Mark A. Good

Person

Colorado Springs, CO, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and materials to control doping profile in integrated circui...
- Patent number 7,629,649
- Issue date Dec 8, 2009
- Atmel Corporation
- Gayle W. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabrication of a high capacitance interpoly dielectric
- Patent number 6,709,990
- Issue date Mar 23, 2004
- Atmel Corporation
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabrication of a high capacitance interpoly dielectric
- Patent number 6,495,475
- Issue date Dec 17, 2002
- Atmel Corporation
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Fabrication
- Publication number 20100019306
- Publication date Jan 28, 2010
- ATMEL CORPORATION
- Bohumil Lojek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GETTERING LAYER ON SUBSTRATE
- Publication number 20090189159
- Publication date Jul 30, 2009
- ATMEL CORPORATION
- Darwin Enicks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A BODY TO SUBSTRATE CONTACT OR TOPSIDE SUBST...
- Publication number 20080286967
- Publication date Nov 20, 2008
- ATMEL CORPORATION
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING A SURFACE OF A SEMICONDUCTOR SUBSTRATE
- Publication number 20080069952
- Publication date Mar 20, 2008
- ATMEL CORPORATION
- Thomas S. Moss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND MATERIALS TO CONTROL DOPING PROFILE IN INTEGRATED CIRCUI...
- Publication number 20070264795
- Publication date Nov 15, 2007
- ATMEL CORPORATION
- Gayle W. Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabrication of a high capacitance interpoly dielectric
- Publication number 20030045123
- Publication date Mar 6, 2003
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabrication of a high capacitance interpoly dielectric
- Publication number 20020142570
- Publication date Oct 3, 2002
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS

Mark A. Good

Person

Patents Grantslast 30 patents

Method and materials to control doping profile in integrated circui...

Method for fabrication of a high capacitance interpoly dielectric

Method for fabrication of a high capacitance interpoly dielectric

Patents Applicationslast 30 patents

Semiconductor Fabrication

GETTERING LAYER ON SUBSTRATE

METHOD FOR FABRICATING A BODY TO SUBSTRATE CONTACT OR TOPSIDE SUBST...

METHOD FOR CLEANING A SURFACE OF A SEMICONDUCTOR SUBSTRATE

METHOD AND MATERIALS TO CONTROL DOPING PROFILE IN INTEGRATED CIRCUI...

Method for fabrication of a high capacitance interpoly dielectric

Method for fabrication of a high capacitance interpoly dielectric