Mark Ghinovker

Person

Yoqneam Ilit, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-layered moiré targets and methods for using the same in measu...
- Patent number 12,204,254
- Issue date Jan 21, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging overlay targets using moiré elements and rotational symmetr...
- Patent number 12,105,433
- Issue date Oct 1, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of stitching error using split targets
- Patent number 12,094,100
- Issue date Sep 17, 2024
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 12,055,859
- Issue date Aug 6, 2024
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Verification metrology targets and their design
- Patent number 11,874,605
- Issue date Jan 16, 2024
- KLA Corporation
- Michael E. Adel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,862,524
- Issue date Jan 2, 2024
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite overlay metrology target
- Patent number 11,809,090
- Issue date Nov 7, 2023
- KLA Corporation
- Anna Golotsvan
- G01 - MEASURING TESTING
Information Patent Grant
Induced displacements for improved overlay error metrology
- Patent number 11,774,863
- Issue date Oct 3, 2023
- KLA Corporation
- Mark Ghinovker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay design for electron beam and scatterometry overlay measurem...
- Patent number 11,720,031
- Issue date Aug 8, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,703,767
- Issue date Jul 18, 2023
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology target for one-dimensional measurement of periodic misreg...
- Patent number 11,686,576
- Issue date Jun 27, 2023
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Misregistration target having device-scaled features useful in meas...
- Patent number 11,532,566
- Issue date Dec 20, 2022
- KLA Corporation
- Roie Volkovich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single cell in-die metrology targets and measurement methods
- Patent number 11,476,144
- Issue date Oct 18, 2022
- KLA Corporation
- Mark Ghinovker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field-to-field corrections using overlay targets
- Patent number 11,467,503
- Issue date Oct 11, 2022
- KLA Corporation
- Enna Leshinsky-Altshuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device-like overlay metrology targets displaying Moiré effects
- Patent number 11,355,375
- Issue date Jun 7, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imaging overlay targets using Moiré elements and rotational symmetr...
- Patent number 11,256,177
- Issue date Feb 22, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Misregistration metrology by using fringe Moiré and optical Moiré e...
- Patent number 11,164,307
- Issue date Nov 2, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology targets and methods with oblique periodic structures
- Patent number 11,137,692
- Issue date Oct 5, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Moiré target and method for using the same in measuring misregistra...
- Patent number 11,119,419
- Issue date Sep 14, 2021
- KLA-Tencor Corporation
- Mark Ghinovker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology target for scanning metrology
- Patent number 11,073,768
- Issue date Jul 27, 2021
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Field-to-field corrections using overlay targets
- Patent number 10,990,022
- Issue date Apr 27, 2021
- KLA Corporation
- Enna Leshinsky-Altshuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target and process sensitivity analysis to requirements
- Patent number 10,726,169
- Issue date Jul 28, 2020
- KLA-Tencor Corporation
- Michael E. Adel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Verification metrology target and their design
- Patent number 10,705,434
- Issue date Jul 7, 2020
- KLA-Tencor Corporation
- Michael E. Adel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Utilizing overlay misregistration error estimations in imaging over...
- Patent number 10,565,697
- Issue date Feb 18, 2020
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compound imaging metrology targets
- Patent number 10,527,951
- Issue date Jan 7, 2020
- KLA-Tencor Corporation
- Raviv Yohanan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, system, and user interface for metrology target characteriz...
- Patent number 10,242,290
- Issue date Mar 26, 2019
- KLA-Tencor Corporation
- Inna Tarshish-Shapir
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Analyzing root causes of process variation in scatterometry metrology
- Patent number 10,203,200
- Issue date Feb 12, 2019
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Grant
Systems for providing illumination in optical metrology
- Patent number 10,203,247
- Issue date Feb 12, 2019
- KLA-Tencor Corporation
- Gregory R. Brady
- F21 - LIGHTING

Patents Applicationslast 30 patents

Information Patent Application
OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT
- Publication number 20250139814
- Publication date May 1, 2025
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20240295827
- Publication date Sep 5, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20240210841
- Publication date Jun 27, 2024
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...
- Publication number 20240035812
- Publication date Feb 1, 2024
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20230324810
- Publication date Oct 12, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT OF STITCHING ERROR USING SPLIT TARGETS
- Publication number 20230281779
- Publication date Sep 7, 2023
- KLA Corporation
- Mark GHINOVKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Induced Displacements for Improved Overlay Error Metrology
- Publication number 20230129618
- Publication date Apr 27, 2023
- KLA Corporation
- Mark Ghinovker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Single Cell In-Die Metrology Targets and Measurement Methods
- Publication number 20230005777
- Publication date Jan 5, 2023
- KLA Corporation
- Mark Ghinovker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220415725
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220413395
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...
- Publication number 20220413394
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OBLIQUE ILLUMINATION FOR OVERLAY METROLOGY
- Publication number 20220357674
- Publication date Nov 10, 2022
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20220171297
- Publication date Jun 2, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS
- Publication number 20220020625
- Publication date Jan 20, 2022
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Application
Misregistration Target Having Device-Scaled Features Useful in Meas...
- Publication number 20220013468
- Publication date Jan 13, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...
- Publication number 20210381825
- Publication date Dec 9, 2021
- KLA Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TARGET FOR SCANNING METROLOGY
- Publication number 20210311401
- Publication date Oct 7, 2021
- KLA Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITE OVERLAY METROLOGY TARGET
- Publication number 20210240089
- Publication date Aug 5, 2021
- KLA Corporation
- Anna Golotsvan
- G01 - MEASURING TESTING
Information Patent Application
MULTI-LAYERED MOIRÉ TARGETS AND METHODS FOR USING THE SAME IN MEASU...
- Publication number 20210233821
- Publication date Jul 29, 2021
- KLA CORPORATION
- Yoel FELER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIELD-TO-FIELD CORRECTIONS USING OVERLAY TARGETS
- Publication number 20210200105
- Publication date Jul 1, 2021
- Enna Leshinsky-Altshuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20210149296
- Publication date May 20, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
Imaging Overlay Targets Using Moire Elements and Rotational Symmetr...
- Publication number 20210072650
- Publication date Mar 11, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology Target for Scanning Metrology
- Publication number 20200409271
- Publication date Dec 31, 2020
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
Single Cell In-Die Metrology Targets and Measurement Methods
- Publication number 20200373182
- Publication date Nov 26, 2020
- KLA Corporation
- Mark Ghinovker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Verification Metrology Targets and Their Design
- Publication number 20200348604
- Publication date Nov 5, 2020
- KLA Corporation
- Michael E. Adel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MOIRÉ TARGET AND METHOD FOR USING THE SAME IN MEASURING MISREGISTRA...
- Publication number 20200249585
- Publication date Aug 6, 2020
- KLA-Tencor Corporation
- Mark GHINOVKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Field-to-Field Corrections Using Overlay Targets
- Publication number 20200201193
- Publication date Jun 25, 2020
- KLA Corporation
- Enna Leshinsky-Altshuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES
- Publication number 20200124982
- Publication date Apr 23, 2020
- KLA-TENCOR CORPORATION
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mark Ghinovker

Person

Patents Grantslast 30 patents

Multi-layered moiré targets and methods for using the same in measu...

Imaging overlay targets using moiré elements and rotational symmetr...

Measurement of stitching error using split targets

Overlay mark design for electron beam overlay

Reduction or elimination of pattern placement error in metrology me...

Verification metrology targets and their design

Overlay mark design for electron beam overlay

Composite overlay metrology target

Induced displacements for improved overlay error metrology

Overlay design for electron beam and scatterometry overlay measurem...

Overlay mark design for electron beam overlay

Metrology target for one-dimensional measurement of periodic misreg...

Reduction or elimination of pattern placement error in metrology me...

Misregistration target having device-scaled features useful in meas...

Single cell in-die metrology targets and measurement methods

Field-to-field corrections using overlay targets

Device-like overlay metrology targets displaying Moiré effects

Imaging overlay targets using Moiré elements and rotational symmetr...

Misregistration metrology by using fringe Moiré and optical Moiré e...

Metrology targets and methods with oblique periodic structures

Moiré target and method for using the same in measuring misregistra...

Metrology target for scanning metrology

Field-to-field corrections using overlay targets

Target and process sensitivity analysis to requirements

Verification metrology target and their design

Utilizing overlay misregistration error estimations in imaging over...

Compound imaging metrology targets

Method, system, and user interface for metrology target characteriz...

Analyzing root causes of process variation in scatterometry metrology

Systems for providing illumination in optical metrology

Patents Applicationslast 30 patents

OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

MEASUREMENT OF STITCHING ERROR USING SPLIT TARGETS

Induced Displacements for Improved Overlay Error Metrology

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

Single Cell In-Die Metrology Targets and Measurement Methods

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...

OBLIQUE ILLUMINATION FOR OVERLAY METROLOGY

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS

Misregistration Target Having Device-Scaled Features Useful in Meas...

METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...

METROLOGY TARGET FOR SCANNING METROLOGY

COMPOSITE OVERLAY METROLOGY TARGET

MULTI-LAYERED MOIRÉ TARGETS AND METHODS FOR USING THE SAME IN MEASU...

FIELD-TO-FIELD CORRECTIONS USING OVERLAY TARGETS

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

Imaging Overlay Targets Using Moire Elements and Rotational Symmetr...

Metrology Target for Scanning Metrology

Single Cell In-Die Metrology Targets and Measurement Methods

Verification Metrology Targets and Their Design

MOIRÉ TARGET AND METHOD FOR USING THE SAME IN MEASURING MISREGISTRA...

Field-to-Field Corrections Using Overlay Targets

METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES