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Mark A. Hartney
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Carlisle, MA, US
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last 30 patents
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Patent Grant
Positive resist pattern formation through focused ion beam exposure...
Patent number
5,362,606
Issue date
Nov 8, 1994
Massachusetts Institute of Technology
Mark A. Hartney
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of patterning a phenolic polymer film without photoactive ad...
Patent number
5,318,870
Issue date
Jun 7, 1994
Massachusetts Institute of Technology
Mark A. Hartney
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Surface barrier silylation of novolak film without photoactive addi...
Patent number
5,139,925
Issue date
Aug 18, 1992
Massachusetts Institute of Technology
Mark A. Hartney
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY