patent number 10,852,646
- Issue date Dec 1, 2020
- ASML Netherlands B.V.
- Marinus Jochemsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for reticle optimization
- Patent number 10,725,372
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of predicting patterning defects caused by overlay error
- Patent number 10,712,672
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Marinus Jochemsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method for process window definition
- Patent number 10,394,136
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of adjusting speed and/or routing of a table movement plan a...
- Patent number 9,964,865
- Issue date May 8, 2018
- ASML Netherlands B.V.
- Cédric Désiré Grouwstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of adjusting speed and/or routing of a table movement plan a...
- Patent number 9,329,491
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Cédric Désiré Grouwstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, a method of controlling the apparatus and a...
- Patent number 8,405,817
- Issue date Mar 26, 2013
- ASML Netherlands B.V.
- Marco Koert Stavenga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20240012337
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20230058839
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20230042759
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING
- Publication number 20220277116
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Jing SU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS
- Publication number 20210389684
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Jochem Sebastiaan Wildenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210349395
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20210149312
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF CONTROLLING A PATTERNING PROCESS, DEVICE MANUFACTURING ME...
- Publication number 20200356013
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Jeroen VAN DONGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200264522
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Laurentius Cornelius DE WINTER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20200249576
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A PATTERNING PROCESS, LITHOGRAPHIC APPARATUS,...
- Publication number 20200233311
- Publication date Jul 23, 2020
- Michael KUBIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS
- Publication number 20200026200
- Publication date Jan 23, 2020
- ASML NETHERLANDS B.V.
- Jochem Sebastiaan WILDENBERG
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF PREDICTING PATTERNING DEFECTS CAUSED BY OVERLAY ERROR
- Publication number 20190310553
- Publication date Oct 10, 2019
- ASML NETHERLANDS B.V.
- Marinus JOCHEMSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD TO CHANGE AN ETCH PARAMETER
- Publication number 20190285992
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING
- Publication number 20190147127
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Jing SU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DISPLACEMENT BASED OVERLAY OR ALIGNMENT
- Publication number 20190146358
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Marinus JOCHEMSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20190086810
- Publication date Mar 21, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD FOR PROCESS WINDOW DEFINITION
- Publication number 20180284623
- Publication date Oct 4, 2018
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DEFECT VALIDATION
- Publication number 20180173104
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR RETICLE OPTIMIZATION
- Publication number 20180011398
- Publication date Jan 11, 2018
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN A...
- Publication number 20160320714
- Publication date Nov 3, 2016
- ASML NETHERLANDS B.V.
- Cédric Désiré GROUWSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN A...
- Publication number 20120003381
- Publication date Jan 5, 2012
- ASML NETHERLANDS B.V.
- Cédric Désiré GROUWSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A...
- Publication number 20100214543
- Publication date Aug 26, 2010
- ASML NETHERLANDS B.V.
- Marco Koert Stavenga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Marinus JOCHEMSEN

Person

Patents Grantslast 30 patents

Method of determining control parameters of a device manufacturing...

Separation of contributions to metrology data

Method of determining control parameters of a device manufacturing...

Optimizing a sequence of processes for manufacturing of product units

Identification of hot spots or defects by machine learning

Methods and patterning devices and apparatuses for measuring focus...

Method to change an etch parameter

Optimizing a sequence of processes for manufacturing of product units

Computational metrology

Method of controlling a patterning process, lithographic apparatus,...

Methods for defect validation

Displacement based overlay or alignment

Method and apparatus for reticle optimization

Method of predicting patterning defects caused by overlay error

Metrology method for process window definition

Method of adjusting speed and/or routing of a table movement plan a...

Method of adjusting speed and/or routing of a table movement plan a...

Lithographic apparatus, a method of controlling the apparatus and a...

Patents Applicationslast 30 patents

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING

OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS

COMPUTATIONAL METROLOGY

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

METHOD OF CONTROLLING A PATTERNING PROCESS, DEVICE MANUFACTURING ME...

Methods and Patterning Devices and Apparatuses for Measuring Focus...

COMPUTATIONAL METROLOGY

METHOD OF CONTROLLING A PATTERNING PROCESS, LITHOGRAPHIC APPARATUS,...

OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS

METHOD OF PREDICTING PATTERNING DEFECTS CAUSED BY OVERLAY ERROR

A METHOD TO CHANGE AN ETCH PARAMETER

IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING

DISPLACEMENT BASED OVERLAY OR ALIGNMENT

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

METROLOGY METHOD FOR PROCESS WINDOW DEFINITION

METHODS FOR DEFECT VALIDATION

METHOD AND APPARATUS FOR RETICLE OPTIMIZATION

METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN A...

METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN A...

LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A...