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Mark Edd WILLIAMS
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Amherst, NH, US
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Patents Grants
last 30 patents
Information
Patent Grant
Linear Stage for reflective electron beam lithography
Patent number
9,690,213
Issue date
Jun 27, 2017
KLA-Tencor Corporation
Upendra Ummethala
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Shear-layer chuck for lithographic apparatus
Patent number
8,976,336
Issue date
Mar 10, 2015
ASML Holding N.V.
Samir A. Nayfeh
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Shear-layer chuck for lithographic apparatus
Patent number
8,786,832
Issue date
Jul 22, 2014
ASML Holding N.V.
Samir A. Nayfeh
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Arrangement of reticle positioning device for actinic inspection of...
Patent number
8,779,635
Issue date
Jul 15, 2014
KLA-Tencor Corporation
Pradeep Subrahmanyan
G01 - MEASURING TESTING
Information
Patent Grant
Linear stage and metrology architecture for reflective electron bea...
Patent number
8,724,115
Issue date
May 13, 2014
KLA-Tencor Corporation
Upendra Ummethala
G01 - MEASURING TESTING
Information
Patent Grant
Monolithic stage devices providing motion in six degrees of freedom
Patent number
7,728,462
Issue date
Jun 1, 2010
Nikon Corporation
Mark Williams
H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information
Patent Grant
Flexure-supported split reaction mass
Patent number
7,075,623
Issue date
Jul 11, 2006
ASML Holding N.V.
Daniel N Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
Shear-Layer Chuck for Lithographic Apparatus
Publication number
20140233009
Publication date
Aug 21, 2014
ASML Holding N.V.
Samir A. NAYFEH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Shear-Layer Chuck for Lithographic Apparatus
Publication number
20140016110
Publication date
Jan 16, 2014
ASML Holding N.V.
Samir A. NAYFEH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Linear Stage and Metrology Architecture for Reflective Electron Bea...
Publication number
20130342827
Publication date
Dec 26, 2013
KLA-Tencor Corporation
Upendra Ummethala
B82 - NANO-TECHNOLOGY
Information
Patent Application
Linear Stage for Reflective Electron Beam Lithography
Publication number
20130293865
Publication date
Nov 7, 2013
KLA-Tencor Corporation
Upendra Ummethala
B82 - NANO-TECHNOLOGY
Information
Patent Application
ARRANGEMENT OF RETICLE POSITIONING DEVICE FOR ACTINIC INSPECTION OF...
Publication number
20130264494
Publication date
Oct 10, 2013
Pradeep Subrahmanyan
G01 - MEASURING TESTING
Information
Patent Application
Shear-Layer Chuck for Lithographic Apparatus
Publication number
20110013164
Publication date
Jan 20, 2011
ASML Holding N.V.
Samir A. Nayfeh
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Magnetic Levitation Lithography Apparatus and Method
Publication number
20080266037
Publication date
Oct 30, 2008
Mark Williams
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Low mass six degree of freedom stage for lithography tools
Publication number
20080024749
Publication date
Jan 31, 2008
Nikon Corporation
Mark Williams
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Monolithic stage devices providing motion in six degrees of freedom
Publication number
20080012431
Publication date
Jan 17, 2008
NIKON CORPORATION
Mark Williams
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Flexure-supported split reaction mass
Publication number
20050103967
Publication date
May 19, 2005
ASML Holding N.V.
Daniel N. Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY