Mark J. DelaRosa

Follow

Person

Chandler, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorine diffusion barriers for fluorinated dielectrics in integrat...
- Patent number 6,818,990
- Issue date Nov 16, 2004
- Rensselaer Polytechnic Institute
- Mark J. DelaRosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of cobalt from cobalt metallorganic compounds
- Patent number 6,527,855
- Issue date Mar 4, 2003
- Rensselaer Polytechnic Institute
- Mark J. DelaRosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Fluorine diffusion barriers for fluorinated dielectrics in integrat...
- Publication number 20030057553
- Publication date Mar 27, 2003
- Mark J. DelaRosa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic layer deposition of cobalt from cobalt metallorganic compounds
- Publication number 20020081381
- Publication date Jun 27, 2002
- Rensselaer Polytechnic Institute
- Mark J. DelaRosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...