Marinus Johannes Maria Van Dam

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology apparatus
- Patent number 11,940,739
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus
- Patent number 11,549,806
- Issue date Jan 10, 2023
- ASML Netherland B.V.
- Marinus Johannes Maria Van Dam
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 11,262,661
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 10,895,452
- Issue date Jan 19, 2021
- ASML Netherlands B.V.
- Marinus Johannes Maria Van Dam
- G02 - OPTICS
Information Patent Grant
Inspection apparatus having non-linear optics
- Patent number 10,809,193
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Marinus Johannes Maria Van Dam
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,775,704
- Issue date Sep 15, 2020
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method of optimizing the position and/or size of a measurement illu...
- Patent number 10,488,765
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Johan Maria Van Boxmeer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,365,565
- Issue date Jul 30, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G02 - OPTICS
Information Patent Grant
Actuation mechanism, optical apparatus and lithography apparatus
- Patent number 9,927,711
- Issue date Mar 27, 2018
- ASML Netherlands B.V.
- Sven Antoin Johan Hol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuation mechanism, optical apparatus, lithography apparatus and m...
- Patent number 9,785,051
- Issue date Oct 10, 2017
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system, lithographic apparatus and method of adjusting...
- Patent number 8,867,021
- Issue date Oct 21, 2014
- ASML Netherlands B.V.
- Gosse Charles De Vries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parameter control in a lithographic apparatus using polarization
- Patent number 8,675,176
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Marinus Johanes Maria Van Dam
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Gas manifold, module for a lithographic apparatus, lithographic app...
- Patent number 8,675,169
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Frank Johannes Jacobus Van Boxtel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for measuring light scattered by an information support
- Patent number 5,111,037
- Issue date May 5, 1992
- Oce-Nederland B.V.
- Emile E. M. Boderie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Metrology Apparatus
- Publication number 20240184218
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVELENGTH SELECTION MODULE, ILLUMINATION SYSTEM AND METROLOGY SYSTEM
- Publication number 20220299365
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus
- Publication number 20210123724
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria VAN DAM
- G02 - OPTICS
Information Patent Application
Metrology Apparatus
- Publication number 20200072599
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria VAN DAM
- G02 - OPTICS
Information Patent Application
Metrology Apparatus
- Publication number 20190384184
- Publication date Dec 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20190346771
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G02 - OPTICS
Information Patent Application
Inspection Apparatus Having Non-Linear Optics
- Publication number 20190310190
- Publication date Oct 10, 2019
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria VAN DAM
- G01 - MEASURING TESTING
Information Patent Application
Method of Optimizing the Position and/or Size of a Measurement Illu...
- Publication number 20190107786
- Publication date Apr 11, 2019
- ASML NETHERLANDS B.V.
- Johan Maria VAN BOXMEER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20170242343
- Publication date Aug 24, 2017
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G02 - OPTICS
Information Patent Application
Actuation Mechanism, Optical Apparatus and Lithography Apparatus
- Publication number 20160313649
- Publication date Oct 27, 2016
- ASML, Netherlands B.V.
- Sven Antoin Johan HOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND M...
- Publication number 20150277233
- Publication date Oct 1, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus Van Schoot
- G01 - MEASURING TESTING
Information Patent Application
Optical element for use in lithography apparatus and method of cond...
- Publication number 20070058151
- Publication date Mar 15, 2007
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and method for its use
- Publication number 20060215141
- Publication date Sep 28, 2006
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria Van Dam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Parameter control in a lithographic apparatus using polarization
- Publication number 20060192149
- Publication date Aug 31, 2006
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria Van Dam
- B82 - NANO-TECHNOLOGY

Marinus Johannes Maria Van Dam

Person

Patents Grantslast 30 patents

Metrology apparatus

Metrology apparatus

Metrology apparatus

Metrology apparatus

Inspection apparatus having non-linear optics

Method of measuring a structure, inspection apparatus, lithographic...

Method of optimizing the position and/or size of a measurement illu...

Method of measuring a structure, inspection apparatus, lithographic...

Actuation mechanism, optical apparatus and lithography apparatus

Actuation mechanism, optical apparatus, lithography apparatus and m...

Illumination system, lithographic apparatus and method of adjusting...

Parameter control in a lithographic apparatus using polarization

Gas manifold, module for a lithographic apparatus, lithographic app...

Device for measuring light scattered by an information support

Patents Applicationslast 30 patents

Metrology Apparatus

WAVELENGTH SELECTION MODULE, ILLUMINATION SYSTEM AND METROLOGY SYSTEM

Metrology Apparatus

Metrology Apparatus

Metrology Apparatus

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Inspection Apparatus Having Non-Linear Optics

Method of Optimizing the Position and/or Size of a Measurement Illu...

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Actuation Mechanism, Optical Apparatus and Lithography Apparatus

ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND M...

Optical element for use in lithography apparatus and method of cond...

Lithographic apparatus and method for its use

Parameter control in a lithographic apparatus using polarization