Mariya Vyacheslavivna MEDVEDYEVA

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,531,274
- Issue date Dec 20, 2022
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a value of a parameter of interest of a targe...
- Patent number 10,585,048
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Samee Ur Rehman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing a metrology process
- Patent number 10,585,354
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining an optimal focus height for a metrology appar...
- Patent number 10,571,363
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beat patterns for alignment on small metrology targets
- Patent number 10,488,768
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Bastiaan Onne Fagginger Auer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...
- Publication number 20210191280
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A TARGE...
- Publication number 20190323972
- Publication date Oct 24, 2019
- ASML NETHERLANDS B.V.
- Samee Ur REHMAN
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...
- Publication number 20190242782
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPTIMIZING A METROLOGY PROCESS
- Publication number 20190243253
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Anagnostis TSIATMAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESSING DATA, METHOD OF OBTAINING CALIBRATION DATA
- Publication number 20190204180
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS
- Publication number 20190072860
- Publication date Mar 7, 2019
- ASML NETHERLANDS B.V.
- Bastiaan Onne FAGGINGER AUER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mariya Vyacheslavivna MEDVEDYEVA

Person

Patents Grantslast 30 patents

Method of determining information about a patterning process, metho...

Method of determining a value of a parameter of interest of a targe...

Method of optimizing a metrology process

Method of determining an optimal focus height for a metrology appar...

Beat patterns for alignment on small metrology targets

Patents Applicationslast 30 patents

METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...

METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A TARGE...

METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...

METHOD OF OPTIMIZING A METROLOGY PROCESS

METHOD OF PROCESSING DATA, METHOD OF OBTAINING CALIBRATION DATA

BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS