Mark H. Somervell

Person

Richardson, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for spin process video analysis during substrat...
- Patent number 11,637,031
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Michael Carcasi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
UV-assisted stripping of hardened photoresist to create chemical te...
- Patent number 11,538,684
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Systems and methods for monitoring one or more characteristics of a...
- Patent number 11,474,028
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Michael Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization of semiconductor devices
- Patent number 11,456,185
- Issue date Sep 27, 2022
- Tokyo Electron Limited
- Ryan Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Predicting across wafer spin-on planarization over a patterned topo...
- Patent number 11,455,436
- Issue date Sep 27, 2022
- Tokyo Electron Limited
- Ryan Burns
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods to monitor particulate accumulation for bake ch...
- Patent number 11,339,733
- Issue date May 24, 2022
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of planarization control using a cross-linkable m...
- Patent number 11,262,657
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and process for stochastic driven detectivity healing
- Patent number 11,163,236
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for sensitizing photoresist using flood exposures
- Patent number 11,061,332
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for developer drain line monitoring
- Patent number 10,809,620
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facilitation of spin-coat planarization over feature topography dur...
- Patent number 10,622,267
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Ryan L. Burns
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
UV-assisted stripping of hardened photoresist to create chemical te...
- Patent number 10,490,402
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Mark Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photo-sensitized chemically amplified resist (PS-CAR) simulation
- Patent number 10,429,745
- Issue date Oct 1, 2019
- Osaka University
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Subtractive methods for creating dielectric isolation structures wi...
- Patent number 10,170,354
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo-sensitized chemically amplified resist (PS-CAR) model calibra...
- Patent number 10,048,594
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 10,020,195
- Issue date Jul 10, 2018
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hot plate with programmable array of lift devices for multi-bake pr...
- Patent number 9,978,618
- Issue date May 22, 2018
- Tokyo Electron Limited
- Mark Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of grapho-epitaxial directed self-assembly applications to prec...
- Patent number 9,793,137
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mitigation of EUV shot noise replicating into acid shot noise in ph...
- Patent number 9,746,774
- Issue date Aug 29, 2017
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of topography to direct assembly of block copolymers in grapho-...
- Patent number 9,715,172
- Issue date Jul 25, 2017
- Tokyo Electron Limited
- Benjamen M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using sub-resolution openings to aid in image reversal, directed se...
- Patent number 9,633,847
- Issue date Apr 25, 2017
- Tokyo Electron Limited
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of absorption based heating bake methods into a photoli...
- Patent number 9,613,801
- Issue date Apr 4, 2017
- Tokyo Electron Limited
- Michael A. Carcasi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Metrology for measurement of photosensitizer concentration within p...
- Patent number 9,519,227
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 9,454,081
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Mark H Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of topography to direct assembly of block copolymers in grapho-...
- Patent number 9,418,860
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of grapho-epitaxial directed self-assembly to precisely cut lines
- Patent number 9,412,611
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of topography to direct assembly of block copolymers in grapho-...
- Patent number 9,349,604
- Issue date May 24, 2016
- Tokyo Electron Limited
- Benjamen M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topography minimization of neutral layer overcoats in directed self...
- Patent number 9,147,574
- Issue date Sep 29, 2015
- Tokyo Electron Limited
- Mark H. Somervell
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming patterns using block copolymers and articles thereof
- Patent number 9,005,877
- Issue date Apr 14, 2015
- Tokyo Electron Limited
- Benjamen M. Rathsack
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PREDICTING ACROSS WAFER SPIN-ON PLANARIZATION OVER A PATTERNED TOPO...
- Publication number 20210303741
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Ryan Burns
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems and Methods for Spin Process Video Analysis During Substrat...
- Publication number 20210129166
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE S...
- Publication number 20210132637
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Joshua Hooge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE S...
- Publication number 20210129174
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Joshua Hooge
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Systems and Methods for Spin Process Video Analysis During Substrat...
- Publication number 20210134637
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Systems and Methods for Monitoring One or More Characteristics of a...
- Publication number 20210109015
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS TO MONITOR PARTICULATE ACCUMULATION FOR BAKE CH...
- Publication number 20210071607
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Application
Method and Process for Stochastic Driven Defectivity Healing
- Publication number 20210048749
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD OF PLANARIZATION CONTROL USING A CROSS-LINKABLE M...
- Publication number 20210018839
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLANARIZATION OF SEMICONDUCTOR DEVICES
- Publication number 20200395224
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Ryan Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TE...
- Publication number 20200066509
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHODS FOR SENSITIZING PHOTORESIST USING FLOOD EXPOSURES
- Publication number 20190094698
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL AMPLIFICATION METHODS AND TECHNIQUES FOR DEVELOPABLE BOTTO...
- Publication number 20180315596
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hot plate with programmable array of lift devices for multi-bake pr...
- Publication number 20180102265
- Publication date Apr 12, 2018
- Mark Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACILITATION OF SPIN-COAT PLANARIZATION OVER FEATURE TOPOGRAPHY DUR...
- Publication number 20180096905
- Publication date Apr 5, 2018
- TOKYO ELECTRON LIMITED
- Ryan L. Burns
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of evaluating aligned patterns in directed self-assembly and...
- Publication number 20170287126
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation
- Publication number 20170242342
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo-sensitized Chemically Amplified Resist (PS-CAR) model calibra...
- Publication number 20170242344
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20160363868
- Publication date Dec 15, 2016
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for Spin-on-Carbon Planarization
- Publication number 20160358786
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Joshua S. Hooge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY APPLICATIONS TO PREC...
- Publication number 20160343588
- Publication date Nov 24, 2016
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBTRACTIVE METHODS FOR CREATING DIELECTRIC ISOLATION STRUCTURES WI...
- Publication number 20160300756
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SE...
- Publication number 20160300711
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...
- Publication number 20160268132
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLI...
- Publication number 20160013052
- Publication date Jan 14, 2016
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Amplification Methods and Techniques for Developable Botto...
- Publication number 20150241782
- Publication date Aug 27, 2015
- TOKYO ELECTERON LIMITED
- Steven SCHEER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN P...
- Publication number 20150241793
- Publication date Aug 27, 2015
- Michael A. CARCASI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MITIGATION OF EUV SHOT NOISE REPLICATING INTO ACID SHOT NOISE IN PH...
- Publication number 20150241781
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Michael A. CARCASI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20150125791
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...
- Publication number 20150111387
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS

Mark H. Somervell

Person

Patents Grantslast 30 patents

Chemical amplification methods and techniques for developable botto...

Systems and methods for spin process video analysis during substrat...

UV-assisted stripping of hardened photoresist to create chemical te...

Systems and methods for monitoring one or more characteristics of a...

Planarization of semiconductor devices

Predicting across wafer spin-on planarization over a patterned topo...

Systems and methods to monitor particulate accumulation for bake ch...

System and method of planarization control using a cross-linkable m...

Method and process for stochastic driven detectivity healing

Methods for sensitizing photoresist using flood exposures

Systems and methods for developer drain line monitoring

Facilitation of spin-coat planarization over feature topography dur...

UV-assisted stripping of hardened photoresist to create chemical te...

Photo-sensitized chemically amplified resist (PS-CAR) simulation

Subtractive methods for creating dielectric isolation structures wi...

Photo-sensitized chemically amplified resist (PS-CAR) model calibra...

Chemical amplification methods and techniques for developable botto...

Hot plate with programmable array of lift devices for multi-bake pr...

Use of grapho-epitaxial directed self-assembly applications to prec...

Mitigation of EUV shot noise replicating into acid shot noise in ph...

Use of topography to direct assembly of block copolymers in grapho-...

Using sub-resolution openings to aid in image reversal, directed se...

Integration of absorption based heating bake methods into a photoli...

Metrology for measurement of photosensitizer concentration within p...

Line pattern collapse mitigation through gap-fill material application

Use of topography to direct assembly of block copolymers in grapho-...

Use of grapho-epitaxial directed self-assembly to precisely cut lines

Use of topography to direct assembly of block copolymers in grapho-...

Topography minimization of neutral layer overcoats in directed self...

Method of forming patterns using block copolymers and articles thereof

Patents Applicationslast 30 patents

PREDICTING ACROSS WAFER SPIN-ON PLANARIZATION OVER A PATTERNED TOPO...

Systems and Methods for Spin Process Video Analysis During Substrat...

METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE S...

METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE S...

Systems and Methods for Spin Process Video Analysis During Substrat...

Systems and Methods for Monitoring One or More Characteristics of a...

SYSTEMS AND METHODS TO MONITOR PARTICULATE ACCUMULATION FOR BAKE CH...

Method and Process for Stochastic Driven Defectivity Healing

SYSTEM AND METHOD OF PLANARIZATION CONTROL USING A CROSS-LINKABLE M...

PLANARIZATION OF SEMICONDUCTOR DEVICES

UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TE...

METHODS FOR SENSITIZING PHOTORESIST USING FLOOD EXPOSURES

CHEMICAL AMPLIFICATION METHODS AND TECHNIQUES FOR DEVELOPABLE BOTTO...

Hot plate with programmable array of lift devices for multi-bake pr...

FACILITATION OF SPIN-COAT PLANARIZATION OVER FEATURE TOPOGRAPHY DUR...

Method of evaluating aligned patterns in directed self-assembly and...

Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation

Photo-sensitized Chemically Amplified Resist (PS-CAR) model calibra...

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

Techniques for Spin-on-Carbon Planarization

USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY APPLICATIONS TO PREC...

SUBTRACTIVE METHODS FOR CREATING DIELECTRIC ISOLATION STRUCTURES WI...

USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SE...

USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...

INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLI...

Chemical Amplification Methods and Techniques for Developable Botto...

METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN P...

MITIGATION OF EUV SHOT NOISE REPLICATING INTO ACID SHOT NOISE IN PH...

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...